公开(公告)号：WO2019233743A1

公开(公告)日：2019-12-12

申请号：PCT/EP2019/062903

申请日：2019-05-20

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DONGEN, Jeroen ,  TEL, Wim, Tjibbo ,  ROY, Sarathi ,  ZHANG, Yichen ,  CAVALLI, Andrea ,  SJENITZER, Bart, Laurens ,  HASTINGS, Simon, Philip, Spencer

IPC: G03F7/20 ,  G03F9/00

Abstract: The present invention provides a method of determining a sampling control scheme and/or a processing control for substrates processed by a device. The method uses a fingerprint model and an evolution model to generate the control scheme. The fingerprint model is based on fingerprint data for a processing parameter of at least one substrate processed by a device, and the evolution model represents variation of the fingerprint data over time. The fingerprint model and the evolution model are analyzed and a control scheme is generated for the device using the analysis. The sampling control scheme provides an indication for where and when to take measurements on substrates processed by the device. The processing control scheme provides an indication for how to control the processing of the substrate. The present invention also provides a method of determining which of the multiple devices contributed to a fingerprint of a processing parameter.