公开(公告)号：WO2018104073A1

公开(公告)日：2018-06-14

申请号：PCT/EP2017/080324

申请日：2017-11-24

Applicant: ASML NETHERLANDS B.V.

Inventor： LU, Yen-Wen ,  CHEN, Xiaorui ,  LIN, Yang

IPC: G03F7/20 ,  G06F17/50 ,  G05B19/418

CPC classification number: G03F7/70483 ,  G03F7/70491 ,  G03F7/70525 ,  G05B19/418 ,  G05B19/41875 ,  G06F17/5009 ,  Y02P90/265

Abstract: A method of controlling a computer process for designing or verifying a photolithographic component includes building a source tree comprising nodes of the process, including dependency relationships among the nodes, defining, for some nodes, at least two different process conditions, expanding the source tree to form an expanded tree, including generating a separate node for each different defined process condition, and duplicating dependent nodes having an input relationship to each generated separate node, determining respective computing hardware requirements for processing the node, selecting computer hardware constraints based on capabilities of the host computing system, determining, based on the requirements and constraints and on dependency relations in the expanded tree, an execution sequence for the computer process, and performing the computer process on the computing system.

公开(公告)号：WO2022248217A1

公开(公告)日：2022-12-01

申请号：PCT/EP2022/062691

申请日：2022-05-10

Applicant: ASML NETHERLANDS B.V.

Inventor： PENG, Xingyue ,  HOWELL, Rafael C. ,  LU, Yen-Wen ,  CHEN, Xiaorui

IPC: G03F1/36 ,  G03F1/70 ,  G03F7/20 ,  G06F30/398 ,  G06T7/00

Abstract: Described herein are methods and systems for determining mask rule check violations (MRC) associated with mask features using a detector having geometric properties corresponding to the MRC. The detector (e.g., elliptical shaped) is configured to include a curved portion to detect a curvature violation, an enclosed area (e.g., a fully enclosed area or a partially enclosed area having an opening), a predefined orientation axis configured to guide relative positioning of the detector with a mask feature, and a length to detect a critical dimension violation. The orientation axis of the detector is aligned with a normal axis at a location on the mask feature. Based on the orientation axis aligned with the normal axis of the mask feature, an MRC violation is determined corresponding to a region of the mask feature that intersects the enclosed area.