公开(公告)号：US3573454A

公开(公告)日：1971-04-06

申请号：US3573454D

申请日：1968-04-22

Applicant: APPLIED RES LAB

Inventor： ANDERSEN CRISTIAN A ,  RODEN HENRY J

IPC: H01J37/317 ,  G01Q10/04 ,  H01J27/02 ,  H01J37/252 ,  H01J49/14 ,  H01L21/265 ,  H01J39/34 ,  H01L7/00

CPC classification number: H01J37/252 ,  H01J27/028 ,  H01J49/142 ,  Y10S438/961

Abstract: Improved stability and control in ion bombardment is achieved in the case of many materials under bombardment by the use of negative ions. The method is especially advantageous for the analysis of insulating materials by secondary ion emission and also enables improved results in ion implantation processes.