公开(公告)号：US20170307978A1

公开(公告)日：2017-10-26

申请号：US15508543

申请日：2015-08-11

Applicant: ASML Netherlands B.V.

Inventor： Erik Willem BOGAART ,  Chuangxin ZHAO

IPC: G03F7/20 ,  H05G2/00 ,  G01N27/22

CPC classification number: G03F7/20 ,  G01N27/22 ,  G01N2027/222 ,  G03F7/70033 ,  G03F7/7085 ,  G03F7/70908 ,  H05G2/001

Abstract: Capacitive measurements for monitoring vapor or deposits from a vapor in a radiation source for a lithography apparatus. The measurements may be used to control operation of the radiation source. In one particular arrangement measurements from a plurality of capacitors are used to distinguish between changes in capacitance caused by the vapor and changes in capacitance caused by deposits from the vapor.

公开(公告)号：US20160209753A1

公开(公告)日：2016-07-21

申请号：US15024815

申请日：2014-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Chuangxin ZHAO ,  Pär Mårten Lukas BROMAN ,  Richard Joseph BRULS ,  Cristian Bogdan CRAUS ,  Jan GROENEWOLD ,  Dzmitry LABETSKI ,  Kerim NADIR ,  Hendrikus Gijsbertsu SCHIMMEL ,  Christian Felix WäHLISCH

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70058 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/005

Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.

Abstract translation: 用于光刻设备，特别是激光产生的等离子体源的辐射源包括风扇单元，其围绕但不阻碍收集的辐射束，其被操作以产生远离光轴的缓冲气体中的流。 风扇单元可以包括大致平行于光轴并被驱动以围绕光轴旋转的多个平面或弯曲的叶片。