公开(公告)号：WO2021069231A1

公开(公告)日：2021-04-15

申请号：PCT/EP2020/076765

申请日：2020-09-24

Applicant: ASML NETHERLANDS B.V.

Inventor： KLUGKIST, Joost, André ,  NIKIPELOV, Andrey ,  ENGELEN, Wouter Joep ,  LIAN, Jin ,  VERMEULEN, Paul, Alexander ,  YEGEN, Halil, Gökay

IPC: G02B5/18 ,  G02B5/02 ,  G02B27/09

Abstract: A diffuser is configured to receive and transmit radiation. The diffuser comprises a scattering layer (510) configured to scatter the received radiation, the scattering layer (510) comprising a first substance and having distributed therein a plurality of voids. The first substance may be a scattering substance, or alternatively, at least one of the voids may contain the scattering substance and the first substance has a lower refractive index than the scattering substance.

公开(公告)号：EP3871044A1

公开(公告)日：2021-09-01

申请号：EP19770084.2

申请日：2019-09-19

Applicant: ASML Netherlands B.V.

Inventor： MOHAMMADI, Vahid ,  CHOWDHURY, Yassin ,  DE GROOT, Pieter Cristiaan ,  ENGELEN, Wouter Joep ,  VAN DER HOORN, Marcel Johannes Petrus Theodorus

IPC: G03F7/20 ,  G02B5/22 ,  H01L27/146

公开(公告)号：EP4348315A1

公开(公告)日：2024-04-10

申请号：EP22725509.8

申请日：2022-04-28

Applicant: ASML Netherlands B.V.

Inventor： CHONG, Derick Yun Chek ,  REDDY, Bogathi Vishnu Vardhana ,  ENGELEN, Wouter Joep ,  DE GROOT, Pieter Cristiaan

IPC: G02B5/18 ,  G03F7/20

公开(公告)号：EP4109178A1

公开(公告)日：2022-12-28

申请号：EP21180749.0

申请日：2021-06-22

Applicant: ASML Netherlands B.V.

Inventor： HARTGERS, Albertus ,  STEEGHS, Marco Matheus Louis ,  SWINKELS, Gerardus Hubertus Petrus Maria ,  IMPONENTE, Giovanni ,  PLANTZ, Nicholas William Maria ,  ENGELEN, Wouter Joep ,  VAN DE KERKHOF, Marcus Adrianus

IPC: G03F7/20

Abstract: A plate for use in an imaging system to determine two optical properties of an illumination beam of the imaging system, the imaging system configured to illuminate an illumination region with the illumination beam, the plate comprising a plurality of markers, wherein a first subset of the plurality of markers comprises a first type of markers for determining a first optical property of the illumination beam, a second subset of the plurality of markers comprises a second type of markers for determining a second optical property of the illumination beam, the plurality of markers are located within a marker region of the plate and the marker region generally corresponds to the illumination region.

公开(公告)号：EP3514630A1

公开(公告)日：2019-07-24

申请号：EP19152558.3

申请日：2014-06-17

Applicant: ASML Netherlands B.V.

Inventor： NIKIPELOV, Andrey ,  FRIJNS, Olav Waldemar Vladimir ,  DE VRIES, Gosse Charles ,  LOOPSTRA, Erik Roelof ,  BANINE, Vadim Yevgenyevich ,  DE JAGER, Pieter Willem Herman ,  DONKER, Rilpho Ludovicus ,  NIENHUYS, Han-Kwang ,  KRUIZINGA, Borgert ,  ENGELEN, Wouter Joep ,  LUITEN, Otger Jan ,  AKKERMANS, Johannes Antonius Gerardus ,  GRIMMINCK, Leonardus Adrianus Gerardus ,  LITVINENKO, Vladimir

IPC: G03F7/20 ,  H05H7/04 ,  G01J1/26 ,  G02B1/06 ,  G02B5/20 ,  G01J1/04 ,  G21K1/10 ,  H01S3/09 ,  G01J1/42 ,  G02B26/02 ,  H01S3/00

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.