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    OPTIMIZATION OF LITHOGRAPHIC PROCESS BASED ON BANDWIDTH AND SPECKLE
    2.
    发明申请
    OPTIMIZATION OF LITHOGRAPHIC PROCESS BASED ON BANDWIDTH AND SPECKLE 审中-公开

    公开(公告)号：WO2022135953A1

    公开(公告)日：2022-06-30

    申请号：PCT/EP2021/084967

    申请日：2021-12-09

    Applicant: ASML NETHERLANDS B.V. ,  CYMER, LLC.

    Inventor： CONLEY, Willard, Earl ,  HSU, Duan-Fu, Stephen ,  THORNES, Joshua, Jon ,  BASELMANS, Johannes, Jacobus, Matheus

    IPC: G03F7/20

    Abstract: A method for improving a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus. The method includes computing a multi-variable cost function that is a function of: (i) a plurality of design variables that affect characteristics of the lithographic process and (ii) a radiation bandwidth of a radiation source of the lithographic apparatus; and reconfiguring one or more of the characteristics (e.g., EPE, image contrast, resist, etc.) of the lithographic process by adjusting one or more of the design variables (e.g., source, mask layout, bandwidth, etc.) until a termination condition is satisfied. The termination condition includes a speckle characteristic (e.g., a speckle contrast) maintained within a speckle specification associated with the radiation source and also maintaining an image contrast associated with the lithographic process within a desired range. The speckle characteristic being a function of the radiation bandwidth.

    DETERMINING SUBSET OF COMPONENTS OF AN OPTICAL CHARACTERISTIC OF PATTERNING APPARATUS
    4.
    发明申请
    DETERMINING SUBSET OF COMPONENTS OF AN OPTICAL CHARACTERISTIC OF PATTERNING APPARATUS 审中-公开

    公开(公告)号：WO2020141051A1

    公开(公告)日：2020-07-09

    申请号：PCT/EP2019/084821

    申请日：2019-12-12

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  VAN ADRICHEM, Paulus, Jacobus, Maria ,  LENDERINK, Egbert

    IPC: G03F7/20

    Abstract: Described herein is a method for determining a component of optical characteristic of a patterning process. The method includes obtaining (i) a plurality of desired features, (ii) a plurality of simulated features based on the plurality of desired features and an optical characteristic of a patterning apparatus, and (iii) a performance metric (e.g., EPE) related to a desired feature of the plurality of desired features and an associated simulated feature of the plurality of simulated features; determining a set of optical sensitivities of the patterning process by computing a change in value of the performance metric based on a change in value of the optical characteristic; and identifying, based on the set of optical sensitivities, a set of components (e.g., Principal components) of the optical characteristic that comprise dominant contributors in changing the value of the performance metric.

    LITHOGRAPHIC METHOD AND APPARATUS
    5.
    发明申请
    LITHOGRAPHIC METHOD AND APPARATUS 审中-公开

    公开(公告)号：WO2019011552A1

    公开(公告)日：2019-01-17

    申请号：PCT/EP2018/065508

    申请日：2018-06-12

    Applicant: ASML NETHERLANDS B.V.

    Inventor： KOLLER, Paulus, Hubertus, Petrus ,  BASELMANS, Johannes, Jacobus, Matheus ,  RIJPERS, Bartolomeus, Petrus

    IPC: G03F7/20

    Abstract: Method of determining a photodetector contribution to a measurement of apodization of a projection system of an immersion lithography apparatus, the method comprising providing a beam of radiation, illuminating an object with the beam of radiation, using the projection system to project an image of the object through a liquid layer and onto a photodetector, performing a first set of measurements of radiation intensity across a pupil plane of the projection system at a first liquid layer thickness, performing a second set of measurements of radiation intensity across the pupil plane of the projection system at a different liquid layer thickness, determining a set of intensity differences from the first set of measurements and the second set of measurements, comparing the determined set of intensity differences to an expected set of intensity difference, and using the results of the comparison to determine the photodetector contribution to a measurement of apodization.

    TWO-DIMENSIONAL DIFFRACTION GRATING
    6.
    发明申请
    TWO-DIMENSIONAL DIFFRACTION GRATING 审中-公开

    公开(公告)号：WO2019149467A1

    公开(公告)日：2019-08-08

    申请号：PCT/EP2019/050132

    申请日：2019-01-04

    Applicant: ASML NETHERLANDS B.V.

    Inventor： DE GROOT, Pieter, Cristiaan ,  BASELMANS, Johannes, Jacobus, Matheus ,  CHONG, Derick, Yun, Chek ,  CHOWDHURY, Yassin

    IPC: G01M11/02 ,  G02B5/18 ,  G02B27/42 ,  G03F7/20 ,  G02B5/00

    Abstract: A two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises a substrate provided with a square array of through- apertures, wherein the diffraction grating is self-supporting. It will be appreciated that for a substrate provided with a square array of through-apertures to be self-supporting at least some substrate material is provided between each through-aperture and the adjacent through apertures. A method of designing a two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises: selecting a general geometry for the two-dimensional diffraction grating, the general geometry having at least one parameter; and selecting values for the least one parameter that result in a grating efficiency map for the two-dimensional diffraction grating so as to control the contributions to a first harmonic of a phase stepping signal.

    LITHOGRAPHIC METHOD AND APPARATUS
    7.
    发明申请
    LITHOGRAPHIC METHOD AND APPARATUS 审中-公开
    平版印刷方法和设备

    公开(公告)号：WO2017190905A1

    公开(公告)日：2017-11-09

    申请号：PCT/EP2017/058057

    申请日：2017-04-05

    Applicant: ASML NETHERLANDS B.V.

    Inventor： SCHOORMANS, Carolus, Johannes, Catharina ,  BASELMANS, Johannes, Jacobus, Matheus ,  VAN DER PASCH, Engelbertus, Antonius, Fransiscus ,  VAN DEN HOMBERG, Johannes, Aldegonda, Theodorus, Marie ,  SLADKOV, Maksym, Yuriiovych ,  BROUNS, Andreas, Johannes, Antonius ,  PADIY, Alexander, Viktorovych

    IPC: G03F9/00 ,  G03F1/42

    Abstract: A lithographic method for measuring a position of a target grating with a mask sensor apparatus which comprises a plurality of detector modules each comprising a diffraction grating located at a mask side of a projection system of a lithographic apparatus and an associated detector, the method comprising a first step of measuring first intensities of a combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along a first direction; a second step of displacing the mask sensor apparatus relative to the target grating in a second direction, wherein a size of the relative displacement is proportional to a spatial frequency of a potential error; and a third step of measuring second intensities of the combination of diffraction orders diffracted from the target grating while the mask sensor apparatus is moved relatively to the target grating along the first direction.

    Abstract translation: 利用掩模传感器装置测量目标光栅的位置的光刻方法，所述掩模传感器装置包括多个检测器模块，每个检测器模块包括位于光刻设备的投影系统的掩模侧的衍射光栅，以及 相关联的检测器，所述方法包括以下步骤的第一步骤：当所述掩模传感器装置沿着第一方向相对于所述目标光栅移动时，测量从所述目标光栅衍射的衍射级的组合的第一强度; 第二步骤，在第二方向上使掩模传感器装置相对于目标光栅位移，其中相对位移的大小与潜在误差的空间频率成比例; 以及第三步骤，在掩模传感器装置沿着第一方向相对于目标光栅移动时，测量从目标光栅衍射的衍射级的组合的第二强度。

    RADIATION SYSTEM
    8.
    发明申请
    RADIATION SYSTEM 审中-公开
    辐射系统

    公开(公告)号：WO2016139055A2

    公开(公告)日：2016-09-09

    申请号：PCT/EP2016/053216

    申请日：2016-02-16

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NIENHUYS, Han-Kwang ,  BOGAART, Erik, Willem ,  DONKER, Rilpho, Ludovicus ,  KRUIZINGA, Borgert ,  LOOPSTRA, Erik, Roelof ,  BOTMA, Hako ,  DE VRIES, Gosse, Charles ,  FRIJNS, Olav, Waldemar, Vladimir ,  BASELMANS, Johannes, Jacobus, Matheus

    IPC: G03F7/20

    CPC classification number: G03F7/70191 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/70025 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  H01S3/2308 ,  H05G2/008

    Abstract: A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

    Abstract translation: 包括配置成接收主辐射束并将主辐射束分成多个分支辐射束的分束装置和配置成接收输入辐射束并输出辐射的辐射改变装置的辐射系统， 修改的辐射束，其中所述辐射改变装置被配置为提供输出的改进的辐射束，所述输出的改进的辐射束在与所接收的输入辐射束相比时具有增加的集光率，其中所述辐射改变装置被布置成使得所接收的输入辐射束 通过所述辐射改变装置是主辐射束并且所述辐射改变装置被配置为向所述分束装置提供改变的主辐射束，或者其中所述辐射改变装置被设置成使得由所述辐射接收的所述输入辐射束 改变装置是从分束装置输出的分支辐射束。

    LITHOGRAPHIC METHOD AND APPARATUS
    9.
    发明申请
    LITHOGRAPHIC METHOD AND APPARATUS 审中-公开
    光刻方法和装置

    公开(公告)号：WO2015074796A1

    公开(公告)日：2015-05-28

    申请号：PCT/EP2014/071182

    申请日：2014-10-02

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BORGES NICOLAU, Jaqueline ,  NOBLE, Hannah ,  BASELMANS, Johannes, Jacobus, Matheus ,  SMEETS, Bart ,  VAN ADRICHEM, Paulus, Jacobus, Maria

    IPC: G03F7/20

    CPC classification number: G03F7/2026 ,  G03F7/70258 ,  G03F7/70425 ,  G03F7/70433 ,  G03F7/705 ,  G03F7/70566 ,  G03F7/706 ,  G06T5/00

    Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.

    Abstract translation: 一种校正由光学系统形成的光学图像的方法，所述方法包括：在光学系统的图像平面中，为每个空间位置获得指示光学系统的光学系统的光瞳面的偏振度相关特性的映射， 将表示光学系统的偏振相关属性的映射与输入辐射束的强度和偏振的辐射图组合以形成图像映射，并且使用图像映射来校正通过引导输入辐射束形成的光学图像 通过光学系统。

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