公开(公告)号：KR100921932B1

公开(公告)日：2009-10-15

申请号：KR1020070107939

申请日：2007-10-25

Applicant: 포항공과대학교 산학협력단

Inventor： 황찬국 ,  전철호 ,  신현준 ,  문상운

IPC: H01L21/027

Abstract: 본 발명은 다원자분자를 이용한 패터닝방법에 관한 것으로서, 본 발명에 따르면, 극자외선 또는 소프트 엑스레이를 사용하여 EUV에 의한 다원자분자막의 변화 (질화(nitridation),산화(oxidation) 등)를 유도하고 실리콘기판의 표면에 패턴을 형성시킴으로써 -NH
2 , -OH 등의 작용기를 이용하여 미세한 수준에서 정밀도가 높은 패턴을 형성시킬 수 있는 기술이 개시된다.
리소그래피, EUV, 패터닝, 흡착, NH₃H₂O, 다원자분자

公开(公告)号：KR1020090042059A

公开(公告)日：2009-04-29

申请号：KR1020070107939

申请日：2007-10-25

Applicant: 포항공과대학교 산학협력단

Inventor： 황찬국 ,  전철호 ,  신현준 ,  문상운

IPC: H01L21/027

CPC classification number: G03F7/70033 ,  B82Y40/00

Abstract: A patterning method using a polyatomic molecule is provided to perform a minute surface pattering by using an extreme ultraviolet, a soft X ray, and a polyatomic molecule. A molecule layer(102) is formed by absorbing a polyatomic molecule on a surface of a solid. The polyatomic molecule is NH2 or H2O. A pattern is formed by selectively irradiating an extreme ultraviolet or a soft X-ray on a part of the surface of the molecule layer. A silicone substrate on which the molecule layer is formed is positioned inside a chamber of an ultra high vacuum state. A molecule pattern is formed by absorbing a functional molecule to the pattern.

Abstract translation: 提供使用多原子分子的图案化方法，通过使用极紫外线，软X射线和多原子分子来执行微小表面图案。 通过吸收固体表面上的多原子分子形成分子层（102）。 多原子分子是NH2或H2O。 通过在分子层的表面的一部分上选择性地照射极紫外线或软X射线来形成图案。 形成有分子层的有机硅基板位于超高真空状态的室内。 通过将功能分子吸收到图案形成分子图案。

公开(公告)号：KR100888886B1

公开(公告)日：2009-03-17

申请号：KR1020070097459

申请日：2007-09-27

Applicant: 포항공과대학교 산학협력단

Inventor： 황찬국 ,  전철호 ,  신현준 ,  문상운

IPC: H01L21/027

CPC classification number: G03F7/2008 ,  B82Y40/00 ,  G03F7/70841

Abstract: A patterning method using monatomic molecule is provided to realize the surface patterning elaborate and minute by using the extreme ultraviolet radiation with short wave length. The monatomic molecule is absorbed to the surface of the solid and forms the molecule layer. The contaminant layer is formed on the surface of the formed molecule layer. The extreme ultraviolet radiation or the soft X-ray(Soft X-ray) is selectively irradiated onto the surface of the formed contaminant layer and the pattern is formed. The silicon substrate in which the contaminant layer is formed is positioned within the chamber with the ultra-high vacuum state, the extreme ultraviolet radiation or the soft X-ray is irradiated.

Abstract translation: 提供使用单原子分子的图案化方法，通过使用具有短波长的极紫外线辐射来实现表面图案的精细化和细微化。 单原子分子被吸收到固体的表面并形成分子层。 污染物层形成在形成的分子层的表面上。 将极紫外线或软X射线（软X射线）选择性地照射到形成的污染物层的表面上，形成图案。 其中形成污染物层的硅衬底位于具有超高真空状态的室内，照射极紫外线或软X射线。