公开(公告)号：WO2020173651A1

公开(公告)日：2020-09-03

申请号：PCT/EP2020/052240

申请日：2020-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： KANT, Nick ,  SCHAAFSMA, Martijn, Cornelis

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system comprising at least one optical component and configured to project a pattern onto a substrate. The lithographic apparatus further comprises a control system arranged to reduce the effects of heating and/or cooling of an optical component in a lithographic process. The control system is configured at least: to select at least one of a plurality of mode shapes to represent a relationship between at least one input in the lithographic process and an aberration resulting from the input and to generate and apply a correction to the lithographic apparatus based on the mode shape.

公开(公告)号：WO2017050523A1

公开(公告)日：2017-03-30

申请号：PCT/EP2016/070157

申请日：2016-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： KANT, Nick ,  LUTTIKHOF, Mark, Jan, Hendrik,

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/705 ,  G03F7/70783

Abstract: The invention relates to a method of reducing effects of reticle heating and/or cooling in a lithographic process, comprising the steps of: calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.

Abstract translation: 本发明涉及一种降低光刻工艺中掩模版加热和/或冷却效果的方法，包括以下步骤：使用系统识别方法校准线性时不变标线加热模型; 使用掩模版加热模型和平版印刷过程中的输入预测标线的扭曲; 并根据预测的掩模版失真来计算和应用光刻工艺中的校正。

公开(公告)号：WO2018184783A1

公开(公告)日：2018-10-11

申请号：PCT/EP2018/055446

申请日：2018-03-06

Applicant: ASML NETHERLANDS B.V.

Inventor： KANT, Nick ,  VAN HERPEN, Robertus, Martinus, Alphonsus ,  BEKS, Mark, Louwrens ,  SWAENEN, Lense, Hendrik-Jan, Maria ,  VANROOSE, Nico ,  DOWNES, James, Robert

IPC: G03F7/20

Abstract: A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second component, wherein the first component of the aberration signal comprises a first frequency band and the second component of the aberration signal comprises a second frequency band, wherein the first frequency band comprises frequencies that are higher than frequencies comprised in the second frequency band, calculating a correction, wherein a first part of the correction is calculated based on the first component of the aberration signal, and applying the correction to the lithographic apparatus.

公开(公告)号：WO2016087388A1

公开(公告)日：2016-06-09

申请号：PCT/EP2015/078096

申请日：2015-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： KANT, Nick ,  VANROOSE, Nico ,  BASELMANS, Johannes, Jacobus, Matheus

IPC: G03F7/20

CPC classification number: G03F7/706 ,  G01M11/0242 ,  G03F7/20 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/705

Abstract: A method of reducing an aberration of a lithographic apparatus, the method comprising measuring the aberration, taking the measured aberration into account, estimating a state of the lithographic apparatus, calculating a correction using the estimated state, and applying the correction to the lithographic apparatus.

Abstract translation: 一种降低光刻设备的像差的方法，该方法包括测量像差，考虑测量的像差，估计光刻设备的状态，使用估计状态计算校正，以及将校正应用于光刻设备。

公开(公告)号：EP3702839A1

公开(公告)日：2020-09-02

申请号：EP19159788.9

申请日：2019-02-27

Applicant: ASML Netherlands B.V.

Inventor： KANT, Nick ,  SCHAAFSMA, Martijn, Cornelis

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system comprising at least one optical component and configured to project a pattern onto a substrate. The lithographic apparatus further comprises a control system arranged to reduce the effects of heating and/or cooling of an optical component in a lithographic process. The control system is configured at least: to select at least one of a plurality of mode shapes to represent a relationship between at least one input in the lithographic process and an aberration resulting from the input and to generate and apply a correction to the lithographic apparatus based on the mode shape.