公开(公告)号：KR101429118B1

公开(公告)日：2014-08-14

申请号：KR1020130012165

申请日：2013-02-04

Applicant: 한국과학기술연구원

Inventor： 송진동 ,  이은혜 ,  배민환 ,  최원준 ,  윤재진 ,  한일기

IPC: G02B1/113 ,  B32B15/01 ,  B82Y30/00

CPC classification number: H01L31/02168 ,  H01L33/44 ,  Y02E10/50 ,  G02B1/113 ,  B32B15/01 ,  B82Y30/00

Abstract: According to an embodiment of the present invention, disclosed is a method for manufacturing an antireflection film using a self-assembly nanostructure, including a step for forming a first metal drop by using drop feed growth on a substrate; a step for depositing a first nonmetal onto the first metal drop; and a step for forming a first nanocompound crystal through the self-assembly of the deposited first nonmetal and first metal drop.

Abstract translation: 根据本发明的一个实施方案，公开了一种使用自组装纳米结构制造抗反射膜的方法，其包括通过在基板上使用液滴进料生长形成第一金属液滴的步骤; 用于将第一非金属沉积到所述第一金属滴上的步骤; 以及通过沉积的第一非金属和第一金属液滴的自组装形成第一纳米复合晶体的步骤。