公开(公告)号：KR101849469B1

公开(公告)日：2018-04-16

申请号：KR1020160140013

申请日：2016-10-26

Applicant: 한국전자통신연구원 ,  연세대학교 산학협력단

Inventor： 조한벽 ,  정종문 ,  최진규 ,  신성진 ,  오현서 ,  이창성 ,  임고은 ,  조형준 ,  최현균 ,  한동혁

IPC: H04W36/30 ,  H04W36/08

CPC classification number: H04W36/30 ,  H04W36/08

Abstract: 핸드오버결정방법및 장치가개시된다. 일실시예는이동체의셀 체류시간에기초하여타겟기지국을선택하는단계와, 참조심볼수신전력에기초하여상기타겟기지국으로핸드오버를시작하는단계를포함한다.

公开(公告)号：KR100819062B1

公开(公告)日：2008-04-03

申请号：KR1020070026774

申请日：2007-03-19

Applicant: 한국전자통신연구원

Inventor： 김기출 ,  맹성렬 ,  신성진 ,  강대준

IPC: C01G19/00 ,  C01G15/00

CPC classification number: C01G19/00 ,  C01P2002/70 ,  C01P2002/84 ,  C01P2004/03 ,  C01P2006/40 ,  C23C18/1216 ,  C23C18/14 ,  G03F7/0042 ,  Y10S430/143

Abstract: A method for synthesizing an indium tin oxide electron beam resist and a method for forming an ITO pattern are provided to form a pattern in various forms according to resolution of an electron beam recorder, and solve problems caused during an etching process or lift-off process. A method for synthesizing an indium tin oxide(ITO) electron beam resist includes the steps of: providing indium chloride tetrahydrate and tin chloride dihydrate; and dissolving the indium chloride tetrahydrate and tin chloride dihydrate in 2-ethoxy ethanol to synthesize the ITO electron beam resist. A method for forming an ITO pattern includes the steps of: (200) synthesizing the ITO electron beam resist; (220) coating a substrate with the synthesized ITO electron beam resist to form an ITO electron beam resist film; (240,260) forming an ITO electron beam resist pattern by patterning the ITO electron beam resist film using an electron beam recorder; and (280) heat-treating the ITO electron beam resist pattern to form the ITO pattern. Further, the 2-ethoxy ethanol is used as solvent and stabilizer.

Abstract translation: 提供了一种用于合成铟锡氧化物电子束抗蚀剂的方法和用于形成ITO图案的方法，以根据电子束记录器的分辨率形成各种形式的图案，并且解决在蚀刻处理或剥离过程中引起的问题 。 铟锡氧化物（ITO）电子束抗蚀剂的合成方法包括以下步骤：提供氯化铟四水合物和氯化锡二水合物; 并将氯化铟四水合物和氯化锡二水合物溶解在2-乙氧基乙醇中以合成ITO电子束抗蚀剂。 一种形成ITO图形的方法包括以下步骤：（200）合成ITO电子束抗蚀剂; （220）用合成的ITO电子束抗蚀剂涂覆基板以形成ITO电子束抗蚀膜; （240,260），通过使用电子束记录器对ITO电子束抗蚀剂膜进行图案化而形成ITO电子束抗蚀剂图案; 和（280）对ITO电子束抗蚀剂图案进行热处理以形成ITO图案。 此外，使用2-乙氧基乙醇作为溶剂和稳定剂。