장척 기재 연속처리용인 반송기구, 그것을 이용한 처리장치및 박막형성장치, 및 그것에 의해서 얻어지는 장척부재
    1.
    发明公开
    장척 기재 연속처리용인 반송기구, 그것을 이용한 처리장치및 박막형성장치, 및 그것에 의해서 얻어지는 장척부재 无效
    用于连续加工优质基材的进料机构,加工设备和薄膜成型设备使用其,以及最终生产的成员

    公开(公告)号:KR1020070109841A

    公开(公告)日:2007-11-15

    申请号:KR1020070042898

    申请日:2007-05-03

    Abstract: A feeding device for controlling an elongated base material continuously, a control device thereof, a thin film forming device, and an elongated member are provided to feed the elongated base material at constant speed by giving adequate tensile force to the base material and to improve size accuracy of a longitudinal direction for the base material favorably. A feeding device for controlling an elongated base material includes a base ground supplying the elongated base material(1) continually and controlling the elongated base material physically and chemically at predetermined speed. The base material receives tensile force(T1) of an opposite direction for a feeding direction from a returning direction for the base ground, frictional force(F) from the base ground, and the tensile force(T2) of the feeding direction from the returning direction of the base ground, separately. F is larger than T1, and T1 is larger than T2. Deviation of thickness for the elongated base material at a longitudinal direction for a surface layer formed through whole length of the base material is in a range of ±10% of an average value.

    Abstract translation: 提供用于连续控制细长基材的进料装置,其控制装置,薄膜​​形成装置和细长构件,以通过向基材提供适当的拉伸力并提高尺寸以恒定速度供给细长基材 基材的长度方向的精度有利。 用于控制细长基材的进料装置包括连续提供细长基材(1)的基底面,并以预定速度物理和化学地控制细长的基材。 基材从基座的返回方向,从基座的摩擦力(F)和从返回的基准接地的馈送方向的拉伸力(T2)接收进给方向的相反方向的拉伸力(T1) 基地方向分开。 F大于T1,T1大于T2。 对于通过基材全长形成的表层,在长度方向上的细长基材的厚度偏差在±10%的平均值的范围内。

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