公开(公告)号：US20240111218A1

公开(公告)日：2024-04-04

申请号：US18387082

申请日：2023-11-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo TEL ,  Hermanus Adrianus DILLEN ,  Marc Jurian KEA ,  Mark John MASLOW ,  Koen THUIJS ,  Peter David ENGBLOM ,  Ralph Timotheus HUIJGEN ,  Daan Maurits SLOTBOOM ,  Johannes Catharinus Hubertus MULKENS

IPC: G03F7/00

CPC classification number: G03F7/705 ,  G03F7/70525 ,  G03F7/7065 ,  G03F7/70658

Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.

公开(公告)号：US20230023153A1

公开(公告)日：2023-01-26

申请号：US17764245

申请日：2020-09-03

Applicant: ASML NETHERLANDS B.V

Inventor： Wim Tjibbo TEL ,  Hermanus Adrianus DILLEN ,  Koen THUIJS ,  Laurent Michel Marcel DEPRE ,  Christopher PRENTICE

IPC: G03F7/20

Abstract: A method of determining a field of view setting for an inspection tool having a configurable field of view, the method including: obtaining a process margin distribution of features on at least part of a substrate; obtaining a threshold value; identifying, in dependence on the obtained process margin distribution and the threshold value, one or more regions on at least part of the substrate; and determining the field of view setting in dependence on the identified one or more regions.

公开(公告)号：US20230082858A1

公开(公告)日：2023-03-16

申请号：US17797506

申请日：2021-01-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Jochem Sebastiaan WILDENBERG ,  Hermanus Adrianus DILLEN ,  Fan FENG ,  Ronald VAN ITTERSUM ,  Willem Louis VAN MIERLO ,  Koen THUIJS

IPC: G03F7/20

Abstract: A method and associated apparatuses for controlling a process of manufacturing semiconductor devices on a substrate. The method includes obtaining process data relating to the process and determining a correction for the process based on the process data and a first control objective associated with the devices on the substrate. A first probability of the first control objective being achievable is determined and the correction adjusted based on the probability and at least a second control objective having a second probability of being achievable compared to the first control objective.

公开(公告)号：US20220100098A1

公开(公告)日：2022-03-31

申请号：US17425355

申请日：2020-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo TEL ,  Hermanus Adrianus DILLEN ,  Marc Jurian KEA ,  Mark John MASLOW ,  Koen THUIJS ,  Peter David ENGBLOM ,  Ralph Timotheus HUIJGEN ,  Daan Maurits SLOTBOOM ,  Johannes Catharinus Hubertus MULKENS

IPC: G03F7/20

Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.