公开(公告)号：US20180322237A1

公开(公告)日：2018-11-08

申请号：US15769539

申请日：2016-09-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Peter TEN BERGE ,  Everhardus Corneilis MOS ,  Richard Johannes Franciscus VAN HAREN ,  Peter Hanzen WARDENIER ,  Erik JENSEN

IPC: G06F17/50 ,  G03F1/70 ,  G03F1/72

Abstract: A method including modeling high resolution patterning error information of a patterning process involving a patterning device in a patterning system using an error mathematical model, modeling a correction of the patterning error that can be made by a patterning device modification tool using a correction mathematical model, the correction mathematical model having substantially the same resolution as the error mathematical model, and determining modification information for modifying the patterning device using the patterning device modification tool by applying the correction mathematical model to the patterning error information modeled by the error mathematical model.