公开(公告)号：KR1020040005105A

公开(公告)日：2004-01-16

申请号：KR1020020039401

申请日：2002-07-08

Applicant: 한국과학기술연구원

Inventor： 박종극 ,  백영준 ,  이욱성 ,  채기웅

IPC: C23C16/22

CPC classification number: C23C16/279 ,  B23B27/148 ,  B23B2228/04 ,  C23C16/271 ,  C23C16/274

Abstract: PURPOSE: A method for refining particle size of deposited diamond film, particularly, particle size of the edge of the cutting tool by consistently applying negative bias to the cutting tool from the outside in the diamond film deposition process is provided, and a diamond film deposited cutting tool used in the method is provided. CONSTITUTION: The method comprises the process of depositing a diamond film on a cutting tool matrix using vapor chemical deposition and applying a negative bias to the cutting tool so that a bias lower than other electrodes is impressed to the surface of the cutting tool from the outside at the same time, thereby coating on the surface of the tool a diamond film which has fine particle size on the edge compared to the central part of the tool. In a cutting tool on the surface of which diamond film is deposited using vapor chemical deposition, the diamond film deposited cutting tool is characterized in that a diamond film which has a micro particle size of 0.1 to 5 μm and has finer particle size on the edge compared to the central part of the same surface of the tool is coated on the surface of the tool by impressing a negative bias to the cutting tool so that a bias lower than other electrodes is impressed to the surface of the cutting tool from the outside at the same time as the diamond film is being deposited on the cutting tool.

Abstract translation: 目的：提供一种通过在金刚石膜沉积工艺中从外部一致地向切割工具施加负偏压来提纯沉积金刚石膜的颗粒尺寸，特别是切割工具的边缘的粒度的方法，并且沉积金刚石膜 提供了该方法中使用的切削工具。 构成：该方法包括使用蒸汽化学沉积在切割工具基体上沉积金刚石膜并向切割工具施加负偏压的过程，使得比其它电极低的偏压从外部施加到切割工具的表面 同时，与工具的中心部分相比，在工具的表面上涂覆了具有细粒度的金刚石膜。 在使用蒸气化学沉积沉积金刚石膜的表面上的切割工具中，金刚石膜沉积切割工具的特征在于，金刚石膜的微粒径为0.1至5μm，并且在边缘上具有更细的粒径 与工具的相同表面的中心部分相比，通过向切割工具施加负偏压而涂覆在工具的表面上，使得比其他电极低的偏压从外部施加到切割工具的表面 同时金刚石膜被沉积在切割工具上。

公开(公告)号：KR1020100086527A

公开(公告)日：2010-08-02

申请号：KR1020090005767

申请日：2009-01-23

Applicant: 한국과학기술연구원

Inventor： 백영준 ,  채기웅 ,  박종극 ,  이욱성

IPC: C04B35/52 ,  C04B35/565 ,  C04B35/584

CPC classification number: C04B41/85 ,  C04B35/573 ,  C04B35/591 ,  C04B41/0054 ,  C04B41/5002 ,  C04B2235/3418 ,  C04B2235/428 ,  C04B2235/945 ,  C04B2235/9646 ,  C04B2235/9669

Abstract: PURPOSE: A diamond film coated ceramic body and a manufacturing method thereof are provided to remove one of two phases from the surface of a processed ceramic body for improving the roughness of the surface of the ceramic body. CONSTITUTION: A manufacturing method of a diamond film coated ceramic body comprises the following steps: obtaining a ceramic body by molding and sintering a mixture composition containing a ceramic particle phase and a matrix phase; removing the matrix phase from the surface of the ceramic body to form a surface layer with micro irregularities; and coating the diamond film on the surface of the ceramic body. The removing step is either a chemical etching or a mechanical etching.

Abstract translation: 目的：提供一种金刚石膜涂覆陶瓷体及其制造方法，以从加工陶瓷体的表面除去两相之一，以改善陶瓷体表面的粗糙度。 构成：金刚石膜涂覆陶瓷体的制造方法，包括以下步骤：通过模制和烧结含有陶瓷颗粒相和基质相的混合物组合物来获得陶瓷体; 从陶瓷体的表面去除基体相以形成具有微小凹凸的表面层; 并将金刚石膜涂覆在陶瓷体的表面上。 去除步骤是化学蚀刻或机械蚀刻。

公开(公告)号：KR100466406B1

公开(公告)日：2005-01-13

申请号：KR1020020039401

申请日：2002-07-08

Applicant: 한국과학기술연구원

Inventor： 박종극 ,  백영준 ,  이욱성 ,  채기웅

IPC: C23C16/22

Abstract: PURPOSE: A method for refining particle size of deposited diamond film, particularly, particle size of the edge of the cutting tool by consistently applying negative bias to the cutting tool from the outside in the diamond film deposition process is provided, and a diamond film deposited cutting tool used in the method is provided. CONSTITUTION: The method comprises the process of depositing a diamond film on a cutting tool matrix using vapor chemical deposition and applying a negative bias to the cutting tool so that a bias lower than other electrodes is impressed to the surface of the cutting tool from the outside at the same time, thereby coating on the surface of the tool a diamond film which has fine particle size on the edge compared to the central part of the tool. In a cutting tool on the surface of which diamond film is deposited using vapor chemical deposition, the diamond film deposited cutting tool is characterized in that a diamond film which has a micro particle size of 0.1 to 5 μm and has finer particle size on the edge compared to the central part of the same surface of the tool is coated on the surface of the tool by impressing a negative bias to the cutting tool so that a bias lower than other electrodes is impressed to the surface of the cutting tool from the outside at the same time as the diamond film is being deposited on the cutting tool.

Abstract translation: 目的：提供一种通过在金刚石膜沉积过程中从外部一致地向切削工具施加负偏压来精炼沉积的金刚石膜的粒度，特别是切削刀具的边缘的粒度的方法，并且沉积金刚石膜 提供了在该方法中使用的切割工具。 构成：该方法包括使用蒸汽化学沉积在切割工具基体上沉积金刚石膜并向切割工具施加负偏压以使得比其他电极低的偏压从外部施加到切割工具表面的过程 同时在工具的表面上涂覆与工具的中心部分相比在边缘上具有精细粒度的金刚石膜。 在使用气相化学沉积法在其表面上沉积金刚石膜的切削工具中，金刚石膜沉积切削工具的特征在于具有0.1至5μm的微粒尺寸并具有更精细颗粒的金刚石膜 与刀具的相同表面的中心部分相比，边缘上的尺寸被涂覆在刀具的表面上，通过向切削刀具施加负偏压，使得比其他电极低的偏压被施加到切削刀具的表面 在钻石膜沉积在切割工具上的同时从外部进行。

公开(公告)号：KR101740964B1

公开(公告)日：2017-05-31

申请号：KR1020160075788

申请日：2016-06-17

Applicant: 한국과학기술연구원 ,  프리시젼다이아몬드 주식회사

Inventor： 박종극 ,  백영준 ,  이욱성 ,  채기웅 ,  류제원

IPC: H01L23/00 ,  H01L21/52 ,  H01L21/48 ,  H01L21/02 ,  H01L21/18

Abstract: 본발명은샹크부와, 상기샹크부의하부에접합되는선단부를포함하는본딩툴로서, 상기선단부는기판과, 상기기판의하면에증착되는증착막을포함하고, 상기샹크부의하부와상기선단부사이에는금속층이개재되며, 상기샹크부의하부면과상기금속층의일면이부분적으로접합되도록하고, 상기금속층의타면과상기선단부의일면이부분적으로접합되도록, 상기금속층의양면에는각각복수의부분접합부가형성되어있는본딩툴에관한것이다.

Abstract translation: 本发明是，接合工具包括接合到下部的柄部和所述柄部的前端部之间的金属层，所述远端部分包括：基板;和包括根据所述基片上沉积一个气相沉积膜，所述柄部分底部和所述远端 插入，并且，所述柄部的下表面和金属层的，并且使得一个表面部分接合，所述金属层的前端表面的表面被部分地结合到，双方，具有多个局部结的接合在金属层的形成 它涉及到的工具。

公开(公告)号：KR100924287B1

公开(公告)日：2009-10-30

申请号：KR1020070045695

申请日：2007-05-10

Applicant: 한국과학기술연구원

Inventor： 이욱성 ,  백영준 ,  정증현 ,  채기웅

IPC: C23C16/50 ,  B82Y30/00

CPC classification number: C23C16/503 ,  C23C16/272 ,  Y10T428/268

Abstract: 본 발명은 양광주가 존재하지 않는 직류 전원 플라스마 증착 장치와, 양광주를 배제한 상태에서의 물질 증착 방법 및 이에 의해 제조된 다이아몬드 박막에 관한 것이다. 본 발명은 반응 챔버 내에 서로 대향하도록 설치된 음극과 양극 사이에 직류 전압을 인가하여 전극 간 공간에 방전을 개시하고 반응 가스를 도입하여, 양극에 장착되어 양극 역할을 겸하는 기판의 표면에 물질을 증착함에 있어, 음극 글로우 및 양극 글로우가 각각 음극 및 기판 표면을 피복하는 박층 형태로 존재하는 반면, 양광주 (positive column)는 존재하지 않거나 무시할 수 있을 정도로 작은 상태에서 물질을 증착하는 것을 특징으로 하는 양광주를 배제한 상태에서의 물질 증착 방법을 제공한다. 본 방법에 의해 제조된 다이아몬드 박막은 균일하고 불순물을 포함하지 않으며 결정질이 우수한 특성을 지닌다.
양광주, 직류 전원, 플라스마, 다이아몬드 박막, 글로우

公开(公告)号：KR100305315B1

公开(公告)日：2001-09-13

申请号：KR1019990012546

申请日：1999-04-09

Applicant: 한국과학기술연구원

Inventor： 백영준 ,  이욱성 ,  은광용 ,  채기웅

IPC: B23P5/00

CPC classification number: C23C14/044 ,  C23C16/0209 ,  C23C16/0254 ,  C23C16/27 ,  Y10T428/30

Abstract: 본발명은다이아몬드막이코팅된절삭공구및 그제조방법에관한것으로, 초경모재에탈탄열처리와탄화열처리작업을실시하여비정상입자성장이일어남에따라초경모재의표면조도가증가되도록한 다음, 그와같이표면조도가증가된초경모재의표면에다이아몬드막을증착하여다이아몬드막의밀착력을향상시키는방법으로, 이와같은다이아몬드막의밀착력향상방법을이용하면모재의타탄화물및 Co의함량과, 초경입자의크기제한없이우수한인성과절삭에문제가없는접착력을갖는다이아몬드막이코팅된절삭공구를제작하는것이가능하다.

公开(公告)号：KR1020080099743A

公开(公告)日：2008-11-13

申请号：KR1020070045695

申请日：2007-05-10

Applicant: 한국과학기술연구원

Inventor： 이욱성 ,  백영준 ,  정증현 ,  채기웅

IPC: C23C16/50 ,  B82Y30/00

CPC classification number: C23C16/503 ,  C23C16/272 ,  Y10T428/268

Abstract: A method for depositing for coating on the surface and the apparatus is provided to deposit on the surface of the substrate introducing the reaction gas and is mounted on anode and serves both the bipolar role for being thus used are provided. A discharge in the space supplying the direct current voltage between the cathode(1) and the anode(2) which is installed in order to be faced with each other within the reaction chamber(5) and goes with electrode are disclosed, material is deposited on the surface of the substrate introducing the reaction gas and is mounted on anode and serves both the bipolar role. A method for depositing material at the state excluding a positive column(4) conducted as follows: a cathode glow(8) and anode glow(9) exist as the coating layer form coating the respective cathode and substrate surface; and the material is deposited in the small state as much as the positive column does not exist or it can ignore.

Abstract translation: 提供沉积在表面上的涂布方法和装置，以沉积在引入反应气体的基板的表面上，并且安装在阳极上并且用于提供这两者的双极作用。 公开了在反应室（5）内与阴极（1）和阳极（2）之间提供直流电压以便彼此面对并与电极相接的空间中的放电，材料沉积 在基板的表面上引入反应气体，并且安装在阳极上并起到双极作用。 存在除了阳极柱（4）以外的状态下沉积材料的方法，如下所述：阴极辉光（8）和阳极辉光（9）作为涂覆各个阴极和基板表面的涂层层形成; 并且材料以小的状态沉积，正极柱不存在或可以忽略。

公开(公告)号：KR1020000065840A

公开(公告)日：2000-11-15

申请号：KR1019990012546

申请日：1999-04-09

Applicant: 한국과학기술연구원

Inventor： 백영준 ,  이욱성 ,  은광용 ,  채기웅

IPC: B23P5/00

CPC classification number: C23C14/044 ,  C23C16/0209 ,  C23C16/0254 ,  C23C16/27 ,  Y10T428/30

Abstract: PURPOSE: A cutting tool coated with diamond film and a producing method thereof are provided to obtain sufficient adhesive force without limitation of the content of decarbonate and carbon monoxide of base material. CONSTITUTION: Decarbonating thermal treatment and carbonate thermal treatment are applied on a carbide base material to increase the roughness of surface of the carbide base material with abnormal particle growth. A diamond film is layered on the surface of the base material to improve the adhesive force of the diamond film. Thereby, a cutting tool coated with diamond film of sufficient adhesive force is produced without limitation of the content of decarbonate and cobalt of base material and without limitation of the size of carbide particle.

Abstract translation: 目的：提供用金刚石膜涂覆的切削工具及其制造方法，以获得足够的粘合力，而不限制基材的碳酸盐和一氧化碳的含量。 构成：碳化物基材上的脱碳热处理和碳酸盐热处理可以增加碳化物基材表面的粗糙度，使其具有异常的颗粒生长。 将金刚石膜层叠在基材的表面上，以提高金刚石膜的粘合力。 由此，制造了具有足够的粘合力的金刚石薄膜的切削工具，而不限制基材的碳酸盐和钴的含量，而不限于碳化物颗粒的尺寸。