公开(公告)号：WO2006017160A9

公开(公告)日：2006-11-16

申请号：PCT/US2005024227

申请日：2005-07-08

Applicant: ADE CORP

Inventor： KECK JAY ,  KALLUS DAVID M ,  SMITH BRYAN W ,  VERGOW ZACHARY J

IPC: G01M19/00 ,  G01M99/00

CPC classification number: G06F17/30554 ,  G01N21/9501 ,  G05B19/41875 ,  G05B2219/2602 ,  G06Q10/06 ,  G06Q50/04 ,  H01L21/67005 ,  H01L21/67253 ,  Y02P90/18 ,  Y02P90/22 ,  Y02P90/30

Abstract: A system for searching for patterns of semiconductor wafer features for use in silicon manufacturing and device fabrication processes, the system including: a data acquisition system 00 for acquiring scan data from differing types of semiconductor wafer scanning tools such as wafer dimensional tools 10, wafer inspection tools 12, and wafer nanotopography tools 14; a buffer system 02 for providing temporary storage for scan data transmitted and for providing fault tolerance; a server system 04 for providing storage for the scan data transmitted from the buffer system 02 and converting the scan data into a format used by and stored in a database 08 management system; an analysis system 06 client station including a display and communicating with the server system 04, the analysis system 06 and the server system 04 providing scan data structuring and query operations and data transfer operations.

公开(公告)号：WO2006017160A3

公开(公告)日：2007-10-25

申请号：PCT/US2005024227

申请日：2005-07-08

Applicant: ADE CORP

Inventor： KECK JAY ,  KALLUS DAVID M ,  SMITH BRYAN W ,  VERGOW ZACHARY J

IPC: G01M99/00 ,  G06F17/50 ,  G06F15/16 ,  G06F19/00

CPC classification number: G06F17/30554 ,  G01N21/9501 ,  G05B19/41875 ,  G05B2219/2602 ,  G06Q10/06 ,  G06Q50/04 ,  H01L21/67005 ,  H01L21/67253 ,  Y02P90/18 ,  Y02P90/22 ,  Y02P90/30

Abstract: A system for searching for patterns of semiconductor wafer features for use in silicon manufacturing and device fabrication processes, the system including: a data acquisition system 00 for acquiring scan data from differing types of semiconductor wafer scanning tools such as wafer dimensional tools 10, wafer inspection tools 12, and wafer nanotopography tools 14; a buffer system 02 for providing temporary storage for scan data transmitted and for providing fault tolerance; a server system 04 for providing storage for the scan data transmitted from the buffer system 02 and converting the scan data into a format used by and stored in a database 08 management system; an analysis system 06 client station including a display and communicating with the server system 04, the analysis system 06 and the server system 04 providing scan data structuring and query operations and data transfer operations.

Abstract translation: 一种用于搜索用于硅制造和器件制造工艺的半导体晶片特征的图案的系统，该系统包括：数据采集系统00，用于从不同类型的半导体晶片扫描工具获取扫描数据，例如晶片尺寸工具10，晶片检查 工具12和晶片纳米成像工具14; 缓冲系统02，用于为发送的扫描数据提供临时存储并提供容错; 服务器系统04，用于提供从缓冲器系统02发送的扫描数据的存储，并将扫描数据转换成数据库08管理系统使用和存储的格式; 分析系统06客户端站，其包括显示器并与服务器系统04，分析系统06和服务器系统04通信，提供扫描数据结构化和查询操作和数据传输操作。

公开(公告)号：WO2006017160A8

公开(公告)日：2006-09-14

申请号：PCT/US2005024227

申请日：2005-07-08

Applicant: ADE CORP

Inventor： KECK JAY ,  KALLUS DAVID M ,  SMITH BRYAN W ,  VERGOW ZACHARY J

IPC: G01M19/00 ,  G01M99/00

CPC classification number: G06F17/30554 ,  G01N21/9501 ,  G05B19/41875 ,  G05B2219/2602 ,  G06Q10/06 ,  G06Q50/04 ,  H01L21/67005 ,  H01L21/67253 ,  Y02P90/18 ,  Y02P90/22 ,  Y02P90/30

Abstract: A system for searching for patterns of semiconductor wafer features for use in silicon manufacturing and device fabrication processes, the system including: a data acquisition system 00 for acquiring scan data from differing types of semiconductor wafer scanning tools such as wafer dimensional tools 10, wafer inspection tools 12, and wafer nanotopography tools 14; a buffer system 02 for providing temporary storage for scan data transmitted and for providing fault tolerance; a server system 04 for providing storage for the scan data transmitted from the buffer system 02 and converting the scan data into a format used by and stored in a database 08 management system; an analysis system 06 client station including a display and communicating with the server system 04, the analysis system 06 and the server system 04 providing scan data structuring and query operations and data transfer operations.

Abstract translation: 一种用于搜索用于硅制造和器件制造工艺的半导体晶片特征图案的系统，该系统包括：数据采集系统00，用于采集来自不同类型的半导体晶片扫描工具的扫描数据，例如晶片尺寸工具10，晶片检查 工具12和晶片纳米形貌工具14; 缓冲系统02，用于为传输的扫描数据提供临时存储并提供容错; 服务器系统04，用于为从缓冲系统02传输的扫描数据提供存储，并将扫描数据转换成由数据库08管理系统使用并存储的格式; 包括显示器并与服务器系统04通信的分析系统06客户端站，分析系统06和服务器系统04提供扫描数据结构化和查询操作以及数据传输操作。