公开(公告)号：US11372338B2

公开(公告)日：2022-06-28

申请号：US16979056

申请日：2019-02-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Ivo Matteo Leonardus Weijden ,  Jeroen Van Dongen ,  Cornelis Johannes Henricus Lambregts ,  Theo Wilhelmus Maria Thijssen ,  Ruud Rudolphus Johannes Catharinus De Wit ,  Hans Marinus Struijs ,  Erik Mathijs Maria Crombag ,  Roy Werkman ,  Maria Helena Schut ,  Erwin Riemens ,  Menno Meeldijk

IPC: G03F7/20 ,  G01N21/95 ,  G03F9/00 ,  H01L21/66

Abstract: A method for determining a preferred control strategy relating to control of a manufacturing process for manufacturing an integrated circuit. The method includes: obtaining process data associated with a design of said integrated circuit; and obtaining a plurality of candidate control strategies configured to control the manufacturing process based on the process data, each candidate control strategy including an associated cost metric based on an associated requirement to implement the candidate control strategy. A quality metric related to an expected performance of the manufacturing process is determined for each candidate control strategies, and a preferred control strategy is selected based on the determined quality metrics and associated cost metrics for each candidate control strategy.

公开(公告)号：US11281110B2

公开(公告)日：2022-03-22

申请号：US16973395

申请日：2019-05-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Van Dongen ,  Wim Tjibbo Tel ,  Sarathi Roy ,  Yichen Zhang ,  Andrea Cavalli ,  Bart Laurens Sjenitzer ,  Simon Philip Spencer Hastings

IPC: G03F7/20

Abstract: A method of determining a sampling control scheme and/or a processing control scheme for substrates processed by a device. The method uses a fingerprint model and an evolution model to generate the control scheme. The fingerprint model is based on fingerprint data for a processing parameter of at least one substrate processed by a device, and the evolution model represents variation of the fingerprint data over time. The fingerprint model and the evolution model are analyzed and a sampling and/or processing control scheme is generated using the analysis. The sampling control scheme provides an indication for where and when to take measurements on substrates processed by the device. The processing control scheme provides an indication for how to control the processing of the substrate. Also, there is provided a method of determining which of multiple devices contributed to a fingerprint of a processing parameter.

公开(公告)号：US20210255547A1

公开(公告)日：2021-08-19

申请号：US16973395

申请日：2019-05-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Van Dongen ,  Wim Tjibbo TEL ,  Sarathi ROY ,  Yichen ZHANG ,  Andrea CAVALLI ,  Bart Laurens SJENITZER ,  Simon Philip Spencer HASTINGS

IPC: G03F7/20

Abstract: A method of determining a sampling control scheme and/or a processing control scheme for substrates processed by a device. The method uses a fingerprint model and an evolution model to generate the control scheme. The fingerprint model is based on fingerprint data for a processing parameter of at least one substrate processed by a device, and the evolution model represents variation of the fingerprint data over time. The fingerprint model and the evolution model are analyzed and a sampling and/or processing control scheme is generated using the analysis. The sampling control scheme provides an indication for where and when to take measurements on substrates processed by the device. The processing control scheme provides an indication for how to control the processing of the substrate. Also, there is provided a method of determining which of multiple devices contributed to a fingerprint of a processing parameter.