Abstract:
A method for manufacturing an Al-doped ZnO thin film is provided to prevent electrical conductivity of the ZnO thin film by enhancing an anti-oxidation property. A metal aluminum or a metal gallium is added into a ZnO transparent thin film(2) by using a physical deposition process. The ZnO transparent thin film is submerged into an electrolysis tub(3), in which electrolysis solution(4) containing H2O is filled. Electrolysis is performed, such that hydrogen ions are physically attached to the ZnO transparent thin film. During the electrolysis process, a metal electrode(1) is used as an anode and the ZnO transparent thin film is used as a cathode.
Abstract:
본 발명은 우수한 고온 내식성을 갖는 복합 강판 및 이의 제조방법에 관한 것으로, 더욱 상세하게는 강판; 및 상기 강판의 적어도 일면에 형성된 알루미노실리케이트를 함유하는 세라믹 코팅층을 포함하는 복합 강판에 관한 것이다. 본 발명에 따른 복합 강판은 고온 내식성이 우수하여 산업폐기가스에 사용되는 내식용 배관자재 및 관련부품에 적용되어 자재 및 부품의 내식성을 향상시킴으로써 수명을 증대시킬 수 있다.
Abstract:
본 발명은 높은 광산화 반응력 보유 물질로 알려진 이산화티탄 광촉매의 제조방법에 관한 것으로, 야외 및 실내에서의 광촉매 효율성을 높이기 위한 이산화티탄제조법에 관한 것이다. 상기와 같은 목적을 달성하기 위한 본 발명의 구성은 건식법(진공증착법 또는 스퍼터링법) 또는 습식법(Sol-Gel법)으로 형성되고 이산화티탄을 이용하는 광촉매 제조방법에 있어서, 환원제 용액중에 백금을 양극전극으로 설치하고, 상기 이산화티탄 표면에 음극을 설치하여 전기분해에 의해 광촉매의 활성을 증가시키는 태양광 반응형 이산화티탄 광촉매재 제조방법을 특징으로 한다. 광촉매재, 이산화티탄, 태양광
Abstract:
PURPOSE: A tooth correction device and a manufacturing method thereof are provided to improve the esthetic sense and corrosion resistance of the tooth correction device. CONSTITUTION: A tooth correction device comprises: a wire(10); a protective layer(15) which is formed in a form covering the surface of the wire; a plurality of brackets(20) which are fixed to each tooth to be corrected; and a protective layer(25) which is formed in a form covering the surface of the bracket. The protective layer is made of a silica-alumina compound material.
Abstract:
PURPOSE: A lead zirconate titanate(PZT)-based thin film and a method for manufacturing the same are provided to miniaturize the size of particles by setting the deposition power of a PZT-based lower film with low level. CONSTITUTION: A substrate(21) is prepared. A lower electrode(25) is formed on the substrate. A PZT-based lower film(26) is formed on the lower electrode. The chemical formula of the PZT is PbZr_xTi_x-1O_3. The PZT-based upper film(27) is formed in the PZT-based lower film. An upper electrode(29) is formed on the PZT-based upper film. An insulating film is formed between the substrate and the lower electrode.
Abstract:
PURPOSE: Transparent glass with an anti-reflection thin film is provided to improve the optical permeation characteristic of the transparent glass by coating the surface of a glass substrate based on a silica containing porous glassy layer. CONSTITUTION: Transparent glass includes a glass substrate(110) and an anti-reflection thin film(120). A silica-containing porous glassy layer is coated on the upper side of the glass substrate. The anti-reflection thin film is based on colloidal silica containing 20% or more of silica, 1% or less of Na_2O, and 1% or less of CaO. The viscosity of the colloidal silica is 10 or less. The thickness of the anti-reflection thin film is between 50 and 200nm. The surface roughness of the anti-reflection thin film is between 10 and 50nm. The anti-reflection thin film is formed based on a spray coating method or a dip coating method.