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    RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY
    1.
    发明申请
    RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY 审中-公开
    基于互联网一致性的招标选择

    公开(公告)号：WO2016202695A1

    公开(公告)日：2016-12-22

    申请号：PCT/EP2016/063313

    申请日：2016-06-10

    Applicant: ASML NETHERLANDS B.V.

    Inventor： DEN BOEF, Arie, Jeffrey ,  DAVIS, Timothy, Dugan ,  ENGBLOM, Peter, David ,  BHATTACHARYYA, Kaustuve

    IPC: G03F7/20

    CPC classification number: G03F9/7069 ,  G01B11/272 ,  G03F7/70633

    Abstract: Disclosed herein is a method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.

    Abstract translation: 这里公开了一种方法，包括：确定多个基板测量配方的一个基板测量配方与多个基板测量配方的每个其它基板测量配方之间的配方一致性; 计算配方一致性的功能; 如果功能满足标准，则从多个基板测量配方中消除一个基板测量配方; 并重申确定，计算和消除，直到满足终止条件。 本文还公开了一种基板测量装置，包括被配置为存储多个基板测量配方的存储器，以及配置为基于多个基板中的配方一致性从多个基板测量配方中选择一个或多个基板测量配方的处理器 测量食谱。

    METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM
    2.
    发明申请
    METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM 审中-公开

    公开(公告)号：WO2019020292A1

    公开(公告)日：2019-01-31

    申请号：PCT/EP2018/066594

    申请日：2018-06-21

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NOOT, Marc, Johannes ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  BHATTACHARYYA, Kaustuve ,  BYUN, Jin-Moo ,  KIM, Hyun Su ,  JANG, Won-Jae ,  DAVIS, Timothy, Dugan

    IPC: G03F7/20

    Abstract: Disclosed are a method, computer program and a metrology apparatus for measuring a process effect parameter relating to a manufacturing process for manufacturing integrated circuits on a substrate. The method comprises determining for a structure, a first quality metric value for a quality metric from a plurality of measurement values each relating to a different measurement condition while cancelling or mitigating for the effect of the process effect parameter on the plurality of measurement values and a second quality metric value for the quality metric from at least one measurement value relating to at least one measurement condition without cancelling or mitigating for the effect of the process effect parameter on the at least one measurement value. The process effect parameter value for the process effect parameter can then be calculated from the first quality metric value and the second quality metric value, for example by calculating their difference.

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