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    SCANNING MEASUREMENT SYSTEM
    2.
    发明申请
    SCANNING MEASUREMENT SYSTEM 审中-公开
    扫描测量系统

    公开(公告)号：WO2017092986A1

    公开(公告)日：2017-06-08

    申请号：PCT/EP2016/077039

    申请日：2016-11-09

    Applicant: ASML NETHERLANDS B.V.

    Inventor： MOEST, Bearrach ,  VOOGD, Robbert, Jan ,  VAN KESSEL, Marcel, Theodorus, Maria ,  ONVLEE, Johannes ,  BROUWER, Cornelis, Melchior ,  PAARHUIS, Bart, Dinand

    IPC: G03F7/20 ,  G03F9/00

    CPC classification number: G03F7/70983 ,  G03F7/70633 ,  G03F7/70675 ,  G03F9/70 ,  G03F9/7019 ,  G03F9/7026

    Abstract: A method of controlling a lithographic apparatus having an exposure mode configured to expose a wafer held by a substrate table to an image of a pattern on a production reticle via a projection system, wherein in the exposure mode the production reticle is held at a reticle stage and is protected by a pellicle. The method comprises determining characteristics of the projecting in a calibration mode. The determining comprises moving the reticle stage holding a further reticle protected by a further pellicle, the further reticle having a mark. During the moving the further reticle is illuminated with radiation to form an aerial image of the mark, the aerial image is projected via the projection system onto a sensor and the projected aerial image is sensed as received at the sensor. The characteristics of the sensed aerial image are determined.

    Abstract translation: 一种控制具有曝光模式的光刻设备的方法，所述曝光模式被配置为经由投影系统将由衬底台保持的晶片暴露于制作光罩上的图案的图像，其中在所述曝光模式中， 生产光罩保持在光罩台上并受到薄膜保护。 该方法包括在校准模式下确定投影的特性。 该确定包括移动保持由另一薄膜保护的另一光罩的光罩平台，该另一光罩具有标记。 在移动过程中，进一步的十字线被辐射照亮以形成标记的空中图像，空中图像通过投影系统投影到传感器上，并且投影的空中图像在传感器处被感测到。 感测到的航拍图像的特征被确定。

    LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC PROJECTION METHOD
    3.
    发明申请
    LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC PROJECTION METHOD 审中-公开
    平面设备和地平面投影方法

    公开(公告)号：WO2016169727A1

    公开(公告)日：2016-10-27

    申请号：PCT/EP2016/056498

    申请日：2016-03-24

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN DE RUIT, Kevin ,  PAARHUIS, Bart, Dinand ,  VAN DAMME, Jean-Philippe, Xavier ,  ONVLEE, Johannes ,  BROUWER, Cornelis, Melchior ,  KRAMER, Pieter, Jacob

    IPC: G03F1/62 ,  G03F7/20 ,  G01B11/16

    CPC classification number: G03F7/70983 ,  G01B2210/56 ,  G03F1/62 ,  G03F7/2002 ,  G03F7/70258 ,  G03F7/7085

    Abstract: A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support to support a patterning device, a substrate table to hold a substrate; and a projection system to project the patterned radiation beam onto a target portion of the substrate. The support is provided with a transparent layer to protect the pattering device. The apparatus further comprises a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, a compensator device which is configured to control at least one of the projection system, the substrate table and the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.

    Abstract translation: 光刻设备包括被配置为调节辐射束的照明系统，支撑图案形成装置的支撑件，用于保持衬底的衬底台; 以及将图案化的辐射束投影到基板的目标部分上的投影系统。 该支撑件设有透明层以保护图案装置。 该装置还包括透明层变形确定装置，用于确定透明层的变形分布，在光刻设备的扫描运动期间表示透明层的变形的透明层的变形轮廓，配置的补偿装置 以响应于透明层的变形轮廓来控制投影系统，衬底台和支撑体中的至少一个，以补偿在装置的扫描运动期间透明层的变形。

    CALIBRATION METHOD FOR A LITHOGRAPHIC SYSTEM
    4.
    发明申请
    CALIBRATION METHOD FOR A LITHOGRAPHIC SYSTEM 审中-公开

    公开(公告)号：WO2021094041A1

    公开(公告)日：2021-05-20

    申请号：PCT/EP2020/078543

    申请日：2020-10-12

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BROUWER, Cornelis, Melchior ,  LI, Chung-Hsun

    IPC: G03F7/20

    Abstract: Disclosed is a method of determining calibrated reference exposure and measure grids for referencing position of a substrate stage in a lithographic system. The method comprises obtaining calibration data relating to one or more calibration substrates; and determining an exposure grid for an exposure side of the lithographic system from said calibration data and a measure grid for a measure side of the lithographic system from said calibration data. The exposure grid and said measure grid are decomposed so as to remove a calibration substrate dependent component from said exposure grid and from said measure grid to obtain a substrate independent exposure grid and substrate independent measure grid.

    METHOD AND APPARATUS FOR CONTROLLING ALIGNMENT
    6.
    发明申请
    METHOD AND APPARATUS FOR CONTROLLING ALIGNMENT 审中-公开
    用于控制对准的方法和设备

    公开(公告)号：WO2017186447A1

    公开(公告)日：2017-11-02

    申请号：PCT/EP2017/057534

    申请日：2017-03-30

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BROUWER, Cornelis, Melchior ,  DE JONG, Frederik Eduard

    IPC: G03F9/00

    CPC classification number: G03F9/7003 ,  G03F9/7088

    Abstract: A method of controlling alignment in a lithographic apparatus configured to expose a substrate (702) held by a substrate table (704) to an image of a pattern on a patterning device (708) via a projection system (706). The method comprises illuminating a target (710) on the substrate with an image (714) of an alignment mark on the patterning device, displacing the substrate table relative to the image of the alignment mark, collecting radiation scattered by the target during the displacing step at a detector. During the relative displacing, one or both of the patterning device and the substrate table. The relative displacement is independent of individual movements of the patterning device and the substrate table.

    Abstract translation: 一种控制光刻设备中的对准的方法，所述光刻设备被配置为经由投影系统将由衬底台（704）保持的衬底（702）暴露于图案形成装置（708）上的图案的图像 （706）。 该方法包括用图案形成装置上的对准标记的图像（714）照射衬底上的目标（710），相对于对准标记的图像移位衬底台，在移位步骤期间收集由目标散射的辐射 在探测器处。 在相对移动期间，图案形成装置和衬底台中的一个或两个。 相对位移与图案形成装置和基底台的各个运动无关。

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