公开(公告)号：KR1020050062983A

公开(公告)日：2005-06-28

申请号：KR1020030094001

申请日：2003-12-19

Applicant: 삼성전자주식회사

Inventor： 함창열 ,  김선필

IPC: H01L21/304

Abstract: 본 발명은 반도체 소자의 제조에 이용되는 초순수 제조 장치에 관한 것으로, 본 발명의 초순수 제조 장치는 외부로부터 공급수가 공급되는 공급수 배관; 상기 공급수 배관에 연결되는 그리고 다수의 수지 보틀들을 포함하는 폴리셔 유닛부들; 상기 폴리셔 유닛부들에 연결되는 생산수 배관; 상기 공급수 배관과 상기 생산수 배관을 직접 연결하는 바이패스 배관; 및 상기 폴리셔 유닛부의 전단과 후단에 설치되는 제1밸브들을 포함한다. 이러한 구성을 갖는 본 발명은 폴리셔 수지 보틀 교체 및 박테리아 살균 목적으로 정기적으로 시행하고 있는 과산화수소 세정 작업시 발생되는 초순수 품질 오염 및 업무 로스를 최소화할 수 있다.

公开(公告)号：KR100462897B1

公开(公告)日：2004-12-18

申请号：KR1020030003809

申请日：2003-01-20

Applicant: 삼성전자주식회사

Inventor： 김선필 ,  강혁 ,  신호수 ,  유호정 ,  함창열

IPC: C02F1/44

Abstract: PURPOSE: Provided are an ultra-pure water manufacturing device and a method for manufacturing ultra-pure water by using the same which recover treated water to a raw water supplying tank or automatically control the discharge amount of the supplied treated water and concentrated water when the salt removing rate is abnormal compared to the reference value. CONSTITUTION: The device(1) comprises a pre-treating filter(7) primarily filtering fine particles contained in raw water supplied from a raw water supplying tank(3), a first reverse osmotic membrane device(11) removing salts contained in the water filtered through the pre-treating filter, a second reverse osmotic membrane device(13) removing salts contained in the concentrated water separated by the first reverse osmotic membrane device, a salt removing rate tester(19) installed on a treated water supply line(15) to check the salt removing rate of the treated water, a treated water supply valve(21) equipped at the treated water supply line to switch on and off the treated water supply line, a return valve(25) opening and closing a return line(23) connected from the treated water supply line between the treated water supply valve and the second reverse osmotic membrane device to the raw water supply tank, a concentrated water control valve(29) equipped at a concentrated water discharge line(27) where the concentrated water separated by the second reverse osmotic membrane device passes through and a controller(31) comparing data regarding the salt removing rate checked by the salt removing rate tester to generate an opening and closing signal of the treated water supply valve, return valve and concentrated water control valve.

Abstract translation: 本发明提供一种超纯水制造装置以及使用该超纯水制造装置的超纯水的制造方法，该超纯水制造装置以及超纯水的制造方法， 与参考值相比，除盐率异常。 本发明的装置（1）包括：预处理过滤器（7），主要过滤从原水供应罐（3）供应的原水中含有的细颗粒;第一反渗透膜装置（11），去除水中含有的盐 通过预处理过滤器过滤，第二反渗透膜装置（13）去除包含在由第一反渗透膜装置分离的浓缩水中的盐，安装在处理过的供水管线（15）上的除盐率测试器（19） ），检查处理水的除盐率;处理水供给阀（21），其设置在处理水供给管路上以接通和关闭处理过的供水管路;返回阀（25），其打开和关闭返回管路 （23），其从被处理水供给管路与第二反渗透膜装置之间的被处理水供给管路与原水供给槽连接;浓水控制阀（29），其以浓水排出 其中由第二反渗透膜装置分离的浓缩水通过的管线（27）和控制器（31）比较关于由除盐率检测器检查的除盐率的数据，以产生处理过的供水的开启和关闭信号 阀门，回流阀和浓水控制阀。

公开(公告)号：KR1020020039413A

公开(公告)日：2002-05-27

申请号：KR1020000069206

申请日：2000-11-21

Applicant: 삼성전자주식회사

Inventor： 함창열

IPC: B01J47/14

CPC classification number: B01J47/14 ,  C02F1/42

Abstract: PURPOSE: Provided is an apparatus for producing deionized water with a device for checking water quality which can promptly notice whether deionized water is contaminated, thereby preventing spread of water contamination. CONSTITUTION: The apparatus(100) for producing deionized water includes a supply piping(20) for supplying water to be treated; ion-exchange resin towers(10) connected parallel to the supply piping, which produce deionized water by filtering ions contained in the supplied water by the ion-exchange method; first discharge pipes(32) connected to the bottoms of the ion-exchange resin towers, which discharge the produced deionized water; second discharge pipes(34) connected to ends of the first discharge pipes, which discharge the produced deionized water to the outside; and devices(40) for checking the quality of water discharged from the second discharge pipes. The checking device includes a sensor for sensing electrical resistance and conductivity of deionized water and a control device for displaying information from the sensor and controlling the ion-exchange resin tower by the information.

Abstract translation: 目的：提供一种用于生产去离子水的设备，具有检查水质的装置，可以及时注意去离子水是否被污染，从而防止水污染的扩散。 构成：用于生产去离子水的装置（100）包括用于供给待处理水的供应管道（20） 离子交换树脂塔（10），其平行于供应管道连接，通过离子交换法过滤供给的水中所含的离子产生去离子水; 连接到离子交换树脂塔底部的第一排放管（32），其排出所产生的去离子水; 第二排出管（34），其连接到第一排出管的端部，将生成的去离子水排出到外部; 以及用于检查从第二排出管排出的水的质量的装置（40）。 检查装置包括用于感测去离子水的电阻和电导率的传感器和用于显示来自传感器的信息并通过信息控制离子交换树脂塔的控制装置。

公开(公告)号：KR1020020013129A

公开(公告)日：2002-02-20

申请号：KR1020000046573

申请日：2000-08-11

Applicant: 삼성전자주식회사

Inventor： 함창열

IPC: B01D15/08

CPC classification number: B01D15/361 ,  B01D15/10

Abstract: PURPOSE: A detector of resin leaking through ion exchange resin tower that is used to produce ultra pure water used for semiconductor plant is provided, which can predict any leakage of resin from ion exchange tower by installing Y-type transparent filter at the bypass line of water discharge line so that can prevent any damage of the ultra pure water plant. CONSTITUTION: The detector comprises a resin tower(20), a water supplying pipe(21), an alkali rinse pit(22), an R/O and UF module(23), a rinse pit(24) and a filter(26). From the resin tower(20) in which resin is filled, water is discharged through an alkali rinse line(28) set at the middle part to pit(22) and through ultra pure water line to R/O, UF module and alkali rinse line set at the bottom to rinse pit(24). On the lines(28) bypass line is installed to install detector of resin which consists of Y-type transparent filter of 40 mesh which is smaller than the diameter of resin of 0.3-1.2 mm to detect resin leakage and valves.

Abstract translation: 目的：提供用于生产用于半导体工厂的超纯水的离子交换树脂塔的树脂泄漏检测器，通过在旁路管路上安装Y型透明过滤器，可以预测离子交换塔的树脂泄漏 排水管线，可防止超纯水厂的任何损坏。 构成：检测器包括树脂塔（20），供水管（21），碱冲洗坑（22），R / O和UF模块（23），冲洗坑（24）和过滤器 ）。 从填充有树脂的树脂塔（20）中通过设置在中间部分的碱冲洗管线（28）将水排出到凹坑（2​​2）并通过超纯水管线排出到R / O，UF组件和碱冲洗 线底部设置在底部以冲洗坑（24）。 在线路（28）上安装了旁路管路，安装树脂检测器，该树脂检测器由40目的Y型透明过滤器组成，小于0.3-1.2 mm的树脂直径，以检测树脂泄漏和阀门。

公开(公告)号：KR100614643B1

公开(公告)日：2006-08-22

申请号：KR1020030094001

申请日：2003-12-19

Applicant: 삼성전자주식회사

Inventor： 함창열 ,  김선필

IPC: H01L21/304

Abstract: 본 발명은 반도체 소자의 제조에 이용되는 초순수 제조 장치에 관한 것으로, 본 발명의 초순수 제조 장치는 외부로부터 공급수가 공급되는 공급수 배관; 상기 공급수 배관에 연결되는 그리고 다수의 수지 보틀들을 포함하는 폴리셔 유닛부들; 상기 폴리셔 유닛부들에 연결되는 생산수 배관; 상기 공급수 배관과 상기 생산수 배관을 직접 연결하는 바이패스 배관; 및 상기 폴리셔 유닛부의 전단과 후단에 설치되는 제1밸브들을 포함한다. 이러한 구성을 갖는 본 발명은 폴리셔 수지 보틀 교체 및 박테리아 살균 목적으로 정기적으로 시행하고 있는 과산화수소 세정 작업시 발생되는 초순수 품질 오염 및 업무 로스를 최소화할 수 있다.

公开(公告)号：KR1020020017172A

公开(公告)日：2002-03-07

申请号：KR1020000050342

申请日：2000-08-29

Applicant: 삼성전자주식회사

Inventor： 이충섭 ,  정해균 ,  함창열

IPC: H01L21/304

Abstract: PURPOSE: A bath of cleaning a wafer is provided to control the possibility of a wafer trouble caused by contaminated water, by minimizing contamination of deionized water caused by outer circumstances of the bath when the wafer is cleaned by deionized water. CONSTITUTION: A bath's upper cover unit(13) prevents air in a contaminated cleaner room from being melted and diffused to the wafer cleaning bath. A bath's side exhaust apparatus prevents the air of the cleaner room from being induced through an exhaust hole when cleaning water used in an exhaust apparatus is exhausted. A bath's lower drain unit prevents the air of the cleaner room from being induced through the exhaust hole when the deionized water inside the bath is drained. A nitrogen supply unit is installed in the lower portion of the bath to prevent leakage of nitrogen gas inside the bath. The wafer cleaning bath intercepts cleaning surroundings inside the bath from outer surroundings.

Abstract translation: 目的：提供清洁晶片的浴液，以便在用去离子水清洁晶片时，通过最大限度地减少由外部环境引起的去离子水污染，从而控制由污染水引起的晶片故障的可能性。 构成：浴缸的上盖单元（13）防止污染的清洁室内的空气熔化并扩散到晶圆清洗槽。 当排气装置中使用的清洁用水被排出时，浴缸侧排气装置防止清洁室的空气通过排气孔感应。 浴室的下部排水单元可防止洗涤室内的去离子水排出时，清洁室的空气通过排气孔引入。 氮气供应单元安装在槽的下部，以防止浴内的氮气泄漏。 晶圆清洗槽拦截浴室内周围的清洁环境。

公开(公告)号：KR1020110133280A

公开(公告)日：2011-12-12

申请号：KR1020100052920

申请日：2010-06-04

Applicant: 삼성전자주식회사

Inventor： 함창열

IPC: H01L21/302

CPC classification number: H01L21/67051

Abstract: PURPOSE: A semiconductor substrate cleaning device and a method thereof are provided to use a pure water collecting line, thereby increasing a pure water collecting rate during a semiconductor manufacturing process. CONSTITUTION: A jetting nozzle(130) jets cleaning liquid on a wafer. A plurality of collecting can(140) collects the cleaning liquid. A chemical collecting line(150) collects a chemical to be reused from the cleaning liquid. A chemical discharging line(160) discharges a chemical to be abandoned from the cleaning liquid. A pure water collecting line(162) collects pure water except all chemicals.

Abstract translation: 目的：提供一种半导体衬底清洁装置及其方法来使用纯水收集线，从而在半导体制造过程中提高纯粹的水收集率。 构成：喷射喷嘴（130）在晶片上喷射清洗液。 多个收集罐（140）收集清洁液体。 化学收集线（150）从清洗液中收集待再利用的化学物质。 化学品排放管线（160）从待清洗液体中排出待废弃的化学物质。 纯水收集线（162）收集纯水，除了所有的化学物质。

公开(公告)号：KR100735609B1

公开(公告)日：2007-07-04

申请号：KR1020010049481

申请日：2001-08-17

Applicant: 삼성전자주식회사

Inventor： 함창열 ,  김선필

IPC: H01L21/304

Abstract: 본 발명은 초순수 제조설비의 유기탄소(TOC)의 농도에 따라 UV램프의 조사량을 제어하는 UV램프 조사량 제어하는 기술이다.
본 발명의 초순수 제조설비에서 유브이 램프 조사량을 제어하기 위해, 공급되는 초순수(DI WATER) 중에 함유된 유기물질의 농도를 분석하고, 상기 분석된 유기물질의 농도값이 설정된 농도값이하일 시 노말상태에 따른 수질을 제어하기 위한 제어신호를 출력하며, 상기 노말상태에 따른 수질을 제어하기 위한 제어신호를 출력할 시 상기 유브이 램프를 30%점등시키도록 전원을 공급한다.

유브이램프,

公开(公告)号：KR1020040066675A

公开(公告)日：2004-07-27

申请号：KR1020030003809

申请日：2003-01-20

Applicant: 삼성전자주식회사

Inventor： 김선필 ,  강혁 ,  신호수 ,  유호정 ,  함창열

IPC: C02F1/44

Abstract: PURPOSE: Provided are an ultra-pure water manufacturing device and a method for manufacturing ultra-pure water by using the same which recover treated water to a raw water supplying tank or automatically control the discharge amount of the supplied treated water and concentrated water when the salt removing rate is abnormal compared to the reference value. CONSTITUTION: The device(1) comprises a pre-treating filter(7) primarily filtering fine particles contained in raw water supplied from a raw water supplying tank(3), a first reverse osmotic membrane device(11) removing salts contained in the water filtered through the pre-treating filter, a second reverse osmotic membrane device(13) removing salts contained in the concentrated water separated by the first reverse osmotic membrane device, a salt removing rate tester(19) installed on a treated water supply line(15) to check the salt removing rate of the treated water, a treated water supply valve(21) equipped at the treated water supply line to switch on and off the treated water supply line, a return valve(25) opening and closing a return line(23) connected from the treated water supply line between the treated water supply valve and the second reverse osmotic membrane device to the raw water supply tank, a concentrated water control valve(29) equipped at a concentrated water discharge line(27) where the concentrated water separated by the second reverse osmotic membrane device passes through and a controller(31) comparing data regarding the salt removing rate checked by the salt removing rate tester to generate an opening and closing signal of the treated water supply valve, return valve and concentrated water control valve.

Abstract translation: 目的：提供一种超纯水制造装置和使用该超纯水的超纯水的制造方法，其将处理后的水回收至原水供给槽，或者当自动控制供给的处理水和浓缩水的排出量时 脱盐率与参考值相比是异常的。 构成：装置（1）包括预处理过滤器（7），其主要过滤从原水供应罐（3）供应的原水中所含的细颗粒，第一反渗透膜装置（11）去除包含在水中的盐 通过预处理过滤器过滤，第二反渗透膜装置（13），其去除由第一反渗透膜装置分离的浓缩水中所含的盐，安装在经处理的供水管线（15）上的去盐率测试器（19） ）检查处理水的去盐率，处理水供给阀（21），其配置在处理后的供水管路上以打开和关闭经处理的供水管线;打开和关闭返回管线的回流阀（25） （23），其从经处理供水管和第二反渗透膜装置之间的处理供水管连接到原水供给箱;浓缩水控制阀（29） 由第二反渗透膜装置分离的浓缩水通过的管线（27）和控制器（31），比较由除盐率检测器检查的盐去除率的数据，生成处理后的供水的开闭信号 阀门，回流阀和浓缩水控制阀。

公开(公告)号：KR1020040060439A

公开(公告)日：2004-07-06

申请号：KR1020020087236

申请日：2002-12-30

Applicant: 삼성전자주식회사

Inventor： 함창열 ,  김선필 ,  최승걸

IPC: H01L21/304

Abstract: PURPOSE: An ultra-pure water supply system is provided to supply the ultra-pure water of the high purity by removing impurities from the ultra-pure water. CONSTITUTION: An ultra-pure water supply system includes an ultra-pure water tank, a lamp disinfection bath, a polisher, a filter unit, a disinfection solution supply unit, and an acid wastewater tank. The ultra-pure water tank(11) is used for supplying or collecting the ultra-pure water to or from a semiconductor fabrication apparatus. The lamp disinfection bath(13,15) is used for removing bacteria from the ultra-pure water of the ultra-pure water tank. The polisher(17) is used for removing ions from the disinfected water of the lamp disinfection bath. The filter unit(19) is used for filtering impurities of the ultra-pure water of the polisher. The disinfection solution supply unit(20) supplies the disinfection solution to an ultra-pure water pipeline. The acid-wastewater tank(30) is used for storing the collected water.

Abstract translation: 目的：提供超纯水供应系统，通过从超纯水中除去杂质来提供高纯度的超纯水。 规定：超纯水供应系统包括超纯水箱，灯消毒浴，抛光机，过滤器单元，消毒溶液供应单元和酸性废水箱。 超纯水箱（11）用于向半导体制造设备供应或收集超纯水。 灯消毒浴（13,15）用于从超纯水罐的超纯水中除去细菌。 抛光机（17）用于从灯消毒浴的消毒水中除去离子。 过滤器单元（19）用于过滤抛光机超纯水的杂质。 消毒溶液供应单元（20）将消毒溶液供应给超纯水管道。 酸性废水箱（30）用于收集收集的水。