公开(公告)号：US20150077729A1

公开(公告)日：2015-03-19

申请号：US14532897

申请日：2014-11-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Tjarko Adriaan Rudolf VAN EMPEL ,  Vadim Yevgenyevich BANINE ,  Vladimir Vitalevich IVANOV ,  Erik Roelof LOOPSTRA ,  Johannes Hubertus Josephina MOORS ,  Jan Bernard Plechelmus VAN SCHOOT ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Gerardus Hubertus Petrus Maria SWINKELS ,  Hendrikus Gijsbertus SCHIMMEL ,  Dzmitry LABETSKI

IPC: H05G2/00 ,  G03F7/20 ,  H05K7/20

CPC classification number: H05G2/008 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/006 ,  H05K7/2039

Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.

Abstract translation: 一种用于产生极紫外辐射源的模块，包括极紫外辐射发射源，该源提供有被配置为将点火材料的流体供应到预定的目标点火位置的供应，以及构造和布置以产生的点火机构 来自点火材料的等离子体在目标点火位置，等离子体发射极紫外线辐射; 收集器镜，构造和布置成将等离子体发射的辐射聚焦在焦点处; 以及散热器，其具有构造和布置成将热能转移离开目标点火位置的热能转向表面，其中散热器位于靠近目标点火位置的位置。

公开(公告)号：US20250060681A1

公开(公告)日：2025-02-20

申请号：US18721251

申请日：2022-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Emericus Antoon Theodorus VAN DEN AKKER ,  Joost DE HOOGH ,  Zhuangxiong HUANG ,  Sjoerd Frans DE VRIES ,  Syed Aaquib HAZARI

IPC: G03F7/00

Abstract: A system for use in a lithographic, the system includes: a substrate table; another device; and at least one deformable partition. The substrate table (for example a wafer stage) is arranged to support a substrate. The system is configurable in a first configuration such that a surface of the device faces and is adjacent to the substrate and the substrate table. The at least one deformable partition either: (a) extends partially from the substrate table towards the surface of the device when the system is in the first configuration; or (b) extends partially from the surface of the device that faces and is adjacent to the substrate and the substrate table when the system is in the first configuration towards the substrate table.

公开(公告)号：US20210141311A1

公开(公告)日：2021-05-13

申请号：US17155951

申请日：2021-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Christianus Wilhelmus Johannes BERENDSEN ,  Rui Miguel DUARTE RODRIGUES NUNES ,  Alexander Igorevich ERSHOV ,  Kornelis Frits FEENSTRA ,  Igor Vladimirovich FOMENKOV ,  Klaus Martin HUMMLER ,  Arun JOHNKADAKSHAM ,  Matthias KRAUSHAAR ,  Andrew David LAFORGE ,  Marc Guy LANGLOIS ,  Maksim LOGINOV ,  Yue MA ,  Seyedmohammad MOJAB ,  Kerim NADIR ,  Alexander SHATALOV ,  John Tom STEWART ,  Henricus Gerardus TEGENBOSCH ,  Chunguang XIA

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US20240085796A1

公开(公告)日：2024-03-14

申请号：US18380439

申请日：2023-10-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Christianus Wilhelmus Johannes BERENDSEN ,  Rui Miguel DUARTE RODRIGUES NUNES ,  Alexander Igorevich ERSHOV ,  Kornelis Frits FEENSTRA ,  Igor Vladimirovich FOMENKOV ,  Klaus Martin HUMMLER ,  Arun JOHNKADAKSHAM ,  Matthias KRAUSHAAR ,  Andrew David LAFORGE ,  Marc Guy LANGLOIS ,  Maksim LOGINOV ,  Yue MA ,  Seyedmohammad MOJAB ,  Kerim NADIR ,  Alexander SHATALOV ,  John Tom STEWART ,  Henricus Gerardus TEGENBOSCH ,  Chunguang XIA

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US20200089124A1

公开(公告)日：2020-03-19

申请号：US16469689

申请日：2018-01-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Christianus Wilhelmus Johanne BERENDSEN ,  Rui Miguel DUARTE RODRIGES NUNES ,  Alexander Igorevich ERSHOV ,  Kornelis Frits FEENSTRA ,  Igor Vladimirovich FOMENKOV ,  Klaus Martin HUMMLER ,  Arun JOHNKADAKSHAM ,  Matthias KRAUSHAAR ,  Andrew David LAFORGE ,  Marc Guy LANGLOIS ,  Maksim LOGINOV ,  Yue MA ,  Seyedmohammad MOJAB ,  Kerim NADIR ,  Alexander SHATALOV ,  John Tom STEWART (IV) ,  Henricus Gerardus TEGENBOSCH ,  Chunguang XIA

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US20160209753A1

公开(公告)日：2016-07-21

申请号：US15024815

申请日：2014-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Chuangxin ZHAO ,  Pär Mårten Lukas BROMAN ,  Richard Joseph BRULS ,  Cristian Bogdan CRAUS ,  Jan GROENEWOLD ,  Dzmitry LABETSKI ,  Kerim NADIR ,  Hendrikus Gijsbertsu SCHIMMEL ,  Christian Felix WäHLISCH

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70058 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/005

Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.

Abstract translation: 用于光刻设备，特别是激光产生的等离子体源的辐射源包括风扇单元，其围绕但不阻碍收集的辐射束，其被操作以产生远离光轴的缓冲气体中的流。 风扇单元可以包括大致平行于光轴并被驱动以围绕光轴旋转的多个平面或弯曲的叶片。