公开(公告)号：US20170285487A1

公开(公告)日：2017-10-05

申请号：US15623091

申请日：2017-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Ivo Adam Johannes THOMAS ,  Siebe LANDHEER ,  Arnout Johannes MEESTER ,  Marcio Alexandre Cano MIRANDA ,  Gheorghe TANASA

IPC: G03F7/20 ,  G03B27/52

CPC classification number: G03F7/70341 ,  G03B27/52 ,  G03F7/70891

Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.

公开(公告)号：US20170242348A1

公开(公告)日：2017-08-24

申请号：US15589705

申请日：2017-05-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Michel RIEPEN ,  Christiaan Alexander HOOGENDAM ,  Paulus Martinus Maria LIEBREGTS ,  Ronald VAN DER HAM ,  Wilhelmus Franciscus Johannes SIMONS ,  Daniël Jozef Maria DIRECKS ,  Paul Petrus Joannes BERKVENS ,  Eva MONDT ,  Gert-Jan Gerardus Johannes Thomas BRANDS ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Mathieus Anna Karel VAN LIEROP ,  Christophe DE METSENAERE ,  Marcio Alexandre Cano MIRANDA ,  Patrick Johannes Wilhelmus SPRUYTENBURG ,  Joris Johan Anne-Marie VERSTRAETE ,  Franciscus Johannes Joseph JANSSEN

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

公开(公告)号：US20170212421A1

公开(公告)日：2017-07-27

申请号：US15482526

申请日：2017-04-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Hrishikesh PATEL ,  Johannes Henricus Wilhelmus JACOBS ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Thibault Simon Mathieu LAURENT ,  Marcio Alexandre Cano MIRANDA ,  Ruud Hendricus Martinus Johannes BLOKS ,  Peng FENG ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/20 ,  H01L21/67 ,  G03F7/30 ,  H01L21/027

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F7/70991 ,  H01L21/0274 ,  H01L21/67098 ,  Y10T29/49

Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.