Abstract:
PURPOSE: An oxide thin film transistor biosensor is provided to show reliability and reproducibility, superior resistance to environmental stress and heat, and superior electrical characteristics. CONSTITUTION: A field effect transistor comprises: a substrate (200); a gate electrode (210) which is formed on the substrate; a gate insulation film (220) which is formed on the gate electrode; an oxide semiconductor layer (230) which is formed on the gate insulation film; and a source (240) and a drain electrode (250) which are formed on the oxide semiconductor layer to expose the oxide semiconductor layer. A field effect transistor biosensor detects components of a biomaterial (260) through current-voltage characteristics by bonding the biomaterial to a part of the oxide semiconductor layer which is exposed between the source and the drain electrode.
Abstract:
본 발명은 바이오 센서 및 그를 제조하는 제조 방법에 관한 것이다. 본 발명의 일 실시예에 따른 바이오 센서는, 기판; 상기 기판 위에 형성된 게이트; 상기 게이트 위에 형성된 게이트 절연 층; 상기 게이트 절연 층 위에 적층된 다수의 산화물 반도체 층; 및 상기 산화물 반도체 층 위에 형성된 소스 및 드레인;을 포함할 수 있다.
Abstract:
본 발명은 용액 공정을 이용한 니켈 산화물 박막의 형성 방법과 상기 방법으로 형성된 니켈 산화물층을 포함하는 유기 태양전지의 제작 공정에 관한 것으로써, 특히 니켈 산화물 박막을 유기 태양전지의 버퍼층으로 도입하여, 기존의 유기 태양전지의 장점인 공정의 편이성을 잃지 않으면서도, 유기 태양전지의 특성을 향상하고 안정성을 확보하는 것을 목표로 한다.
Abstract:
PURPOSE: A composition for forming an oxide thin film, a method for manufacturing the oxide thin film, and a method for manufacturing a thin film transistor are provided to control an electric property of the oxide thin film by controlling the amount of light energy and/or the density of oxygenated water in precursor solutions. CONSTITUTION: Precursor solutions are made by mixing precursor materials with oxygenated materials(S110). The precursor solutions are coated on a substrate(S120). The substrate is thermally pre-processed to evaporate the solvents of the precursor solutions(S130). The substrate is thermally post-processed to form an oxide thin film(S140). [Reference numerals] (AA) Start; (BB) End; (S110) Forming precursor solution by mixing precursor materials with oxygenated materials; (S120) Coating the precursor solution on a substrate; (S130) Pre-process; (S140) Post-process; (S150) Supplying light energy
Abstract:
PURPOSE: An organic thin film adding CuO nano materials and an electronic device using the same are provided to obtain high permeability and high hole conductivity by adding CuO nano materials to the thin film. CONSTITUTION: CuO nano materials are mixed with PEDOT:PSS aqueous solutions. A thin film is formed by spin-casting the mixture on an anode. A work function of the thin film is reduced by thermally processing the thin film at 100 to 150 degrees centigrade. The CuO nano materials include CuO nano powder, CuO nano particles. CuO nano rods, and CuO nano wires.
Abstract:
PURPOSE: A method for manufacturing an oxide thin film and a method for manufacturing an oxide thin film transistor are provided to reduce production costs by reducing use of expensive substances like indium. CONSTITUTION: A gate electrode is formed on a substrate. A gate insulating layer(220') is formed on the gate electrode. A channel layer(230') is formed on the gate insulating layer. A source electrode(240) and a drain electrode(250) are formed on the channel layer. An oxide thin film is formed on the substrate in a channel layer formation step. Oxygen hole concentration of the oxide thin film increases in the channel layer formation step.
Abstract:
PURPOSE: A nickel oxide thin film and a method for manufacturing an organic solar cell using the same are provided to efficiently transmit holes from an active layer to an anode by forming a buffer layer between the active layer and an electrode to increase hole transmission performance. CONSTITUTION: A nickel oxide precursor is prepared(100). A precursor solution is made using nickel precursor powder(200). A thin film is deposited by coating the substrate with nickel oxide precursor solutions(300). Solvents are volatilized by a pre-treatment in the deposited thin film(400). A lattice structure is formed in the thin film by a post-treatment in the thin film(500). [Reference numerals] (100) Preparing metal precursor for a solution process of a nickel oxide thin film; (200) Manufacturing a solution by dissolving a composition which is produced by mixing nickel precursors in solvent; (300) Laminating thin films by spreading the final solution of a precursor; (400) Volatilizing solvent by thermally processing laminated thin films; (500) Forming a lattice structure within a thin film by thermally processing laminated thin films again; (600) Laminating oxide indium-tin electrodes; (700) Volatilizing solvent by thermally processing an activation layer solution and by spreading the activation layer solution on a buffer layer in an anaerobic environment; (800) Laminating lithium fluoride, an aluminum electrode; (AA) Start; (BB) End
Abstract:
The present invention relates to a method for treating a resistive memory device and a method for manufacturing a resistive memory device using the same. The method for treating a resistive memory device, according to an embodiment of the present invention, may include treating the resistive memory device at a temperature higher than 25°C and lower than 300°C with a pressure greater than atmospheric pressure in a hydrogen atmosphere.