公开(公告)号：KR1020070001184A

公开(公告)日：2007-01-03

申请号：KR1020067018655

申请日：2005-04-28

Applicant: 토요잉크SC홀딩스주식회사

Inventor： 모치즈키쇼이치 ,  도미나가히로시 ,  시게모리가즈노리 ,  하타노노조무 ,  오키아이히데키 ,  아마노유키오

IPC: C08L33/00 ,  C08K3/00 ,  C08J5/18

CPC classification number: C08F2/50 ,  B32B27/00 ,  C09D5/00 ,  C09D133/06

Abstract: Disclosed is a photocurable composition containing a photocurable material including at least one compound (A) represented by the general formula (1) below and a filler (B) having a refractive index of not less than 1.60. (1) (In the formula, R1- R3 independently represent a hydrogen atom or a methyl group; R4- R6 independently represent an unsubstituted or substituted, straight or branched chain alkylene group; R7 represents hydrogen or a monovalent organic group; and R8 represents a tetravalent aromatic group. In this connection, at least one of R7 and R8 contains a biphenyl skeleton.) Also disclosed is an antireflective film wherein a high-refractive-index hard coat layer composed of such a photocurable composition and a low-refractive-index layer having a refractive index of 1.20-1.50 are sequentially arranged on one side of a plastic base. ® KIPO & WIPO 2007

Abstract translation: 公开了一种含有光固化性材料的光固化性组合物，其含有至少一种下述通式（1）表示的化合物（A）和折射率不小于1.60的填料（B）。 （1）（式中，R 1〜R 3分别独立地表示氢原子或甲基; R 4 -R 6分别表示未取代或取代的直链或支链亚烷基，R7表示氢或一价有机基团，R8表示 在这方面，R7和R8中的至少一个含有联苯骨架。）还公开了一种抗反射膜，其中由这种光固化性组合物构成的高折射率硬涂层和低折射率硬涂层， 折射率为1.20-1.50的折射率层依次布置在塑料基底的一侧上。 ®KIPO＆WIPO 2007