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公开(公告)号:KR1020080072866A
公开(公告)日:2008-08-07
申请号:KR1020087012280
申请日:2006-10-23
Applicant: 아토테크더치랜드게엠베하
CPC classification number: H05K3/383 , C23F1/18 , C23F1/46 , C23F3/06 , C23G1/103 , H05K2203/0796 , H05K2203/124 , B05D1/02 , C09K13/00 , C23F1/02 , H01L21/302 , H05K3/0017
Abstract: The present invention relates to a method for treating copper or copper alloy surfaces for tight bonding to polymeric substrates, for example solder masks found in multilayer printed circuit boards. The substrate generally is a semiconductor-device, a lead frame or a printed circuit board.
Abstract translation: 本发明涉及一种用于处理铜或铜合金表面以紧密粘合到聚合物基材上的方法,例如在多层印刷电路板中发现的焊接掩模。 基板通常是半导体器件,引线框架或印刷电路板。
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公开(公告)号:KR101409496B1
公开(公告)日:2014-07-02
申请号:KR1020077026692
申请日:2006-05-26
Applicant: 아토테크더치랜드게엠베하
IPC: G03F7/30
CPC classification number: G03F7/425
Abstract: 본 발명은 미세 라인 레지스트 스트리핑 방법에 관한 것으로, 더욱 상세하게는, 특히, 50㎛, 바람직하게는 25㎛ 이하의 크기를 특징으로 하는 미세라인 포토레지스트 필름에 적합한 기판상에서 포토레지스트 필름을 잔류물 없이 효율적으로 스트리핑하는 방법을 제공하는 동시에 미세 라인 스트리핑에 특히 적합하게 적용되는 용액의 수명을 강화하는 것이다.
포토레지스트, 스트리핑, 스트리핑 강화제-
公开(公告)号:KR1020080016804A
公开(公告)日:2008-02-22
申请号:KR1020077026692
申请日:2006-05-26
Applicant: 아토테크더치랜드게엠베하
IPC: G03F7/30
CPC classification number: G03F7/425
Abstract: The invention relates to a 2-step stripping process comprising the following stripping steps: a) treating the substrate with an aqueous solution containing a base, b) thereafter further treating the substrate with a solution containing a base and at least one stripping enhancer selected from the group consisting of hexylene glycol, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol monoisopropyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, diethylene glycol monobutyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monobutyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, triethylene glycol monopropyl ether, triethylene glycol monobutyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether, tripropylene glycol monopropyl ether, tripropylene glycol monobutyl ether, diethylenglycolmonoisopropyl ether and propylene glycol monomethyl ether acetate.
Abstract translation: 本发明涉及两步汽提方法,其包括以下汽提步骤:a)用含有碱的水溶液处理底物,b)然后用含有碱和至少一种剥离增强剂的溶液进一步处理底物, 由己二醇,乙二醇单乙醚,乙二醇单丁醚,乙二醇单异丙醚,丙二醇单甲醚,丙二醇单乙醚,丙二醇单丁醚,二甘醇单甲醚,二甘醇单乙醚,二甘醇单乙醚,二甘醇单丙基醚 醚,二甘醇单丁醚,二丙二醇单甲醚,二丙二醇单乙醚,二丙二醇单丙醚,二丙二醇单丁醚,三甘醇单甲醚,三甘醇单乙醚,三甘醇单丙醚,三甘醇单丁醚,三丙二醇单体 三乙二醇单乙醚,三丙二醇单丙醚,三丙二醇单丁醚,二乙二醇单异丙醚和丙二醇单甲醚乙酸酯。
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