PZT 박막 및 그 제조방법
    1.
    发明公开
    PZT 박막 및 그 제조방법 无效
    薄膜薄膜及其制造方法

    公开(公告)号:KR1020110015797A

    公开(公告)日:2011-02-17

    申请号:KR1020090073199

    申请日:2009-08-10

    CPC classification number: H01L21/2855 C23C14/35 H01L21/324

    Abstract: PURPOSE: A lead zirconate titanate(PZT)-based thin film and a method for manufacturing the same are provided to miniaturize the size of particles by setting the deposition power of a PZT-based lower film with low level. CONSTITUTION: A substrate(21) is prepared. A lower electrode(25) is formed on the substrate. A PZT-based lower film(26) is formed on the lower electrode. The chemical formula of the PZT is PbZr_xTi_x-1O_3. The PZT-based upper film(27) is formed in the PZT-based lower film. An upper electrode(29) is formed on the PZT-based upper film. An insulating film is formed between the substrate and the lower electrode.

    Abstract translation: 目的:提供一种基于钛酸铅钛酸盐(PZT)的薄膜及其制造方法,通过将低浓度PZT的下层膜的沉积功率设定为使颗粒尺寸小型化。 构成:制备基材(21)。 在基板上形成下电极(25)。 在下电极上形成有基于PZT的下膜(26)。 PZT的化学式为PbZr_xTi_x-10_3。 基于PZT的下部薄膜形成基于PZT的上部薄膜(27)。 上部电极(29)形成在基于PZT的上部膜上。 在基板和下电极之间形成绝缘膜。

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