公开(公告)号：KR100782555B1

公开(公告)日：2007-12-06

申请号：KR1020070017705

申请日：2007-02-22

Applicant: 이화여자대학교 산학협력단

Inventor： 박일흥 ,  박재형 ,  김용권 ,  유병욱 ,  문경화

IPC: B81B7/02 ,  G02B26/08

Abstract: A method for forming addressing lines in a MEMS mirror array is provided to improve fill-factor of the MEMS mirror array by reducing a dead area due to the addressing lines. A method for forming addressing lines in a MEMS(Micro-Electro-Mechanical System) mirror array includes the steps of: preparing a space to arrange the addressing lines by etching a substrate under the MEMS mirror array; arranging the addressing lines to be bonded with a driving electrode of a specific MEMS mirror cell to protrude on a board and the addressing lines to be bonded with a driving electrode of the other MEMS mirror cell to pass under the specific MEMS mirror cell in the prepared space; and bonding the driving electrode of each MEMS mirror cell forming the MEMS mirror array with the corresponding addressing line.

Abstract translation: 提供了一种用于在MEMS反射镜阵列中形成寻址线的方法，以通过减少由于寻址线引起的死区来改善MEMS反射镜阵列的填充因子。 一种用于在MEMS（微机电系统）镜阵列中形成寻址线的方法包括以下步骤：通过蚀刻MEMS反射镜阵列下的衬底来制备用于布置寻址线的空间; 将要与特定MEMS镜单元的驱动电极接合的寻址线布置在板上，并且要与另一MEMS镜单元的驱动电极接合的寻址线在所制备的特定MEMS镜电池下通过 空间; 以及将形成MEMS反射镜阵列的每个MEMS镜单元的驱动电极与相应的寻址线接合。