公开(公告)号：WO2013087431A3

公开(公告)日：2013-06-20

申请号：PCT/EP2012/074163

申请日：2012-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： DEN BOEF, Arie ,  BHATTACHARYYA, Kaustuve ,  JAK, Martin ,  KUBIS, Michael

IPC: G03F9/00 ,  G03F7/20

Abstract: Disclosed is a device manufacturing method, and accompanying inspection and lithographic apparatuses. The method comprises measuring on the substrate a property such as asymmetry of a first overlay marker and measuring on the substrate a property such as asymmetry of an alignment marker. In both cases the asymmetry is determined. The position of the alignment marker on the substrate is then determined using an alignment system and the asymmetry information of the alignment marker and the substrate aligned using this measured position. A second overlay marker is then printed on the substrate; and a lateral overlay measured on the substrate of the second overlay marker with respect to the first overlay marker using the determined asymmetry information of the first overlay marker.

公开(公告)号：WO2012004070A1

公开(公告)日：2012-01-12

申请号：PCT/EP2011/059303

申请日：2011-06-06

Applicant: ASML Netherlands B.V. ,  JAK, Martin ,  BANINE, Vadim ,  SOER, Wouter ,  YAKUNIN, Andrei ,  VAN KAMPEN, Maarten ,  SCHASFOORT, Ad

Inventor： JAK, Martin ,  BANINE, Vadim ,  SOER, Wouter ,  YAKUNIN, Andrei ,  VAN KAMPEN, Maarten ,  SCHASFOORT, Ad

IPC: G21K3/00

CPC classification number: C09D5/08 ,  B32B15/01 ,  B32B15/018 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70858 ,  G03F7/70908 ,  G03F7/70916 ,  G21K1/10 ,  H05G2/008 ,  Y10T428/12736 ,  Y10T428/12778 ,  Y10T428/12806 ,  Y10T428/12986 ,  Y10T428/31678

Abstract: A metal component (262M, 300M) is designed for use in an EUV lithography apparatus, for example as a spectral purity filter (260) or a heating element (300) in a hydrogen radical generator. An exposed surface of the metal is treated (262P, 300P) to inhibit the formation of an oxide of said metal in an air environment prior to operation. This prevents contamination of optical components by subsequent evaporation of the oxide during operation of the component at elevated temperatures.

Abstract translation: 金属部件（262M，300M）被设计用于EUV光刻设备中，例如作为氢自由基发生器中的光谱纯度过滤器（260）或加热元件（300）。 处理金属的暴露表面（262P，300P）以在操作之前在空气环境中抑制所述金属的氧化物的形成。 这防止了在组件在升高的温度下操作过程中随后氧化物的蒸发而污染光学部件。

公开(公告)号：WO2011134692A1

公开(公告)日：2011-11-03

申请号：PCT/EP2011/052573

申请日：2011-02-22

Applicant: ASML NETHERLANDS B.V. ,  SOER, Wouter ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  YAKUNIN, Andrei ,  JAK, Martin

Inventor： SOER, Wouter ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  YAKUNIN, Andrei ,  JAK, Martin

IPC: G03F7/20 ,  G02B5/20

CPC classification number: G03F7/70891 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70575

Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000 °C.

Abstract translation: 光谱纯度滤光器包括一组材料，多个孔通过它们延伸。 孔被布置成抑制具有第一波长的辐射并且允许具有第二波长的辐射的至少一部分透射通过孔。 辐射的第二波长比辐射的第一波长短。 材料体在第一波长辐射下由体积反射率基本上大于或等于70％的材料形成。 该材料的熔点高于1000℃。

公开(公告)号：WO2011023470A1

公开(公告)日：2011-03-03

申请号：PCT/EP2010/060536

申请日：2010-07-21

Applicant: ASML NETHERLANDS B.V. ,  KONINKLIJKE PHILIPS ELECTRONICS B.V. ,  SOER, Wouter ,  JAK, Martin ,  DEKKER, Ronald

Inventor： SOER, Wouter ,  JAK, Martin ,  DEKKER, Ronald

IPC: G03F7/20 ,  G02B5/22 ,  G02B7/00 ,  G21K1/06 ,  H01L21/00 ,  B81C1/00 ,  B81C99/00

CPC classification number: G03F7/70575 ,  G02B5/1809 ,  G21K1/10

Abstract: A method of forming a spectral purity filter having a plurality of apertures configured to transmit extreme ultraviolet radiation and suppress transmission of a second type of radiation, in which trenches are formed in a base material in a pattern corresponding to the walls to be formed between the apertures. The trenches are filled with a grid material to form walls of the grid material, and the base material is selectively removed until the grid material is exposed and forms the spaces between the walls of the grid material for the apertures.

Abstract translation: 一种形成光谱纯度滤光片的方法，该光谱纯度滤光器具有多个孔，其被配置为透射极紫外辐射并抑制第二类型辐射的透射，其中沟槽以对应于待形成的壁之间的壁的图案形成在基材中 孔。 沟槽填充有栅格材料以形成栅格材料的壁，并且选择性地去除基底材料，直到栅格材料暴露并且在孔的栅格材料的壁之间形成空间。

公开(公告)号：WO2011020654A1

公开(公告)日：2011-02-24

申请号：PCT/EP2010/060156

申请日：2010-07-14

Applicant: ASML NETHERLANDS B.V. ,  JAK, Martin ,  SOER, Wouter

Inventor： JAK, Martin ,  SOER, Wouter

IPC: G03F7/20 ,  G02B5/20

CPC classification number: G03F7/70191 ,  G03F7/70575 ,  G21K1/10

Abstract: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation (λ

Abstract translation: 透射光谱纯度滤光器被配置为透射极紫外辐射（λ<20nm）。 该滤波器包括格栅状结构，其包括以诸如硅的载体材料制造的多个微小孔。 在其区域的至少一部分中的格子状结构形成为在预期的操作条件范围内具有负的泊松比。 通过在正交方向上形成同时扩展或收缩的材料的网格，提高了差分热膨胀的管理。 各种几何形状都可以实现负的泊松比。 孔径几何形状可以是具有弯曲侧面的折射多边形或重入形状。 例子包括所谓的移植物或生长性蜂窝，其中每个孔都是六边形的，如在普通蜂窝中，但形式是六边形而不是正六边形。

公开(公告)号：WO2013178422A1

公开(公告)日：2013-12-05

申请号：PCT/EP2013/059061

申请日：2013-05-01

Applicant: ASML NETHERLANDS B.V.

Inventor： JAK, Martin ,  KOOLEN, Armand ,  SMILDE, Hendrik

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G03F7/70483 ,  G03F7/70633 ,  G03F7/70683

Abstract: A metrology target formed by a lithographic process on a substrate includes a plurality of component gratings. Images of the target are formed using +1 and -1 orders of radiation diffracted by the component gratings. Regions of interest (ROIs) in the detected image are identified corresponding the component gratings. Intensity values within each ROI are processed and compared between images, to obtain a measurement of asymmetry and hence overlay error. Separation zones are formed between the component gratings and design so as to provide dark regions in the image. In an embodiment, the ROIs are selected with their boundaries falling within the image regions corresponding to the separation zones. By this measure, the asymmetry measurement is made more tolerant of variations in the position of the ROI. The dark regions also assist in recognition of the target in the images.

Abstract translation: 由基板上的光刻工艺形成的测量目标包括多个分量光栅。 使用由分量光栅衍射的+1和-1次辐射来形成目标的图像。 识别检测到的图像中的感兴趣区域（ROI）对应于分量光栅。 在每个ROI内的强度值被处理并在图像之间进行比较，以获得不对称性的测量并因此获得覆盖误差。 在分量光栅之间形成分离区并设计成在图像中提供暗区。 在一个实施例中，选择其边界落入对应于分离区域的图像区域内的ROI。 通过这种措施，使不对称测量更加容忍ROI的位置的变化。 黑暗的地区也有助于识别图像中的目标。

公开(公告)号：WO2011035963A1

公开(公告)日：2011-03-31

申请号：PCT/EP2010/061203

申请日：2010-08-02

Applicant: ASML NETHERLANDS B.V. ,  YAKUNIN, Andrei ,  BANINE, Vadim ,  VAN HERPEN, Maarten ,  SOER, Wouter ,  JAK, Martin

Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  VAN HERPEN, Maarten ,  SOER, Wouter ,  JAK, Martin

IPC: G03F7/20 ,  G02B5/00 ,  G02B5/20

CPC classification number: G03F7/70575 ,  G02B5/201 ,  G02B5/208

Abstract: A spectral purity filter, in particular for use in a lithographic apparatus using EUV radiation for the projection beam, includes a plurality of apertures in a substrate. The apertures are defined by walls having side surfaces that are inclined to the normal to a front surface of the substrate.

Abstract translation: 光谱纯度滤光器，特别是在用于投影光束的EUV辐射的光刻设备中使用的光谱纯度滤光器包括衬底中的多个孔。 孔由具有倾斜到基底正面的法线侧面的壁限定。

公开(公告)号：WO2011023454A1

公开(公告)日：2011-03-03

申请号：PCT/EP2010/060295

申请日：2010-07-16

Applicant: ASML NETHERLANDS B.V. ,  SOER, Wouter ,  JAK, Martin

Inventor： SOER, Wouter ,  JAK, Martin

IPC: G03F7/20 ,  G02B5/20 ,  G21K1/10

CPC classification number: G03F7/70191 ,  G02B5/204 ,  G02B5/208 ,  G03F7/70575 ,  G21K1/10

Abstract: A method for manufacturing a spectral purity filter is provided in which openings in a first surface of a base material, corresponding to a plurality of apertures of the spectral purity filter, are formed. At least the surfaces of the base material surrounding the openings in the first surface are chemically treated to form a layer of a second material, and the base material is etched from the second surface such that the openings extend from the first surface of the base material to the second surface of the base material.

Abstract translation: 提供了一种用于制造光谱纯度滤光器的方法，其中形成了与光谱纯度滤光片的多个孔对应的基材的第一表面中的开口。 至少围绕第一表面中的开口的基材的表面被化学处理以形成第二材料层，并且从第二表面蚀刻基底材料，使得开口从基材的第一表面延伸 到基材的第二表面。

公开(公告)号：WO2010006847A1

公开(公告)日：2010-01-21

申请号：PCT/EP2009/057097

申请日：2009-06-09

Applicant: ASML NETHERLANDS B.V. ,  BANINE, Vadim ,  JAK, Martin ,  SOER, Wouter ,  VAN HERPEN, Maarten

Inventor： BANINE, Vadim ,  JAK, Martin ,  SOER, Wouter ,  VAN HERPEN, Maarten

IPC: G03F7/20

CPC classification number: G03F7/70925

Abstract: A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas comprising one or more Of H 2 , D 2 and DH, and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the apparatus; producing hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas; and bringing the uncapped multilayer mirror with deposition into contact with at least part of the hydrogen and/or deuterium radicals and the radicals of the one or more additional compounds to remove at least part of the deposition.

Abstract translation: 一种用于去除装置的无盖多层反射镜上的沉积的方法。 该方法包括在装置的至少一部分中提供包含H 2，D 2和DH中的一种或多种的气体，以及选自烃化合物和/或硅烷化合物的一种或多种另外的化合物; 从气体产生氢和/或氘自由基和一种或多种另外的化合物的基团; 并且使具有沉积的未封盖的多层反射镜与至少部分氢和/或氘基和一种或多种另外的化合物的基团接触以除去至少部分沉积物。

公开(公告)号：EP2443517B1

公开(公告)日：2013-01-16

申请号：EP10737312.8

申请日：2010-07-21

Applicant: ASML Netherlands B.V. ,  Koninklijke Philips Electronics B.V.

Inventor： SOER, Wouter ,  JAK, Martin ,  DEKKER, Ronald

IPC: G03F7/20 ,  G02B5/22 ,  G02B7/00 ,  G21K1/06 ,  H01L21/00 ,  B81C1/00 ,  B81C99/00

CPC classification number: G03F7/70575 ,  G02B5/1809 ,  G21K1/10