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Patent Agency Ranking
公开(公告)号：KR1020070001184A
公开(公告)日：2007-01-03
申请号：KR1020067018655
申请日：2005-04-28
Applicant: 토요잉크SC홀딩스주식회사
CPC classification number: C08F2/50 , B32B27/00 , C09D5/00 , C09D133/06
Abstract: Disclosed is a photocurable composition containing a photocurable material including at least one compound (A) represented by the general formula (1) below and a filler (B) having a refractive index of not less than 1.60. (1) (In the formula, R1- R3 independently represent a hydrogen atom or a methyl group; R4- R6 independently represent an unsubstituted or substituted, straight or branched chain alkylene group; R7 represents hydrogen or a monovalent organic group; and R8 represents a tetravalent aromatic group. In this connection, at least one of R7 and R8 contains a biphenyl skeleton.) Also disclosed is an antireflective film wherein a high-refractive-index hard coat layer composed of such a photocurable composition and a low-refractive-index layer having a refractive index of 1.20-1.50 are sequentially arranged on one side of a plastic base. ® KIPO & WIPO 2007
Abstract translation: 公开了一种含有光固化性材料的光固化性组合物，其含有至少一种下述通式（1）表示的化合物（A）和折射率不小于1.60的填料（B）。 （1）（式中，R 1〜R 3分别独立地表示氢原子或甲基; R 4 -R 6分别表示未取代或取代的直链或支链亚烷基，R7表示氢或一价有机基团，R8表示 在这方面，R7和R8中的至少一个含有联苯骨架。）还公开了一种抗反射膜，其中由这种光固化性组合物构成的高折射率硬涂层和低折射率硬涂层， 折射率为1.20-1.50的折射率层依次布置在塑料基底的一侧上。 ®KIPO＆WIPO 2007
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公开(公告)号：KR101536366B1
公开(公告)日：2015-07-13
申请号：KR1020097011224
申请日：2007-11-02
Applicant: 토요잉크SC홀딩스주식회사
CPC classification number: C08F283/006 , C08F290/06 , C08F290/067 , C08G18/0823 , C08G18/44 , C08G18/6659 , C08G18/6692 , C08G18/674 , C09D175/16 , G03F7/027 , G03F7/035 , H05K3/287
Abstract: 본발명은카르복실기함유감광성우레탄수지(A)와, 광중합개시제(B)와, 감광성에틸렌성불포화기함유화합물(C)을포함하는감광성수지조성물로서, 카르복실기함유감광성우레탄수지(A)가, 폴리머폴리올(e), 분자중에 2개의수산기를갖는카르복실산화합물(f), 및디이소시아네이트화합물(g)을필수성분으로서반응해서되는카르복실기함유우레탄프리폴리머(a) 중의카르복실기와, 에폭시기또는옥세탄기와에틸렌성불포화기를갖는화합물(b) 중의에폭시기또는옥세탄기를반응해서되는수산기함유우레탄프리폴리머(c) 중의수산기와, 산무수물기함유화합물(d) 중의산무수물기를반응시켜서되는수지인것을특징으로하는감광성수지조성물을기재한다. 상기조성물은, 활성에너지선에대한감광성이우수하고, 미세한패턴형성이가능한동시에, 그경화도막이플렉시블성, 절연성, 밀착성, 납땜내열성, 도막내성, 난연성등이우수하여, 포토솔더레지스트에적합하게사용된다.
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公开(公告)号：KR101866332B1
公开(公告)日：2018-07-04
申请号：KR1020120068578
申请日：2012-06-26
Applicant: 토요잉크SC홀딩스주식회사 , 토요켐주식회사
CPC classification number: Y02T10/6217 , Y02T10/7005 , Y02T10/7077
Abstract: (과제) 경화도막이플렉시블성, 절연성, 밀착성등이우수하고, 포토솔더레지스트에적합하게사용되는감광성수지조성물을제공한다. (해결수단) 감광성수지(A), 에폭시기함유화합물, 비블록화이소시아네이트화합물, 블록화이소시아네이트화합물및 β-하이드록시알킬아미드기함유화합물로부터선택되는적어도 1종인화합물및 광중합개시제를포함하는조성물이며, 감광성수지(A)가, 1분자중에적어도 2개의에폭시기를갖는에폭시화합물(a)과, 1분자중에적어도 2개의페놀성수산기를갖는페놀화합물(b)로부터측쇄하이드록실기함유수지(c)를얻고, 상기 (c)와다염기산무수물(d)로부터카복실기함유수지(e)를얻고, 상기 (e)와, 에폭시기또는옥세탄기와, 에틸렌성불포화기를갖는화합물(f) 중의에폭시기또는옥세탄기로부터얻은수지이다.
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4.发明公开감광성 수지 조성물 및 그의 경화물, 그리고 감광성 솔더 레지스트 잉크, 드라이 필름형 감광성 솔더 레지스트 및, 감광성 수지의 제조 방법 审中-实审感光树脂组合物，其固化产品，感光性耐焊锡墨水，干膜型感光性耐火材料，以及生产感光树脂的方法
公开(公告)号：KR1020130004110A
公开(公告)日：2013-01-09
申请号：KR1020120068578
申请日：2012-06-26
Applicant: 토요잉크SC홀딩스주식회사 , 토요켐주식회사
CPC classification number: Y02T10/6217 , Y02T10/7005 , Y02T10/7077 , G03F7/0045 , G03F7/004 , G03F7/027 , G03F7/032 , G03F7/20 , G03F7/2002
Abstract: PURPOSE: A photosensitive resin composition, a manufacturing method of cured products, photo solder resist ink, a dry film style photo solder resist, and a photosensitive resin are provided to enhance photosensitivity for an active energy ray. CONSTITUTION: A photosensitive resin composition comprises a photosensitive resin, an epoxy group-containing compound, a deblocking isocyanate group-containing compound, one or more a compound selected from a group consisting of beta-hydroxyalkyl amide group-containing compound and a blocking isocyanate group-containing compound, and a photopolymerization initiator. The photosensitive resin is a hydroxyl group containing photosensitive resin.
Abstract translation: 目的：提供感光性树脂组合物，固化物的制造方法，光阻焊油墨，干膜型光阻焊剂和感光性树脂，以提高活性能量射线的光敏性。 构成：感光性树脂组合物含有感光性树脂，含环氧基的化合物，含脱模异氰酸酯基的化合物，一种或多种选自含有β-羟基烷基酰胺基的化合物和封端异氰酸酯基的化合物 的光聚合引发剂。 感光性树脂是含有羟基的感光性树脂。
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公开(公告)号：KR1020090082264A
公开(公告)日：2009-07-29
申请号：KR1020097011224
申请日：2007-11-02
Applicant: 토요잉크SC홀딩스주식회사
CPC classification number: C08F283/006 , C08F290/06 , C08F290/067 , C08G18/0823 , C08G18/44 , C08G18/6659 , C08G18/6692 , C08G18/674 , C09D175/16 , G03F7/027 , G03F7/035 , H05K3/287
Abstract: Disclosed is a photosensitive resin composition containing a carboxyl group-containing photosensitive urethane resin (A), a photopolymerization initiator (B) and a photosensitive ethylenically unsaturated group-containing compound (C). This photosensitive resin composition is characterized in that the carboxyl group-containing photosensitive urethane resin (A) is a resin obtained by reacting a hydroxy group in a hydroxy group-containing urethane prepolymer (c) with an acid anhydride group in an acid anhydride group-containing compound (d). The hydroxy group-containing urethane prepolymer (c) is obtained by reacting a carboxyl group in a carboxyl group-containing urethane prepolymer (a), which is obtained by reacting a polymer polyol (e), a carboxylic acid compound (f) having two hydroxy groups in a molecule and a diisocyanate compound (g) as essential ingredients, with an epoxy group or an oxethane group in a compound (b) having an epoxy group or an oxethane group and an ethylenically unsaturated group. This photosensitive resin composition is excellent in sensitivity to an active energy ray and enables to form a fine pattern. A cured coating film of the photosensitive resin composition is excellent in flexibility, insulating property, adhesion, solder heat resistance, coating film resistance and flame retardance, and is thus suitably used for a photosolder resist.
Abstract translation: 公开了含有含羧基的光敏聚氨酯树脂（A），光聚合引发剂（B）和含感光烯属不饱和基团的化合物（C）的感光性树脂组合物。 该感光性树脂组合物的特征在于，含羧基的感光性聚氨酯树脂（A）是将含羟基的氨基甲酸酯预聚物（c）中的羟基与酸酐基的酸酐基反应而得到的树脂， （d）。 含羟基的氨基甲酸酯预聚物（c）通过使含羧基的氨基甲酸酯预聚物（a）中的羧基与聚合物多元醇（e），羧酸化合物（f） 作为必需成分的分子中的羟基和二异氰酸酯化合物（g），具有环氧基或氧乙烷基和烯属不饱和基的化合物（b）中具有环氧基或氧乙烷基。 该感光性树脂组合物对活性能量射线的敏感性优异，能够形成精细图案。 感光性树脂组合物的固化涂膜的柔软性，绝缘性，粘附性，焊料耐热性，涂膜电阻和阻燃性优异，因此适合用于耐光蚀剂。
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