Abstract:
The present invention relates to a technique for reducing the propagation of the noise of a harmonic wave component to a substrate due to a signal applied to a TSV. According to the present invention, a semiconductor device includes a TSV penetrating a substrate and receiving a first signal and a bias voltage supply device supplying a bias voltage between the TSV and the substrate to form at least part of a first region defined by a voltage for the substrate of a first signal in a second region. At this time, constant capacitance between the TSV and the substrate is maintained in the second region.
Abstract:
전류 측정 소자는 제1 도전성 패턴 및 적어도 하나의 제2 도전성 패턴을 포함한다. 제1 전도성은 패턴 기판의 제1 면에 형성된다. 적어도 하나의 제2 도전성 패턴은 제1 도전성 패턴 주변에 코일(coil) 구조의 도전 경로가 형성되도록 기판의 제2 면에 위치하는 재배선층(redistribution layer)에 형성된다. 따라서, 전류 측정 소자는 제1 도전성 패턴에 흐르는 입력 전류에 응답하여 코일 구조의 도전 경로 상에 형성되는 유도 전압에 기초하여 입력 전류의 세기를 정밀하게 측정할 수 있다.
Abstract:
PURPOSE: A semiconductor chip, a manufacturing method thereof, and a semiconductor module including the same are provided to improve the timing margin and voltage margin of input and output signals by including a resistance structure which is electrically connected between the through silicon via and a substrate. CONSTITUTION: A through silicon via(110) passes through both sides of a substrate(170). A resistance structure(130) is electrically connected between the through silicon via and the substrate. A pad(150) is formed on the substrate with a contact or via shape. A redistribution layer(171) includes a first conductive pattern(120) and a second conductive pattern(140). The first conductive pattern electrically connects the through silicon via and the resistance structure.
Abstract:
PURPOSE: A semiconductor chip package, a semiconductor module including the same, an electronic system, and a manufacturing method of the semiconductor chip package are provided to effectively release a heat which is generated in the core region of a first semiconductor chip by arranging a plurality of second semiconductor chips in the interface region of a first semiconductor chip. CONSTITUTION: A first semiconductor chip comprises an interface region(114) which is equipped with a core region(112) and a plurality of first input-output pads(116). A plurality of second semiconductor chips(120) comprises a first side and a second side which are faced each other. The second semiconductor chip comprises a plurality of second input-output pads(122) which is electrically connected with the first input-output pad. A plurality of second semiconductor chips is arranged in the interface region in order to be directly touched with a plurality of first input-output pads. The first semiconductor chip comprises a fixing means which fixes a plurality of second semiconductor chips.
Abstract:
PURPOSE: A stacked chip package including a through wafer via is provided to stably supply a power source by transmitting signals to through wafer via or wire bond after dividing the signals according to frequencies. CONSTITUTION: A stacked chip package(700) includes a semiconductor substrate(780), a plurality of semiconductor chips(710,720,730,740), a plurality of first through wafer vias(713), and a plurality of second through wafer vias(711a,711b,712a,712b). The semiconductor chips are laminated on the semiconductor substrate. The first through wafer vias are formed on a first same coordinate of the semiconductor chips, penetrate the semiconductor chips, and transmit a high frequency signal. The second through wafer vias are formed on a second same coordinate different from the first same coordinate, penetrate the semiconductor chips, and transmit a low frequency signal.
Abstract:
PURPOSE: A through silicon via capacitor, a manufacturing method thereof, and a 3D integrated circuit are provided to obtain high capacitance by using the silicon through electrode of a vertical structure. CONSTITUTION: A first substrate(100) includes a plurality of circuit boards(11) and a plurality of TSV(Through Silicon Via) capacitors(15). An intermediate layer(300) is formed between the plurality of circuit boards and includes a solder bump(330) and an underfill resin layer(310). The solder bump electrically connects the plurality of circuit boards. A second substrate(200) includes a plurality of active regions, a wiring region, and a TSV capacitor.
Abstract:
PURPOSE: An electromagnetic interference (EMI) cancelation circuit, a semiconductor device having the same, and an EMI method are provided to generate an extra noise, thereby offsetting an EMI. CONSTITUTION: An electromagnetic interference (EMI) cancelation circuit includes a noise source (120) and a power distribution network (140). The noise source generates an output signal in response to a voltage signal in order to generate an extra noise (NS2). The extra noise has a phase opposite to the phase of a simultaneous switching noise (NS1). The voltage signal has a phase opposite to the phase of a clock signal. The power distribution network generates the extra noise.
Abstract:
3차원 집적 회로는 복수의 제1 전원 핀들 및 복수의 제2 전원 핀들을 포함한다. 제1 전원 핀들은 적어도 하나의 회로 기판 상에서 제1 방향으로 제1 간격마다 배치되고, 서로 같은 극성을 갖는다. 제2 전원 핀들은 적어도 하나의 회로 기판 상에서 제1 전원 핀들로부터 제1 방향과 직교하는 제2 방향으로 제1 거리만큼 이격되어 제1 방향으로 제2 간격마다 배치되며, 제1 전원 핀들과 반대의 극성을 갖는다. 따라서, 같은 극성을 갖는 전원 핀들이 일렬로 배열되므로 전원 핀들의 인덕턴스가 감소하여 3차원 집적 회로에서 발생하는 전원 노이즈가 저감된다.
Abstract:
The present invention relates to a semiconductor test device, a semiconductor device and a method for testing a semiconductor device, capable of testing normal connection between a substrate including a through electrode and a metal line on the upper part of the same, and insulation between the through electrode and the substrate etc. A semiconductor test device according to the present invention includes a switch for connecting an oscillator including a control port and the through electrode or the control port and a metal line layer connected to the through electrode selectively.