公开(公告)号：US20250102902A1

公开(公告)日：2025-03-27

申请号：US18727598

申请日：2023-01-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Tim Willem Johan VAN DE GOOR ,  Ernst GALUTSCHEK ,  Andrei Mikhailovich YAKUNIN ,  Paul JANSEN ,  Abraham Jan WOLF ,  Paul Alexander VERMEULEN ,  Zomer Silvester HOUWELING ,  Lucas Christiaan Johan HEIJMANS ,  Andrey NIKIPELOV

IPC: G03F1/62 ,  G03F7/00

Abstract: An assembly for a lithographic apparatus, wherein the assembly is configured to heat a pellicle membrane by one of or a combination selected from: i) provision of heated gas, ii) radiative heating, iii) resistive heating, and/or iv) inductive heating, and/or by illuminating the pellicle membrane with light having a wavelength of from around 91 nm to around 590 nm. Also a method of extending the operative lifespan of a pellicle membrane, the method including heating at least a portion of a pellicle membrane when illuminated by EUV by one of or a combination selected from: i) providing heated gas, ii) radiative heating, iii) resistive heating, and/or iv) inductive heating to effect heating of the at least one portion of the pellicle membrane, and/or by illuminating the pellicle membrane with light having a wavelength of from around 91 nm to around 590 nm.

公开(公告)号：US20240411233A1

公开(公告)日：2024-12-12

申请号：US18699358

申请日：2022-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Gosse Charles DE VRIES ,  Sjoerd Nicolaas Lambertus DONDERS ,  Franciscus Johannes Joseph JANSSEN ,  Evgenia KURGANOVA ,  Abraham Jan WOLF ,  Ties Jan Willem BAKKER ,  Volker Dirk HILDENBRAND ,  Paul Alexander VERMEULEN ,  Michael ENGEL ,  Bernardus Antonius Johannes LUTTIKHUIS ,  Ronald VAN DER HAM ,  Jeroen Peterus Johannes VAN LIPZIG

IPC: G03F7/00 ,  G03F1/62

Abstract: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support structure constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system; a substrate table constructed to support a substrate; a projection system configured to receive the radiation beam from the reticle-pellicle assembly and to project it onto the substrate; and a heating system configured to heat a pellicle of the reticle-pellicle assembly supported by the support structure. A method for using a reticle-pellicle assembly including: illuminating the reticle-pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle-pellicle assembly using a separate heat source.