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公开(公告)号：WO2022228820A1
公开(公告)日：2022-11-03
申请号：PCT/EP2022/058586
申请日：2022-03-31
Applicant: ASML NETHERLANDS B.V.
Inventor： SMORENBURG, Petrus, Wilhelmus , EDWARD, Stephen , DONDERS, Sjoerd, Nicolaas, Lambertus , SCHELLEKENS, Adrianus, Johannes, Hendrikus , O'DWYER, David , NIKIPELOV, Andrey , DE VRIES, Gosse, Charles
Abstract: An assembly comprises a space configured for placing a medium to receive a first radiation for generating a second radiation. In operation, the second radiation propagates coaxially with the first radiation after the medium. The assembly further comprises an optical element after the medium for transmitting or reflecting the first radiation with a surface area. The assembly is configured such that, in operation, a cleaning gas is in contact with the surface area. A reactive medium is generated from at least a part of the cleaning gas by the second radiation for removing a contamination from the surface area.
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公开(公告)号：WO2020234043A1
公开(公告)日：2020-11-26
申请号：PCT/EP2020/063164
申请日：2020-05-12
Applicant: ASML NETHERLANDS B.V.
Inventor： MOORS, Johannes, Hubertus, Josephina , BANINE, Vadim, Yevgenyevich , NIKIPELOV, Andrey , VAN DE KERKHOF, Marcus, Adrianus , YAGHOOBI, Parham
Abstract: A mirror comprises a body and a surface defined by the body. The body comprises a plurality of layers. The plurality of layers are arranged to act as a multilayer Bragg reflector for radiation having a first wavelength when radiation having said first wavelength is incident on the surface. A local tangent plane of the surface is inclined at a non-zero angle relative to a local tangent plane of the plurality of layers.
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公开(公告)号：WO2020069931A1
公开(公告)日：2020-04-09
申请号：PCT/EP2019/075801
申请日：2019-09-25
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , BECKERS, Johan, Franciscus, Maria
Abstract: The present invention relates to an object, such as a sensor for an immersion lithographic apparatus, which object has an outer layer which comes in contact with immersion liquid and wherein said outer layer has a composition comprising a rare earth element. The invention further relates to an immersion lithographic apparatus comprising such an object and to a method for manufacturing such an object.
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公开(公告)号：WO2019197128A3
公开(公告)日：2019-10-17
申请号：PCT/EP2019/057050
申请日：2019-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DE KERKHOF, Marcus, Adrianus , CLOIN, Christian, Gerardus, Norbertus, Hendricus, Marie , YAKUNIN, Andrei, Mikhailovich , NIKIPELOV, Andrey , VAN DUIVENBODE, Jeroen
IPC: G03F7/20 , H01L21/683
Abstract: An apparatus comprising an electrostatic clamp for clamping a component, and a mechanism for generating free charges adjacent to the electrostatic clamp. The mechanism for generating free charges is configured to generate free charges adjacent to the electrostatic clamp during a transition from a first energisation state of the electrostatic clamp to a second energisation state of the electrostatic clamp.
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公开(公告)号：WO2015067467A1
公开(公告)日：2015-05-14
申请号：PCT/EP2014/072588
申请日：2014-10-22
Applicant: ASML NETHERLANDS B.V.
Inventor： AKKERMANS, Johannes, , AMENT, Lucas , BANINE, Vadim , COENEN, Teis, Johan , DE JAGER, Pieter , DE VRIES, Gosse , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , LUITEN, Otger , NIKIPELOV, Andrey
IPC: H01S3/09 , H05H9/00 , H01J25/12 , H01J23/027 , H05H7/12
CPC classification number: H01S3/0903 , G03F7/70208 , H01J23/027 , H01J25/10 , H05H9/00
Abstract: A free electron laser comprising: an electron source (21), a linear accelerator (22), an undulator (26), electron beam optics and a deceleration unit (28'). The electron source is operable to produce a bunched electron beam. The linear accelerator arranged to impart energy to electrons in the bunched electron beam produced by the electron source. The undulator is operable to produce a periodic magnetic field and is arranged so as to guide the bunched electron beam along a periodic path about a central axis of the undulator such that they interact with radiation in the undulator, stimulating emission of coherent radiation. The electron beam optics is arranged to direct the bunched electron beam back into the linear accelerator after it leaves the undulator so as to extract energy from electrons in the bunched electron beam. The deceleration unit is arranged to extract energy from electrons in the bunched electron beam after it has left the undulator. The deceleration unit comprises one or more resonant cavities (33), and an energy dissipation mechanism. The bunched electron beam is directed through the one or more resonant cavities so as to excite one or more resonant standing wave modes therein.
Abstract translation: 一种自由电子激光器，包括：电子源（21），线性加速器（22），波动器（26），电子束光学器件和减速单元（28'）。 电子源可操作以产生聚束电子束。 线性加速器被布置成赋予由电子源产生的聚束电子束中的电子能量。 波动器可操作以产生周期性磁场，并且被布置成引导聚束电子束沿着围绕波动器的中心轴线的周期性路径，使得它们与波动器中的辐射相互作用，刺激相干辐射的发射。 电子束光学器件被布置成在聚束束电子束离开波束器之后将聚束电子束引导回线性加速器，以便从束电子束中的电子提取能量。 减速单元被布置成在束状电子束离开波动器之后从电子束中的电子提取能量。 减速单元包括一个或多个谐振腔（33）和能量耗散机构。 聚束电子束被引导通过一个或多个谐振腔，以激发其中的一个或多个共振驻波模式。
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Patent Agency Ranking
公开(公告)号：WO2014063878A2
公开(公告)日：2014-05-01
申请号：PCT/EP2013/069713
申请日：2013-09-23
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , BANINE, Vadim , YAKUNIN, Andrei
IPC: G03F7/20
CPC classification number: G03F7/70033 , G02B17/0657 , G02B17/0808 , G03F7/70041 , G03F7/7005 , H05G2/006 , H05G2/008
Abstract: A radiation source for a lithographic apparatus uses a plurality of fiber lasers to ignite a fuel droplet at an ignition location to generate EUV radiation. The fiber lasers may be provided to emit parallel to an optical axis and a telescopic optical system is provided to focus the lasers at the ignition location, or the lasers may be directed towards the optical axis with a final focus lens being used to reduce beam waist. The lasers may be provided in two or more groups to allow them to be independently controlled and some of the lasers may be focused at a different location to provide a pre-pulse. Radiation from fiber lasers may also be combined using dichroic mirrors.
Abstract translation: 用于光刻设备的辐射源使用多个光纤激光器在点火位置点燃燃料液滴以产生EUV辐射。 光纤激光器可以被设置为与光轴平行地发射，并且提供了望远镜光学系统以将激光聚焦在点火位置，或者激光器可以被引导朝向光轴，并且最终的聚焦透镜被用于减小束腰 。 激光器可以提供两个或更多个组以允许它们被独立控制，并且一些激光器可以被聚焦在不同的位置以提供预脉冲。 光纤激光器的辐射也可以使用分色镜进行组合。
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公开(公告)号：WO2022233506A1
公开(公告)日：2022-11-10
申请号：PCT/EP2022/058612
申请日：2022-03-31
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , VAN DER WOORD, Ties, Wouter , VAN DE KERKHOF, Marcus, Adrianus , BANINE, Vadim, Yevgenyevich , CLOIN, Christian, Gerardus, Norbertus, Hendricus, Marie
IPC: G03F7/20
Abstract: There is provided a lithography apparatus comprising one or more injection ports configured to introduce a gas comprising a hydrocarbon into the lithography apparatus and located to provide such gas to an optical element of the lithography apparatus. Also described is a lithography apparatus comprising one or more carbon targets located to generate hydrocarbons and provide such hydrocarbons to an optical element of the lithography apparatus. An in situ method of cleaning an optical element of a lithography apparatus is also provided as well as the use of such apparatuses and methods in lithographic processes and apparatuses.
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公开(公告)号：WO2022128246A1
公开(公告)日：2022-06-23
申请号：PCT/EP2021/080711
申请日：2021-11-05
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DE KERKHOF, Marcus, Adrianus , DOLGOV, Alexandr , HOUWELING, Zomer, Silvester , NIKIPELOV, Andrey
Abstract: There is provided a cleaning apparatus for cleaning a component of a lithographic apparatus, said apparatus comprising a first cleaning surface configured to physically interact with a contaminant particle located on a surface to be cleaned to remove the contaminant particle from the surface to be cleaned. Also described is a cleaning tip for cleaning a component of a lithographic apparatus, a method of cleaning a lithographic apparatus, and an apparatus and method for preventing re-contamination of a surface of a lithographic apparatus.
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公开(公告)号：WO2021069231A1
公开(公告)日：2021-04-15
申请号：PCT/EP2020/076765
申请日：2020-09-24
Applicant: ASML NETHERLANDS B.V.
Inventor： KLUGKIST, Joost, André , NIKIPELOV, Andrey , ENGELEN, Wouter Joep , LIAN, Jin , VERMEULEN, Paul, Alexander , YEGEN, Halil, Gökay
Abstract: A diffuser is configured to receive and transmit radiation. The diffuser comprises a scattering layer (510) configured to scatter the received radiation, the scattering layer (510) comprising a first substance and having distributed therein a plurality of voids. The first substance may be a scattering substance, or alternatively, at least one of the voids may contain the scattering substance and the first substance has a lower refractive index than the scattering substance.
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公开(公告)号：WO2019091708A1
公开(公告)日：2019-05-16
申请号：PCT/EP2018/078170
申请日：2018-10-16
Applicant: ASML NETHERLANDS B.V.
Inventor： KUZNETSOV, Alexey, Sergeevich , BYSTROV, Kirill , BANINE, Vadim, Yevgenyevich , VAN DE KERKHOF, Marcus, Adrianus , SCHUH, Nadja , NIKIPELOV, Andrey
Abstract: A method of cleaning a surface to remove a contaminant therefrom, the method comprising the steps of oxidizing at least a portion of the contaminant and passing a stream of carbon dioxide snow over the contaminant. An apparatus for cleaning a surface, the apparatus comprising at least one carbon dioxide snow outlet, and at least one plasma outlet, and a cleaning head comprising at least one carbon dioxide snow outlet and at least one plasma outlet are also disclosed.
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