公开(公告)号：US20220335333A1

公开(公告)日：2022-10-20

申请号：US17641159

申请日：2020-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Yu CAO ,  Greggory SCRANTON ,  Jing SU ,  Yi ZOU

IPC: G06N20/00 ,  G03F1/36 ,  G03F7/20 ,  G06N3/04

Abstract: Methods of generating a characteristic pattern for a patterning process and training a machine learning model. A method of training a machine learning model configured to generate a characteristic pattern for a mask pattern includes obtaining (i) a reference characteristic pattern that meets a satisfactory threshold related to manufacturing of the mask pattern, and (ii) a continuous transmission mask (CTM) for use in generating the mask pattern; and training, based on the reference characteristic pattern and the CTM, the machine learning model such that a first metric between the characteristic pattern and the CTM, and a second metric between the characteristic pattern and the reference characteristic pattern is reduced.