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公开(公告)号：US11035803B1
公开(公告)日：2021-06-15
申请号：US16802480
申请日：2020-02-26
Applicant: Applied Materials Israel Ltd.
Inventor： Ido Almog , Ori Golani
Abstract: There is provided a system and a method comprising obtaining data representative of potential defects in at least one image of a semiconductor specimen, for each potential defect of at least a first subset of potential defects of the semiconductor specimen, obtaining pixel values representative of the potential defect in multiple images of the specimen which differ from each other by at least one parameter, classifying the potential defects into a plurality of first clusters, for each first cluster, building, based on pixel values representative of potential defects, at least one first matching filter for the first cluster, for at least a given potential defect not belonging to the first subset, determining whether it corresponds to a defect based on the first matching filters associated with the plurality of first clusters.
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公开(公告)号：US11688055B2
公开(公告)日：2023-06-27
申请号：US17160364
申请日：2021-01-27
Applicant: Applied Materials Israel Ltd.
Inventor： Guy Shwartz , Ido Almog
CPC classification number: G06T7/001 , G06T2207/20081 , G06T2207/30148 , G06T2207/30168
Abstract: Disclosed is a computerized method for detecting defects on a sample. The method includes: (i) receiving scan data corresponding to a pixel on the sample; (ii) computing a difference vector d based on the scan data and corresponding reference data; (iii) computing a parameter D dependent on t=Γd−(Glinear/∥Γs∥2)Γs, wherein ΓTΓ=K−1 with K being a covariance matrix corresponding to the pixel, s is a predetermined kernel characterizing a defect signal, and Glinear=s·(K−1 d) is a gaussian approximation of a likelihood ratio test expression for distinguishing the defect signal from noise, and wherein D substantially monotonically increases with ∥t∥; and (iv) computing a score q(g, D) indicative of whether the pixel is defective, wherein g is a parameter indicative of a value of Glinear and q(g, D) substantially monotonically increases with g and substantially monotonically decreases with D.
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公开(公告)号：US11662324B1
公开(公告)日：2023-05-30
申请号：US17698393
申请日：2022-03-18
Applicant: Applied Materials Israel Ltd.
Inventor： Ido Almog , Ron Bar-Or , Lior Yaron
IPC: G01N23/22 , G01Q60/24 , G01N23/2251
CPC classification number: G01N23/2251 , G01Q60/24 , G01N2223/07 , G01N2223/418 , G01N2223/507 , G01N2223/6116
Abstract: A computer-based method for three-dimensional surface metrology of samples based on scanning electron microscopy and atomic force microscopy. The method includes: (i) using a scanning electron microscope (SEM) to obtain SEM data of a set of sites on a surface of a sample; (ii) using an atomic force microscope (AFM) to measure vertical parameters of sites in a calibration subset of the set; (iii) calibrating an algorithm, configured to estimate a vertical parameter of a site when SEM data of the site are fed as inputs, by determining free parameters of the algorithm, such that residuals between the algorithm-estimated vertical parameters and the AFM-measured vertical parameters are about minimized; and (iv) using the calibrated algorithm to estimate vertical parameters of the sites in the complement to the calibration subset.
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公开(公告)号：US20220012862A1
公开(公告)日：2022-01-13
申请号：US16923882
申请日：2020-07-08
Applicant: Applied Materials Israel Ltd.
Inventor： Doron Korngut , Ido Almog
Abstract: Disclosed herein is method for multi-perspective-based wafer analysis. The method includes (i) scanning a plurality of pages, or portions thereof, one after the other, wherein each page, or a portion thereof, is successively scanned, in each of a multiplicity of perspectives, and (ii) analyzing scan data of a last scanned page while scanning a next page from the plurality of pages. At least some of the pages include multiple slices of the wafer. The analysis of the scan data includes identifying defects in the scanned pages, based on an integrated analysis combining scan data from each of the multiplicity of perspectives. Further disclosed is a computerized system configured to implement the method.
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公开(公告)号：US10902582B2
公开(公告)日：2021-01-26
申请号：US16250980
申请日：2019-01-17
Applicant: Applied Materials Israel, Ltd.
Inventor： Haim Feldman , Eyal Neistein , Harel Ilan , Shahar Arad , Ido Almog
Abstract: A method, system and computer readable medium for providing information about a region of a sample. The method includes (i) obtaining, by an imager, multiple images of the region; wherein the multiple images differ from each other by at least one parameter (ii) receiving or generating multiple reference images; (iii) generating multiple difference images that represent differences between the multiple images and the multiple reference images; (iv) calculating a set of region pixel attributes, (v) calculating a set of noise attributes, based on multiple sets of region pixels attributes of the multiple region pixels; and (vi) determining for each region pixel, whether the region pixel represents a defect based on a relationship between the set of noise attributes and the set of region pixel attributes of the pixel.
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Patent Agency Ranking
公开(公告)号：US09535014B1
公开(公告)日：2017-01-03
申请号：US14800625
申请日：2015-07-15
Applicant: Applied Materials Israel, Ltd.
Inventor： Haim Feldman , Ido Dolev , Ido Almog
CPC classification number: G01N21/9501 , G01N21/956 , G01N2021/95676 , G02B26/123 , G02B26/124 , G03F1/84
Abstract: A system, including an illumination module that comprises (a) a first traveling lens acousto-optic device; (b) a light source for illuminating the first traveling lens to provide an input beam that propagates along a first direction; (c) illumination optics for outputting an output beam that scans the object at a second direction; a detection unit; and a collection module for collecting a collected beam from the object, wherein the collected beam propagates along a third direction; and optically manipulating the collected beam to provide a counter-scan beam is directed towards the detection unit and has a focal point that is positioned at a same location regardless of the propagation of the collected beam along the third direction.
Abstract translation: 一种系统，包括照明模块，该照明模块包括：（a）第一行进透镜声光装置; （b）用于照亮第一移动透镜以提供沿着第一方向传播的输入光束的光源; （c）用于输出在第二方向扫描物体的输出光束的照明光学器件; 检测单元; 以及收集模块，用于从所述物体收集收集的光束，其中所述收集的光束沿着第三方向传播; 并且将所收集的光束光学操纵以提供反向扫描光束指向检测单元，并且具有位于相同位置的焦点，而不管收集的光束沿着第三方向的传播。
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公开(公告)号：US20250116597A1
公开(公告)日：2025-04-10
申请号：US18377431
申请日：2023-10-06
Applicant: Applied Materials Israel Ltd.
Inventor： Guy Shwartz , Ido Almog , Ori Golani
IPC: G01N21/17 , G01N21/95 , G06N3/0455 , G06N3/084
Abstract: Disclosed herein is a method for non-destructive depth-profiling including projecting a pulsed pump beam into a specimen, projecting a pulsed probe beam thereinto, and sensing light returned therefrom to obtain a measured signal. Each probe pulse is configured to undergo Brillouin scattering off a primary acoustic pulse induced by the directly preceding pump pulse, so as to be scattered there off at a respective depth within the specimen. The method further includes executing an optimization algorithm configured to receive as inputs the measured signal, and/or a processed signal obtained therefrom, and output values of structural parameter(s) characterizing the specimen through minimization of a cost function indicative of a difference between the measured signal and a simulated signal obtained using a forward model simulating the scattering of a pulsed probe beam off at least the primary acoustic pulses.
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公开(公告)号：US11859963B2
公开(公告)日：2024-01-02
申请号：US17970054
申请日：2022-10-20
Applicant: Applied Materials Israel Ltd.
Inventor： Ori Golani , Ido Almog
CPC classification number: G01B11/22 , G01B11/06 , G01B2210/56
Abstract: Disclosed herein is a method for depth-profiling of samples including a target region including a lateral structural feature. The method includes projecting an optical pump pulse on a semiconductor device comprising a target region, such as to produce an acoustic pulse which propagates within the target region of the semiconductor device, wherein a wavelength of the pump pulse is at least two times greater than a lateral extent of a lateral structural feature of the semiconductor device along at least one lateral direction, projecting an optical probe pulse on the semiconductor device, such that the probe pulse undergoes Brillouin scattering off the acoustic pulse within the target region, detecting a scattered component of the probe pulse to obtain a measured signal, and analyzing the measured signal to obtain a depth-dependence of at least one parameter characterizing the lateral structural feature.
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公开(公告)号：US11713964B1
公开(公告)日：2023-08-01
申请号：US17574055
申请日：2022-01-12
Applicant: Applied Materials Israel Ltd.
Inventor： David Goldovsky , Ido Almog , Ronny Barnea
IPC: G01B15/04 , H01J37/285 , H01J37/244 , H01J37/28
CPC classification number: G01B15/04 , H01J37/244 , H01J37/28 , H01J37/285
Abstract: Disclosed herein is a system for profiling holes in non-opaque samples. The system includes: (i) an e-beam source configured to project an e-beam into an inspection hole in a sample, such that a wall of the inspection hole is struck and a localized electron cloud is produced; (ii) a light sensing infrastructure configured to sense cathodoluminescent light, generated by the electron cloud; and (iii) a computational module configured to analyze the measured signal to obtain the probed depth at which the wall was struck. A lateral offset, and/or orientation, of the e-beam is controllable, so as to allow generating localized electron clouds at each of a plurality of depths inside the inspection hole, and thereby obtain information at least about a two-dimensional geometry of the inspection hole.
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公开(公告)号：US20230221112A1
公开(公告)日：2023-07-13
申请号：US17574055
申请日：2022-01-12
Applicant: Applied Materials Israel Ltd.
Inventor： David Goldovsky , Ido Almog , Ronny Barnea
IPC: G01B15/04 , H01J37/28 , H01J37/244 , H01J37/285
CPC classification number: G01B15/04 , H01J37/28 , H01J37/244 , H01J37/285
Abstract: Disclosed herein is a system for profiling holes in non-opaque samples. The system includes: (i) an e-beam source configured to project an e-beam into an inspection hole in a sample, such that a wall of the inspection hole is struck and a localized electron cloud is produced; (ii) a light sensing infrastructure configured to sense cathodoluminescent light, generated by the electron cloud; and (iii) a computational module configured to analyze the measured signal to obtain the probed depth at which the wall was struck. A lateral offset, and/or orientation, of the e-beam is controllable, so as to allow generating localized electron clouds at each of a plurality of depths inside the inspection hole, and thereby obtain information at least about a two-dimensional geometry of the inspection hole.
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