公开(公告)号：US20240409681A1

公开(公告)日：2024-12-12

申请号：US18698296

申请日：2022-10-17

Applicant: ADEKA CORPORATION

Inventor： Shota KOBAYASHI ,  Ken-ichi TAMASO

IPC: C08G59/62 ,  C08G59/40 ,  C08K5/13 ,  C08K5/3445

Abstract: A clathrate compound obtained by mixing an imidazole compound (A) and a polyhydric phenol compound (B), wherein the clathrate compound has an average particle size (X) of 7 μm or less, and a maximum particle size (Y) of 40 μm or less. The imidazole compound (A) is preferably at least one selected from compounds represented by the following formula (1), where R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group that has 1 to 20 carbon atoms and may have a substituent, or an aryl group that has 6 to 20 carbon atoms and may have a substituent, and the substituent is at least one selected from a halogen atom, a hydroxy group, and a nitrile group.

公开(公告)号：US20220185946A1

公开(公告)日：2022-06-16

申请号：US17436498

申请日：2020-03-27

Applicant: ADEKA CORPORATION

Inventor： Shota KOBAYASHI ,  Ken-ichi TAMASO ,  Ryo OGAWA ,  Tamotsu NAGAMATSU

IPC: C08G59/24 ,  C08G59/40 ,  C08G59/56 ,  C08G59/66 ,  C08G59/68 ,  B29C71/02 ,  C08J7/12

Abstract: Disclosed is a curable resin composition that has excellent curability by irradiation of light and heating and that is suitable for such applications as liquid encapsulants, liquid adhesives, adhesives for camera modules, and liquid crystal sealants. The curable resin composition contains (A) an aromatic epoxy resin having an allyl group, (B) a thiol-based curing agent, (C) a photoradical initiator, and (D) a thermally latent curing agent. Preferably, (A) the compound having an allyl group and an epoxy group is an aromatic epoxy resin having an allyl group. Preferably, the thiol-based curing agent, which is component (B), is in liquid form at 25° C.