公开(公告)号：KR1020000065440A

公开(公告)日：2000-11-15

申请号：KR1019990011734

申请日：1999-04-03

Applicant: 삼성전자주식회사

Inventor： 성우동 ,  한삼순 ,  오창욱 ,  이강식

IPC: H01L21/68

CPC classification number: H01L21/67748 ,  F24F2011/0004 ,  H01L21/67017 ,  H01L21/6715 ,  Y10S414/14

Abstract: PURPOSE: A method of cleaning an equipment for manufacturing semiconductor and the equipment for manufacturing semiconductor appling the method is provided to suppress pollution of a wafer inside of a process equipment effectively. CONSTITUTION: In a method of cleaning an equipment for manufacturing semiconductor, cleaning air passes a service area(120) placed between an upper plenum(200) and a lower plenum(300) in a first pressure by flowing from the upper plenum, supply part of the cleaning air, to the lower plenum, recovery part. Also, cleaning air passes a working area(110) contiguous to the service area(120) in a second pressure higher than the first pressure by flowing the upper plenum to the lower plenum. The cleaning air is supplied to wafer transfer area(132) which is placed between the service area and the working area and connected with the working area and wafer process area(131) connected with the wafer transfer area. In the case, the pressure of wafer process area is kept higher than that of the wafer transfer area. Consequently, the cleaning air in the wafer transfer area flows to the working area or the lower plenum.

Abstract translation: 目的：提供一种清洁半导体制造设备和半导体制造设备的方法，以有效地抑制处理设备内的晶片的污染。 构成：在清洁用于制造半导体的设备的方法中，清洁空气通过从上部集气室，供应部分流动而在第一压力下通过放置在上部集气室（200）和下部增压室（300）之间的维修区域（120） 的清洁空气，到下部通风室，回收部分。 此外，清洁空气通过使上部通风室流到下部通风室，使得与服务区域（120）邻接的工作区域（110）的压力高于第一压力。 将清洁空气供给到放置在服务区域和工作区域之间的晶片传送区域（132），并与与晶片传送区域连接的工作区域和晶片处理区域（131）连接。 在这种情况下，晶片处理区域的压力保持高于晶片传送区域的压力。 因此，晶片传送区域中的清洁空气流到工作区域或下部通风室。

公开(公告)号：KR1020020017223A

公开(公告)日：2002-03-07

申请号：KR1020000050422

申请日：2000-08-29

Applicant: 삼성전자주식회사

Inventor： 성우동 ,  한삼순

IPC: H01L21/02

Abstract: PURPOSE: An apparatus for controlling a pressure difference between areas in a clean room is provided to cope with variation of environment within a shorter interval of time than a conventional technology, by automatically controlling the pressure difference to a predetermined value and by actively controlling a flow rate. CONSTITUTION: A clean air supply unit(8) supplies clean air to a process area(3) and a product transfer area. A supply pipe(6) induces the clean air from the clean air supply unit to the areas. A plurality of emission holes are formed in an end of the supply pipe. A mass flow controller controls the quantity of clean air emitted from the emission holes. A pressure difference measure unit(9) measures the pressure difference between the areas, electrically connected to the mass flow controller.

Abstract translation: 目的：提供一种用于控制洁净室中的区域之间的压力差的装置，以便通过将压力差自动控制为预定值并且通过主动地控制流动来应对在常规技术的更短的时间间隔内的环境变化 率。 规定：清洁空气供应单元（8）为处理区域（3）和产品传送区域提供清洁空气。 供应管（6）将洁净空气从清洁空气供应单元引导到区域。 在供给管的端部形成有多个排出孔。 质量流量控制器控制从排放孔排出的清洁空气的量。 压力差测量单元（9）测量与质量流量控制器电连接的区域之间的压力差。

公开(公告)号：KR100297724B1

公开(公告)日：2001-09-26

申请号：KR1019990007120

申请日：1999-03-04

Applicant: 삼성전자주식회사

Inventor： 성우동 ,  한삼순 ,  오창욱 ,  남정림

IPC: H01L21/027

CPC classification number: H01L21/67034

Abstract: 감광액도포및 현상시스템과베이크유니트에관하여개시된다. 개시된감광액도포및 현상시스템은, 도포기와현상기와베이크유니트와웨이퍼이송용로보트가그 내부에설치된하우징을구비하며, 하우징의상부에는공조장치에의해하우징내부로하향공급되는청정공기를필터링하기위한에어필터가설치된것으로, 에어필터를거쳐공급되는청정공기가베이크유니트의상부에서난기류를형성하며베이크유니트의전면부로유입되는것을방지함으로써, 베이크유니트의전면부에서청정공기가안정된하향기류를형성하며라미나에어플로우되도록하여청정공기가베이크유니트내부로유입되는것을억제하도록된 것을특징으로한다. 그리고, 상기하우징의바닥에는청정공기가배출될수 있도록그레이팅이설치되어청정공기의라미나에어플로우가하우징의바닥면까지유지될수 있도록되어있다. 개시된베이크유니트는, 케이스의내부에설치되어웨이퍼를가열하기위한베이크챔버를그 외부의열적영향으로부터차단시키기위한차단수단을구비하는것을특징으로한다. 차단수단으로는베이크챔버를감싸도록설치되는차단카바와, 냉각수라인의영향을차단하기위한차단판이사용된다.

公开(公告)号：KR1020000059485A

公开(公告)日：2000-10-05

申请号：KR1019990007120

申请日：1999-03-04

Applicant: 삼성전자주식회사

Inventor： 성우동 ,  한삼순 ,  오창욱 ,  남정림

IPC: H01L21/027

CPC classification number: H01L21/67034

Abstract: PURPOSE: A system for coating and developing a photoresist and bake unit is to prevent an air flow introduced in the bake unit and isolate heat influenced on a bake chamber of the bake unit, thereby equally form a width of a wire. CONSTITUTION: A system for coating and developing a photoresist comprises a housing(200), a coating portion(220) for coating the photoresist on a semiconductor wafer, a developing portion for developing the photoresist, a bake unit(240) for heating the wafer at a desired temperature, a robot(210) for transferring the wafer, an air conditioner, an air filter(273a,273b) disposed at an upper portion of the housing to filter air supplied from the air conditioner. In the system, the clean air supplied through the air filter forms turbulent air at an upper portion of the bake unit to prevent the air from being introduced into a front face of the bake unit. The bake unit comprises a case having a wafer passage formed at a front face thereof and an opening formed at a rear face thereof, a bake chamber, a heat-isolating portion for isolating the bake chamber from the heat.

Abstract translation: 目的：用于涂布和显影光致抗蚀剂和烘烤单元的系统是防止在烘烤单元中引入的空气流并隔离受烘烤单元的烘烤室影响的热量，从而同样形成线的宽度。 构造：用于涂覆和显影光致抗蚀剂的系统包括壳体（200），用于在半导体晶片上涂覆光致抗蚀剂的涂覆部分（220），用于显影光致抗蚀剂的显影部分，用于加热晶片的烘烤单元（240） 在期望的温度下，用于传送晶片的机器人（210），空调，设置在壳体的上部的空气过滤器（273a，273b）以过滤从空调提供的空气。 在该系统中，通过空气过滤器供应的清洁空气在烘烤单元的上部形成湍流空气，以防止空气被引入烘烤单元的正面。 烘烤单元包括具有形成在其前表面的晶片通道和形成在其后表面上的开口的壳体，烘烤室，用于将烘烤室与热隔离的隔热部分。

公开(公告)号：KR1020020022941A

公开(公告)日：2002-03-28

申请号：KR1020000055510

申请日：2000-09-21

Applicant: 삼성전자주식회사

Inventor： 성우동 ,  한삼순

IPC: H01L21/304

Abstract: PURPOSE: A method for stabilizing an exhausting process for equipment of fabricating a semiconductor is provided to prevent an absorbing phenomenon of particles caused by an unstable quantity of exhausting, by independently controlling the exhausting quantity of a plurality of apparatuses installed in a clean room. CONSTITUTION: A plurality of sub exhausting ducts(11) are connected to a main exhausting duct. An isopropyl alcohol(IPA) vapor drying cleaning apparatus has an exhaust stabilizing apparatus including a fan. The pressure of the sub exhausting ducts is measured. The measurement values are analyzed. The exhaust stabilizing apparatus controls the exhausting quantity of the cleaning apparatus according to the analyzed data.

Abstract translation: 目的：通过独立地控制安装在洁净室中的多个装置的排出量，提供一种用于稳定半导体制造装置的排气处理方法，以防止不稳定排气量引起的颗粒的吸收现象。 构成：多个副排气管道（11）连接到主排气管道。 异丙醇（IPA）蒸气干燥清洁装置具有包括风扇的排气稳定装置。 测量副排风管的压力。 分析测量值。 排气稳定装置根据分析数据来控制清洗装置的排出量。

公开(公告)号：KR100307628B1

公开(公告)日：2001-10-29

申请号：KR1019990011734

申请日：1999-04-03

Applicant: 삼성전자주식회사

Inventor： 성우동 ,  한삼순 ,  오창욱 ,  이강식

IPC: H01L21/68

CPC classification number: H01L21/67748 ,  F24F2011/0004 ,  H01L21/67017 ,  H01L21/6715 ,  Y10S414/14

Abstract: 반도체제조설비의청정방법및 이를적용한반도체제조설비에관해개시된다. 개시된반도체제조설비의청정방법은: 청정공기공급부인상부프리넘으로부터청정공기회수부인하부프리넘으로청정공기를유동시켜상부프리넘과하부프리넘사이에위치하는서비스영역으로제1압력으로청정공기를통과시키는단계; 상부프리넘으로부터하부프리넘으로청정공기를유동시켜상부프리넘과하부프리넘사이에위치하는것으로서비스영역에인접한작업영역으로상기제1압력보다높은제2압력으로청정공기를통과시키는단계; 상기서비스영역과작업영역사이에마련되는것으로작업영역과공간적으로연결되어있는웨이퍼이송영역과상기웨이퍼이송영역과공간적으로연결되는웨이퍼프로세스영역에청정공기를공급하되, 상기웨이퍼프로세스영역의압력을상기웨이퍼이송영역의압력보다높게유지시키는단계; 상기웨이퍼이송영역의청정공기를상기작업영역또는하부프리넘으로유동시키는단계;를포함한다. 따라서, 웨이퍼프로세스영역을고청정의상태로유지시킬수 있고, 따라서웨이퍼프로세스영역에서파티클이웨이퍼에부착되는현상을방지한다.