반도체 전계 효과 트랜지스터, 메모리 셀 및 메모리 장치
    1.
    发明公开
    반도체 전계 효과 트랜지스터, 메모리 셀 및 메모리 장치 无效
    半导体场效应晶体管,存储单元和存储器件

    公开(公告)号:KR1020090006097A

    公开(公告)日:2009-01-14

    申请号:KR1020087025440

    申请日:2006-03-20

    Abstract: Semiconductor device (1; 38, 48) formed by a first conductive strip (10) of semiconductor material; a control gate region (7; 35; 55) of semiconductor material, facing a channel portion (5c) of the first conductive strip,-and an insulation region (6; 32; 52) arranged between the first conductive strip and the control gate region. The first conductive strip (10) includes a conduction line (5) having a first conductivity type and a control line (4) having a second conductivity type, arranged adjacent and in electrical contact with each other, and the conduction line (5) forms the channel portion (5c), a first conduction portion (5a) and a second conduction portion (5b) arranged on opposite sides of the channel portion.

    Abstract translation: 由半导体材料的第一导电条(10)形成的半导体器件(1; 38,48) 面对第一导电条的沟道部分(5c)的半导体材料的控制栅极区域(7; 35; 55)和布置在第一导电条和控制栅极之间的绝缘区域(6; 32; 52) 地区。 第一导电条(10)包括具有第一导电类型的导线(5)和具有第二导电类型的控制线(4),彼此相邻并且彼此电接触,导线(5)形成 通道部分(5c),布置在通道部分的相对侧上的第一导电部分(5a)和第二导电部分(5b)。

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