公开(公告)号：US20160342098A1

公开(公告)日：2016-11-24

申请号：US15225586

申请日：2016-08-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Roelof Frederik DE GRAAF ,  Hans JANSEN ,  Bauke JANSEN ,  Hubertus Leonardus Franciscus HEUSSCHEN

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/7085

Abstract: A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.

公开(公告)号：US20150323875A1

公开(公告)日：2015-11-12

申请号：US14714944

申请日：2015-05-18

Applicant: ASML Netherlands B.V.

Inventor： Roelof Frederik DE GRAAF ,  Hans JANSEN ,  Bauke JANSEN ,  Hubertus Leonardus Franciscus HEUSSCHEN

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/7085

Abstract: A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.

Abstract translation: 光刻系统包括浸没型光刻设备，其包括构造和布置成支撑衬底的支撑件，构造和布置成将图案化的辐射束投影到衬底的目标部分上的投影系统，配置为 用浸没液体至少部分地填充所述投影系统与所述基板和支撑体中的至少一个之间的空间，布置成将所述浸没液体提供给所述液体限制结构的液体供应系统，以及布置成提供清洁 液体流到与浸没液接触的光刻设备的表面。 该系统包括将洗涤液直接提供给液体限制结构并通过液体净化系统将浸液液体间接提供给液体限制结构的开关。