公开(公告)号：WO2019185233A1

公开(公告)日：2019-10-03

申请号：PCT/EP2019/053535

申请日：2019-02-13

Applicant: ASML NETHERLANDS B.V.

Inventor： WEIJDEN, Ivo, Matteo, Leonardus ,  VAN DONGEN, Jeroen ,  LAMBREGTS, Cornelis, Johannes, Henricus ,  THIJSSEN, Theo, Wilhelmus, Maria ,  DE WIT, Ruud, Rudolphus, Johannes, Catharinus ,  STRUIJS, Hans, Marinus ,  CROMBAG, Erik, Mathijs, Maria ,  WERKMAN, Roy ,  SCHUT, Maria, Helena ,  RIEMENS, Erwin ,  MEELDIJK, Menno

IPC: G03F7/20 ,  H01L21/66

Abstract: Disclosed is a method for determining a preferred control strategy relating to control of a manufacturing process for manufacturing an integrated circuit. The method comprises: obtaining process data associated with a design of said integrated circuit; and obtaining a plurality of candidate control strategies configured to control the manufacturing process based on the process data, each candidate control strategy comprising an associated cost metric based on an associated requirement to implement the candidate control strategy. A quality metric related to an expected performance of the manufacturing process is determined for each candidate control strategies, and a preferred control strategy is selected based on the determined quality metrics and associated cost metrics for each candidate control strategy.

公开(公告)号：WO2023025506A1

公开(公告)日：2023-03-02

申请号：PCT/EP2022/071212

申请日：2022-07-28

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DONGEN, Jeroen ,  TSIATMAS, Anagnostis ,  VERMA, Alok ,  VAN DER MEIJDEN, Vidar ,  MC NAMARA, Elliott, Gerard

IPC: G03F7/20

Abstract: Disclosed is a method for determining a measurement recipe describing measurement settings for measuring a parameter of interest from a compound structure on a substrate. The method comprises obtaining first training data relating to measurements of reference targets, the targets comprising: a parameter of interest targets, each parameter of interest target having an induced set value which is varied over said parameter of interest targets; and one or more isolated feature targets, each comprising repetitions of one or more features. Second training data is obtained comprising compound structure measurement signals obtained from measurement of one or more instances of said compound structure, One or more machine learning models are trained using said first training data and second training data to infer a value for the parameter of interest from a measurement signal related to said compound structure corrected for a feature asymmetry contribution.

公开(公告)号：WO2019233743A1

公开(公告)日：2019-12-12

申请号：PCT/EP2019/062903

申请日：2019-05-20

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DONGEN, Jeroen ,  TEL, Wim, Tjibbo ,  ROY, Sarathi ,  ZHANG, Yichen ,  CAVALLI, Andrea ,  SJENITZER, Bart, Laurens ,  HASTINGS, Simon, Philip, Spencer

IPC: G03F7/20 ,  G03F9/00

Abstract: The present invention provides a method of determining a sampling control scheme and/or a processing control for substrates processed by a device. The method uses a fingerprint model and an evolution model to generate the control scheme. The fingerprint model is based on fingerprint data for a processing parameter of at least one substrate processed by a device, and the evolution model represents variation of the fingerprint data over time. The fingerprint model and the evolution model are analyzed and a control scheme is generated for the device using the analysis. The sampling control scheme provides an indication for where and when to take measurements on substrates processed by the device. The processing control scheme provides an indication for how to control the processing of the substrate. The present invention also provides a method of determining which of the multiple devices contributed to a fingerprint of a processing parameter.

公开(公告)号：WO2019052747A1

公开(公告)日：2019-03-21

申请号：PCT/EP2018/071498

申请日：2018-08-08

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DONGEN, Jeroen ,  MC NAMARA, Elliott, Gerard ,  HINNEN, Paul, Christiaan ,  JOCHEMSEN, Marinus

IPC: G03F7/20

Abstract: Methods of controlling a patterning process are disclosed. In one arrangement, tilt data resulting from a measurement of tilt in an etching path through a target layer of a structure on a substrate is obtained. The tilt represents a deviation in a direction of the etching path from a perpendicular to the plane of the target layer. The tilt data is used to control a patterning process used to form a pattern in a further layer.

公开(公告)号：EP4194952A1

公开(公告)日：2023-06-14

申请号：EP21214132.9

申请日：2021-12-13

Applicant: ASML Netherlands B.V.

Inventor： VAN DONGEN, Jeroen ,  TSIATMAS, Anagnostis ,  VERMA, Alok ,  VAN DER MEIJDEN, Vidar ,  MC NAMARA, Elliott Gerard

IPC: G03F7/20

Abstract: Disclosed is a method for determining a measurement recipe describing measurement settings for measuring a parameter of interest from a compound structure on a substrate. The method comprises obtaining first training data relating to measurements of reference targets, the targets comprising: a parameter of interest targets, each parameter of interest target having an induced set value which is varied over said parameter of interest targets; and one or more isolated feature targets, each comprising repetitions of one or more features. Second training data is obtained comprising compound structure measurement signals obtained from measurement of one or more instances of said compound structure, One or more machine learning models are trained using said first training data and second training data to infer a value for the parameter of interest from a measurement signal related to said compound structure corrected for a feature asymmetry contribution.

公开(公告)号：EP4392829A1

公开(公告)日：2024-07-03

申请号：EP22765013.2

申请日：2022-07-28

Applicant: ASML Netherlands B.V.

Inventor： VAN DONGEN, Jeroen ,  TSIATMAS, Anagnostis ,  VERMA, Alok ,  VAN DER MEIJDEN, Vidar ,  MC NAMARA, Elliott, Gerard

IPC: G03F7/20

CPC classification number: G03F7/70633

公开(公告)号：EP3579051A1

公开(公告)日：2019-12-11

申请号：EP18176544.7

申请日：2018-06-07

Applicant: ASML Netherlands B.V.

Inventor： VAN DONGEN, Jeroen ,  TEL, Wim Tjibbo

IPC: G03F7/20

Abstract: The present invention provides a method of determining a sampling scheme for substrates processed by a device. The method uses a fingerprint model and an evolution model to generate the sampling scheme. The fingerprint model is based on fingerprint data for a processing parameter of at least one substrate processed by a device, and the evolution model represents variation of the fingerprint data over time. The fingerprint model and the evolution model are analysed and a sampling scheme is generated for the device using the analysis. The sampling scheme provides an indication for where and when to take measurements on substrates processed by the device.

公开(公告)号：EP3547031A1

公开(公告)日：2019-10-02

申请号：EP19156892.2

申请日：2019-02-13

Applicant: ASML Netherlands B.V.

Inventor： WEIJDEN, Ivo, Matteo, Leonardus ,  VAN DONGEN, Jeroen ,  LAMBREGTS, Cornelis, Johannes, Henricus ,  THIJSSEN, Theo, Wilhelmus, Maria ,  DE WIT, Ruud, Rudolphus, Johannes, Catharinus ,  STRUIJS, Hans, Marinus ,  CROMBAG, Erik, Mathijs, Maria ,  WERKMAN, Roy ,  SCHUT, Maria, Helena ,  RIEMENS, Erwin ,  MEELDIJK, Menno

IPC: G03F7/20 ,  H01L21/66

Abstract: Disclosed is a method for determining a preferred control strategy relating to control of a manufacturing process for manufacturing an integrated circuit. The method comprises: obtaining process data associated with a design of said integrated circuit; and obtaining a plurality of candidate control strategies configured to control the manufacturing process based on the process data, each candidate control strategy comprising an associated cost metric based on an associated requirement to implement the candidate control strategy. A quality metric related to an expected performance of the manufacturing process is determined for each candidate control strategies, and a preferred control strategy is selected based on the determined quality metrics and associated cost metrics for each candidate control strategy.

公开(公告)号：EP3547030A1

公开(公告)日：2019-10-02

申请号：EP18165064.9

申请日：2018-03-29

Applicant: ASML Netherlands B.V.

Inventor： WEIJDEN, Ivo, Matteo, Leonardus ,  VAN DONGEN, Jeroen ,  LAMBREGTS, Cornelis, Johannes, Henricus ,  THIJSSEN, Theo, Wilhelmus, Maria ,  DE WIT, Ruud, Rudolphus, Johannes, Catharinus ,  STRUIJS, Hans, Marinus

IPC: G03F7/20 ,  H01L21/66

Abstract: Disclosed is a method for determining a preferred control strategy relating to control of a manufacturing process for manufacturing an integrated circuit. The method comprises: obtaining process data associated with a design of said integrated circuit; and obtaining a plurality of candidate control strategies configured to control the manufacturing process based on the process data, each candidate control strategy comprising an associated cost metric based on an associated requirement to implement the candidate control strategy. A quality metric related to an expected performance of the manufacturing process is determined for each candidate control strategies, and a preferred control strategy is selected based on the determined quality metrics and associated cost metrics for each candidate control strategy.

公开(公告)号：EP3457212A1

公开(公告)日：2019-03-20

申请号：EP17191525.9

申请日：2017-09-18

Applicant: ASML Netherlands B.V.

Inventor： VAN DONGEN, Jeroen ,  MC NAMARA, Elliott, Gerard ,  HINNEN, Paul, Christiaan ,  JOCHEMSEN, Marinus

IPC: G03F7/20

Abstract: Methods of controlling a patterning process are disclosed. In one arrangement, tilt data resulting from a measurement of tilt in an etching path through a target layer of a structure on a substrate is obtained. The tilt represents a deviation in a direction of the etching path from a perpendicular to the plane of the target layer. The tilt data is used to control a patterning process used to form a pattern in a further layer.