公开(公告)号：US20170212421A1

公开(公告)日：2017-07-27

申请号：US15482526

申请日：2017-04-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Hrishikesh PATEL ,  Johannes Henricus Wilhelmus JACOBS ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Thibault Simon Mathieu LAURENT ,  Marcio Alexandre Cano MIRANDA ,  Ruud Hendricus Martinus Johannes BLOKS ,  Peng FENG ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/20 ,  H01L21/67 ,  G03F7/30 ,  H01L21/027

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F7/70991 ,  H01L21/0274 ,  H01L21/67098 ,  Y10T29/49

Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.