公开(公告)号：WO2022268560A1

公开(公告)日：2022-12-29

申请号：PCT/EP2022/066044

申请日：2022-06-13

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： VAN DAMME, Jean-Philippe, Xavier ,  JOHNSON, Richard, John ,  SUBRAMANIAN, Raaja Ganapathy

IPC: G03F7/20 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70875

Abstract: Embodiments herein describe systems, methods, and devices for thermal conditioning of patterning devices at a lithographic apparatus. A patterning device cooling system for thermally conditioning a patterning device (202) of a lithographic apparatus is described, the cooling system including a thermal conditioner that thermally conditions the patterning device, and a controller that controls the thermal conditioner to determine a temperature state of the patterning device, determine a production state of the lithographic apparatus, and thermally condition the patterning device for exposures based on the temperature state and a production state of the lithographic apparatus.

公开(公告)号：WO2022258251A1

公开(公告)日：2022-12-15

申请号：PCT/EP2022/060585

申请日：2022-04-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ERCISLI, Hasret ,  DOBAN, Alina-Ionela ,  VAN DEN NIEUWELAAR, Norbertus, Josephus, Martinus ,  VAN DAMME, Jean-Philippe, Xavier ,  DE JONG, Frederik, Eduard

IPC: G03F7/20

Abstract: Disclosed herein is a method for determining thermally-induced deformation of a structure in a lithographic apparatus, the method comprising: obtaining timing data for a structure in a lithographic apparatus, wherein the timing data comprises timing data for the current state of the structure and timing history data that comprises timing data for at least one previous state of the structure; and using one or more models to determine thermally-induced deformation data for the structure in dependence on the timing history data and the timing data for the current state of the structure.

公开(公告)号：WO2018215140A1

公开(公告)日：2018-11-29

申请号：PCT/EP2018/059830

申请日：2018-04-18

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DAMME, Jean-Philippe, Xavier ,  VAN BOKHOVEN, Laurentius, Johannes, Adrianus ,  VAN GILS, Petrus, Franciscus ,  PIETERSE, Gerben

IPC: G03F7/20

Abstract: The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.

公开(公告)号：WO2017050508A1

公开(公告)日：2017-03-30

申请号：PCT/EP2016/069921

申请日：2016-08-24

Applicant: ASML NETHERLANDS B.V.

Inventor： VOOGD, Robbert Jan ,  BASELMANS, Johannes, Jacobus, Matheus ,  MOEST, Bearrach ,  STAS, Roland, Johannes, Wilhelmus ,  VAN DAMME, Jean-Philippe, Xavier

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/706 ,  G03F7/70633 ,  G03F7/70783 ,  G03F7/7085 ,  G03F7/70983 ,  G03F9/70 ,  G03F9/7019 ,  G03F9/7026

Abstract: Controlling, based on characteristics, a lithographic apparatus having an exposure mode configured to expose a wafer held by a substrate table to an image of a pattern on a production reticle via a projection system, wherein in the exposure mode the production reticle is held at a reticle stage and is protected by a pellicle, the method comprising determining the characteristics of the projecting in a calibration mode, and the controlling comprising moving in the exposure mode at least one of the projection system, the reticle stage and the substrate table during the exposing in dependence on the characteristics.

Abstract translation: 基于特性控制具有曝光模式的光刻设备，该曝光模式被配置为经由投影系统将由基板台保持的晶片暴露于生产掩模版上的图案的图像，其中在曝光模式下，将制作掩模版保持在 所述方法包括在校准模式中确定所述投影的特性，并且所述控制包括在所述曝光期间在所述曝光模式中移动所述投影系统，所述标线片平台和所述衬底台中的至少一个 依靠特点。

公开(公告)号：WO2016169727A1

公开(公告)日：2016-10-27

申请号：PCT/EP2016/056498

申请日：2016-03-24

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE RUIT, Kevin ,  PAARHUIS, Bart, Dinand ,  VAN DAMME, Jean-Philippe, Xavier ,  ONVLEE, Johannes ,  BROUWER, Cornelis, Melchior ,  KRAMER, Pieter, Jacob

IPC: G03F1/62 ,  G03F7/20 ,  G01B11/16

CPC classification number: G03F7/70983 ,  G01B2210/56 ,  G03F1/62 ,  G03F7/2002 ,  G03F7/70258 ,  G03F7/7085

Abstract: A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support to support a patterning device, a substrate table to hold a substrate; and a projection system to project the patterned radiation beam onto a target portion of the substrate. The support is provided with a transparent layer to protect the pattering device. The apparatus further comprises a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, a compensator device which is configured to control at least one of the projection system, the substrate table and the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.

Abstract translation: 光刻设备包括被配置为调节辐射束的照明系统，支撑图案形成装置的支撑件，用于保持衬底的衬底台; 以及将图案化的辐射束投影到基板的目标部分上的投影系统。 该支撑件设有透明层以保护图案装置。 该装置还包括透明层变形确定装置，用于确定透明层的变形分布，在光刻设备的扫描运动期间表示透明层的变形的透明层的变形轮廓，配置的补偿装置 以响应于透明层的变形轮廓来控制投影系统，衬底台和支撑体中的至少一个，以补偿在装置的扫描运动期间透明层的变形。

公开(公告)号：WO2017174284A1

公开(公告)日：2017-10-12

申请号：PCT/EP2017/055407

申请日：2017-03-08

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： NAKIBOGLU, Günes ,  BAKER, Lowell ,  BLOKS, Ruud, Hendrikus, Martinus, Johannes ,  CEKLI, Hakki, Ergün ,  SCHULTZ, Geoffrey, Alan ,  VAN BOKHOVEN, Laurentius, Johannes, Adrianus ,  VAN BOXTEL, Frank, Johannes, Jacobus ,  VAN DAMME, Jean-Philippe, Xavier ,  WARD, Christopher, Charles

IPC: G03F7/20

Abstract: A patterning apparatus (10) for a lithographic apparatus, the patterning apparatus including a patterning device support structure (13, MT) configured to support a patterning device (11) having a planar surface (12); a patterning device conditioning system including a first gas outlet (20) configured to provide a first gas flow (25) over the planar surface in use and a second gas outlet (30) configured to provide a second gas flow (35) over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system (14) configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.

Abstract translation: 一种用于光刻设备的图案形成装置（10），所述图案形成装置包括图案形成装置支撑结构（13，MT），所述图案形成装置支撑结构被配置为支撑具有平坦表面（12）的图案形成装置（11）; 图案形成装置调节系统，所述图案形成装置调节系统包括构造成在使用中在所述平坦表面上提供第一气流（25）的第一气体出口（20）和构造成在所述平面上提供第二气流（35）的第二气体出口（30） 其中所述第一气体出口和所述第二气体出口布置在与所述平坦表面垂直的不同距离处; 和控制系统（14），所述控制系统（14）被配置为独立地控制离开所述第一气体出口的气体的第一动量和离开所述第二气体出口的气体的第二动量或独立地改变所述平面上的所述第一气体流量和/或所述第二气体流量 图案形成装置的表面。

公开(公告)号：WO2017162377A1

公开(公告)日：2017-09-28

申请号：PCT/EP2017/053513

申请日：2017-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： CEKLI, Hakki, Ergün ,  NAKIBOGLU, Günes ,  VAN BOXTEL, Frank, Johannes, Jacobus ,  VAN DAMME, Jean-Philippe, Xavier ,  VAN HAREN, Richard, Johannes, Franciscus

IPC: G03F7/20

Abstract: A patterning device cooling system (30) for thermally conditioning a patterning device (MA) of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system comprises: a thermal conditioner (20) configured to thermally condition the patterning device; and a controller (500) configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.

Abstract translation: 用于对光刻设备的图案形成装置（MA）进行热调节的图案形成装置冷却系统（30），其中所述图案形成装置在使用中由曝光辐射照射，其中所述图案形成装置冷却系统 包括：热调节器（20），其被配置为热调节所述图案形成装置; 和控制器（500），所述控制器（500）被配置为控制所述热调节器以取决于由所述图案形成装置吸收的所述曝光辐射的量来热调节所述图案形成装置。