公开(公告)号：WO2017143242A1

公开(公告)日：2017-08-24

申请号：PCT/US2017/018450

申请日：2017-02-17

Applicant: APPLE INC.

Inventor： PATEL, Dhaval, C. ,  CHEUNG, Eugene, C. ,  KO, Pey-Jiun ,  CHEN, Po-Jui ,  RUMFORD, Robert, W. ,  TERRY, Steve, L. ,  LIN, Wei ,  NIU, Xiaofan ,  ZHOU, Xiaoqi ,  GU, Yi ,  CHUO, Yindar ,  DAS, Rasmi, R. ,  SCARDATO, Steven, M. ,  AHN, Se, Hyun ,  YIN, Victor, H. ,  BAE, Wookyung ,  BOITNOTT, Christopher, L. ,  TUNG, Chun-Hao ,  SON, Mookyung ,  KANG, Sunggu ,  GUPTA, Nathan, K. ,  ZHONG, John, Z.

IPC: G06F3/041 ,  G06F3/044

CPC classification number: G06F3/044 ,  G06F3/041 ,  G06F2203/04102 ,  G06F2203/04105

Abstract: An electronic device with a force sensing device is disclosed. The electronic device comprises a user input surface defining an exterior surface of the electronic device, a first capacitive sensing element, and a second capacitive sensing element capacitively coupled to the first capacitive sensing element. The electronic device also comprises a first spacing layer between the first and second capacitive sensing elements, and a second spacing layer between the first and second capacitive sensing elements. The first and second spacing layers have different compositions. The electronic device also comprises sensing circuitry coupled to the first and second capacitive sensing elements configured to determine an amount of applied force on the user input surface. The first spacing layer is configured to collapse if the applied force is below a force threshold, and the second spacing layer is configured to collapse if the applied force is above the force threshold.

Abstract translation: 公开了一种具有力感测设备的电子设备。 电子设备包括限定电子设备的外表面的用户输入表面，第一电容感测元件和电容性耦合到第一电容感测元件的第二电容感测元件。 电子设备还包括第一和第二电容感测元件之间的第一间隔层以及第一和第二电容感测元件之间的第二间隔层。 第一和第二间隔层具有不同的组成。 该电子设备还包括耦合到第一和第二电容感测元件的感测电路，被配置为确定在用户输入表面上施加的力的量。 如果所施加的力低于力阈值，则所述第一间隔层被配置成塌陷，并且所述第二间隔层被配置为如果所施加的力高于所述力阈值则塌陷。

公开(公告)号：WO2016036384A1

公开(公告)日：2016-03-10

申请号：PCT/US2014/054297

申请日：2014-09-05

Applicant: APPLE INC.

Inventor： ZHONG, John Z. ,  KANG, Sunggu ,  BAE, Wookyung

IPC: C23C14/34

CPC classification number: C23C14/5873 ,  C23C14/564 ,  C23C14/5846 ,  H01J37/32449 ,  H01J37/32853 ,  H01J37/32871 ,  H01J37/3476 ,  H01J37/3488

Abstract: Sputter deposition systems and methods for depositing film coatings on one or more substrates are disclosed. The systems and methods are used to prevent or reduce an amount of defects within a deposited film. The methods involve removing defect-related particles that are formed during a deposition process from certain regions of the sputter deposition system and preventing the defect-related particles from detrimentally affecting the quality of the deposited film. In particular embodiments, methods involve creating a flow of gas from a deposition region to a particle collection region the sputter deposition system such that the defect-related particles are entrained within the flow of gas and away from the deposition region. In particular embodiments, the sputter deposition system is a meta-mode sputter deposition system.

Abstract translation: 公开了用于在一个或多个基底上沉积膜涂层的溅射沉积系统和方法。 系统和方法用于防止或减少沉积膜内的缺陷量。 所述方法包括去除在溅射沉积系统的某些区域的沉积过程期间形成的缺陷相关颗粒，并防止缺陷相关颗粒不利地影响沉积膜的质量。 在具体实施方案中，方法包括从沉积区域到溅射沉积系统的颗粒收集区域产生气体流，使得缺陷相关颗粒被夹带在气体流中并远离沉积区域。 在特定实施例中，溅射沉积系统是元模式溅射沉积系统。