公开(公告)号：WO2019228746A1

公开(公告)日：2019-12-05

申请号：PCT/EP2019/061201

申请日：2019-05-02

Applicant: ASML NETHERLANDS B.V.

Inventor： LIAN, Jin ,  ZHOU, Zili ,  AKBULUT, Duygu ,  TARABRIN, Sergey

IPC: G03F7/20

Abstract: The disclosure relates to measuring a target. In one arrangement, a measurement apparatus is provided that has an optical system configured to illuminate a target with radiation and direct reflected radiation from the target to a sensor. A programmable spatial light modulator in a pupil plane of the optical system is programmed to redirect light in each of a plurality of pupil plane zones in such a way as to form a corresponding plurality of images at different locations on the sensor. Each image is formed by radiation passing through a different respective one of the pupil plane zones.

公开(公告)号：WO2021224009A1

公开(公告)日：2021-11-11

申请号：PCT/EP2021/060403

申请日：2021-04-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ZWIER, Olger, Victor ,  VAN DER SCHAAR, Maurits ,  BOS, Hilko, Dirk ,  VAN DER LAAN, Hans ,  AL ARIF, S. M. Masudur Rahman ,  VAN BUEL, Henricus, Wilhelmus, Maria ,  KOOLEN, Armand, Eugene, Albert ,  CALADO, Victor, Emanuel ,  BHATTACHARYYA, Kaustuve ,  LIAN, Jin ,  GOORDEN, Sebastianus, Adrianus ,  LIM, Hui Quan

IPC: G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G03F1/42 ,  G03F7/20 ,  G03F9/00

Abstract: Disclosed is a substrate and associated patterning device. The substrate comprises at least one target arrangement suitable for metrology of a lithographic process, the target arrangement comprising at least one pair of similar target regions which are arranged such that the target arrangement is, or at least the target regions for measurement in a single direction together are, centrosymmetric. A metrology method is also disclosed for measuring the substrate. A metrology method is also disclosed comprising which comprises measuring such a target arrangement and determining a value for a parameter of interest from the scattered radiation, while correcting for distortion of the metrology apparatus used.

公开(公告)号：WO2018188891A1

公开(公告)日：2018-10-18

申请号：PCT/EP2018/056554

申请日：2018-03-15

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh ,  LIAN, Jin ,  REHMAN, Samee Ur ,  JAK, Martin, Jacobus, Johan

IPC: G03F7/20

Abstract: Methods and apparatus for measuring a plurality of structures formed on a substrate are disclosed. In one arrangement, a method comprises obtaining data from a first measurement process. The first measurement process comprises individually measuring each of the plurality of structures to measure a first property of the structure. A second measurement process is used to measure a second property of each of the plurality of structures. The second measurement process comprises illuminating each structure with radiation having a radiation property that is individually selected for that structure using the measured first property for the structure.

公开(公告)号：WO2022022949A1

公开(公告)日：2022-02-03

申请号：PCT/EP2021/068589

申请日：2021-07-06

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Fei ,  LIAN, Jin ,  HUANG, Zhuangxiong ,  DE WINTER, Laurentius, Cornelius ,  STAALS, Frank

IPC: G03F7/20 ,  G03F9/00 ,  G03F1/44

Abstract: Disclosed is a method for focus measurement of a lithographic process. The method comprises receiving a substrate on which a metrology pattern has been printed with a lithographic apparatus with an illumination pupil, illuminating the metrology pattern with a metrology tool to measure a signal based on radiation scattered by the metrology pattern, and determining or monitoring a focus of the lithographic process based on the measured signal. Position of at least part of the metrology pattern is focus dependent. At least part of the metrology pattern has been printed by the lithography apparatus with an angular asymmetric illumination pupil.

公开(公告)号：WO2020120082A1

公开(公告)日：2020-06-18

申请号：PCT/EP2019/081836

申请日：2019-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： CRAMER, Hugo, Augustinus, Joseph ,  BOS, Hilko, Dirk ,  KOOP, Erik, Johan ,  KOOLEN, Armand, Eugene, Albert ,  NIENHUYS, Han-Kwang ,  POLO, Alessandro ,  LIAN, Jin ,  DEN BOEF, Arie, Jeffrey

IPC: G03F7/20 ,  G01N21/47

Abstract: The disclosure relates to measuring a parameter of a lithographic process and a metrology apparatus. In one arrangement, radiation from a radiation source is modified and used to illuminate a target formed on a substrate using the lithographic process. Radiation scattered from a target is detected and analyzing to determine the parameter. The modification of the radiation comprises modifying a wavelength spectrum of the radiation to have a local minimum between a global maximum and a local maximum, wherein the power spectral density of the radiation at the local minimum is less than 20% of the power spectral density of the radiation at the global maximum and the power spectral density of the radiation at the local maximum is at least 50% of the power spectral density of the radiation at the global maximum.

公开(公告)号：WO2019081200A1

公开(公告)日：2019-05-02

申请号：PCT/EP2018/077479

申请日：2018-10-09

Applicant: ASML NETHERLANDS B.V.

Inventor： JAVAHERI, Narjes ,  HAJIAHMADI, Mohammadreza ,  BOZKURT, Murat ,  DA COSTA ASSAFRAO, Alberto ,  NOOT, Marc, Johannes ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  LIAN, Jin

IPC: G03F7/20 ,  G01N21/47 ,  H01L23/544

Abstract: Disclosed is a method, and associated apparatuses, for measuring a parameter of interest relating to a structure having at least two layers. The method comprises illuminating the structure with measurement radiation and detecting scattered radiation having been scattered by said structure. The scattered radiation comprises normal and complementary higher diffraction orders. A scatterometry model which relates a scattered radiation parameter to at least a parameter of interest and an asymmetry model which relates the scattered radiation parameter to at least one asymmetry parameter are defined, the asymmetry parameter relating to one or more measurement system errors and/or an asymmetry in the target other than a misalignment between the two layers. A combination of the scatterometry model and asymmetry model is used to determine a system of equations, and the system of equations is then solved for the parameter of interest.

公开(公告)号：WO2022253501A1

公开(公告)日：2022-12-08

申请号：PCT/EP2022/061665

申请日：2022-05-02

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHOU, Zili ,  SWINKELS, Daan ,  LIAN, Jin

IPC: G03F7/20

Abstract: Disclosed is a method of measuring an overlay or focus parameter from a target and associated metrology apparatus. The method comprises configuring measurement radiation to obtain a configured measurement spectrum of said measurement radiation by: imposing an intensity weighting on individual wavelength bands of said measurement radiation such that said individual wavelength bands have an intensity according to said intensity weighting, the intensity weighting being such that a measured value for the overlay or focus parameter is at least partially corrected for the effect of target imperfections; and/or imposing a modulation on a measurement spectrum of said measurement radiation. The configured measurement radiation is used to measure the target. A value for the overlay or focus parameter is determined from scattered radiation resultant from measurement of the target.

公开(公告)号：WO2022223230A1

公开(公告)日：2022-10-27

申请号：PCT/EP2022/057659

申请日：2022-03-23

Applicant: ASML NETHERLANDS B.V.

Inventor： LIAN, Jin ,  KOOLEN, Armand, Eugene, Albert ,  GOORDEN, Sebastianus, Adrianus ,  LIM, Hui Quan

IPC: G03F7/20

Abstract: Disclosed is a method of determining a correction for a measurement of a target and an associated apparatus. The measurement is subject to a target-dependent correction parameter which has a dependence the target and/or a stack on which the target is comprised. The method comprises obtaining first measurement data relating to a measurement of a fiducial target, said first measurement data comprising at least a first and second set of intensity parameter values; and second measurement data relating to a measurement of the fiducial target, the second measurement data comprising a third set of intensity parameter values. A target-invariant correction parameter is determined from said first measurement data and second measurement data, the target-invariant correction parameter being a component of the target-dependent correction parameter which is not dependent on the target and/or a stack; and the correction is determined from said target-invariant correction parameter.

公开(公告)号：WO2022122560A1

公开(公告)日：2022-06-16

申请号：PCT/EP2021/084043

申请日：2021-12-02

Applicant: ASML NETHERLANDS B.V. [NL]/[NL] ,  ASML HOLDING N.V. [NL]/[NL]

Inventor： SOKOLOV, Sergei ,  HUISMAN, Simon, Reinald ,  LIAN, Jin ,  GOORDEN, Sebastianus, Adrianus ,  ERALP, Muhsin ,  PELLEMANS, Henricus, Petrus, Maria ,  KREUZER, Justin, Lloyd

IPC: G01N21/95 ,  G01N21/956 ,  G02B6/36 ,  G02B6/00

Abstract: A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).

公开(公告)号：WO2022008160A1

公开(公告)日：2022-01-13

申请号：PCT/EP2021/065681

申请日：2021-06-10

Applicant: ASML NETHERLANDS B.V.

Inventor： HUISMAN, Simon, Reinald ,  BEUKMAN, Arjan, Johannes, Anton ,  DEN BOEF, Arie, Jeffrey ,  GOORDEN, Sebastianus, Adrianus ,  KUMAR, Nitish ,  LIAN, Jin ,  ZHOU, Zili

IPC: G03F7/20 ,  G01N21/95 ,  G02B26/08 ,  G03F9/00

Abstract: Disclosed is an illumination arrangement for spectrally shaping a broadband illumination beam to obtain a spectrally shaped illumination beam. The illumination arrangement comprises a beam dispersing element for dispersing the broadband illumination beam and a spatial light modulator for spatially modulating the broadband illumination beam subsequent to being dispersed. The illumination arrangement further comprises at least one of a beam expanding element for expanding said broadband illumination beam in at least one direction, located between an input of the illumination arrangement and the spatial light modulator; and a lens array, each lens of which for directing a respective wavelength band of the broadband illumination beam subsequent to being dispersed onto a respective region of the spatial light modulator.