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公开(公告)号：KR20210024708A
公开(公告)日：2021-03-08
申请号：KR1020190104164A
申请日：2019-08-26
Applicant: 성균관대학교산학협력단
CPC classification number: C23C14/042 , B29C67/24
Abstract: 본원은 일정한 패턴으로 패터닝된 나노 홀을 포함하는 제 1 층 및 상기 제 1 층 상에 형성되고, 마이크로 홀을 포함하는 제 2 층을 포함하는, 증착용 마스크에 관한 것이다:
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Patent Agency Ranking
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公开(公告)号：KR101465322B1
公开(公告)日：2014-12-10
申请号：KR1020130031843
申请日：2013-03-26
Applicant: 성균관대학교산학협력단
Abstract: 본발명은반사방지필름및 그제조방법에관한것으로, 본발명에따른반사방지필름은기재필름및 상기기재필름의일면에종횡비 1 내지 5의나노기둥이 9 x 10내지 1.1 x 10개/cm의밀도로형성되어이루어진나노기둥패턴을갖는반사방지층을포함하는것을특징으로하며, 나노기둥패턴에대응하는음각의나노기공패턴이형성된몰드를준비하는단계; 기재필름의일면에활성에너지선경화형조성물을도포하는단계; 상기기재필름상에도포된활성에너지선경화형조성물이상기몰드의나노기공에대향하도록정렬하는단계; 및한 쌍의실린더형가압롤러를이용하는롤링방식으로상기대향정렬된기재필름과몰드를가압접촉시켜나노기둥으로이루어진반사방지층을형성하면서기재필름을전진시키는단계; 상기가압롤러를통과한기재필름에활성에너지선을조사하여상기반사반지층을경화시키는단계를포함하는방법에의해제조된다.
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公开(公告)号：KR1020140117038A
公开(公告)日：2014-10-07
申请号：KR1020130031843
申请日：2013-03-26
Applicant: 성균관대학교산학협력단
Abstract: The present invention relates to an anti-reflection film and a manufacturing method thereof. The anti-reflection film includes an anti-reflection layer which comprises: a basic film material; and a nanocolumn pattern formed on one side of the basic material film where nanocolumns with a 1-5 ratio exsits a density of 9x10^7-1.1x10^8 piece/cm^2. The manufacturing method comprises: a step of preparing a mold with an engraved nanoporous pattern corresponding to the nanocolumn pattern; a step of coating active energy ray hardening compositions on one side of the basic material film; a step of aligning the active energy ray hardening compositions coated on the basic material film towards the nanoporous pattern on the mold; a step of advancing the basic material film while forming an anti-reflection layer composed of nanocolumns by pressurizing and touching the basic material film and the mold aligned facing each other in a rolling method using a pair of cylindrical pressurizing rollers; and a step of hardening the anti-reflection layer by radiating the active energy rays on the basic material film having passed the pressurizing roller.
Abstract translation: 防反射膜及其制造方法技术领域本发明涉及防反射膜及其制造方法。 防反射膜包括抗反射层，其包括：基本膜材料; 以及形成在碱性材料膜的一侧上的纳米柱图案，其中具有1-5比例的纳米柱的密度为9×10 ^ 7-1.1×10 ^ 8片/ cm 2。 该制造方法包括：准备具有对应于纳米柱图案的雕刻纳米孔图案的模具的步骤; 将活性能量射线硬化组合物涂覆在基材薄膜的一面上的步骤; 将涂覆在基材材料膜上的活性能量射线硬化组合物对准模具上的纳米多孔图案的步骤; 通过使用一对圆筒形加压辊以滚压方式对基材材料膜和模具进行加压接触而形成由纳米柱构成的防反射层的步骤， 以及通过在通过加压辊的基材膜上照射活性能量射线来使抗反射层硬化的步骤。
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