公开(公告)号：WO2018184783A1

公开(公告)日：2018-10-11

申请号：PCT/EP2018/055446

申请日：2018-03-06

Applicant: ASML NETHERLANDS B.V.

Inventor： KANT, Nick ,  VAN HERPEN, Robertus, Martinus, Alphonsus ,  BEKS, Mark, Louwrens ,  SWAENEN, Lense, Hendrik-Jan, Maria ,  VANROOSE, Nico ,  DOWNES, James, Robert

IPC: G03F7/20

Abstract: A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second component, wherein the first component of the aberration signal comprises a first frequency band and the second component of the aberration signal comprises a second frequency band, wherein the first frequency band comprises frequencies that are higher than frequencies comprised in the second frequency band, calculating a correction, wherein a first part of the correction is calculated based on the first component of the aberration signal, and applying the correction to the lithographic apparatus.

公开(公告)号：WO2019120968A1

公开(公告)日：2019-06-27

申请号：PCT/EP2018/083364

申请日：2018-12-03

Applicant: ASML NETHERLANDS B.V.

Inventor： KLOSIEWICZ, Przemyslaw, Aleksander ,  REDDY, Bogathi, Vishnu, Vardhana ,  RIZVI, Syed, Umar, Hassan ,  DOWNES, James, Robert

IPC: G03F7/20

Abstract: A method of determining a configuration of a projection system for a lithographic apparatus is an implementation of a quadratic programming problem with a penalty function. The method comprises: receiving dependencies of the optical properties of the projection system on a configuration of a plurality of manipulators of the projection system; receiving a plurality of constraints which correspond to the physical constraints of the manipulators; finding an initial configuration of the manipulators; and iteratively finding an output configuration of the manipulators. The iteration comprises repeating the following steps: determining a set of the plurality of constraints that are violated; determining an updated configuration of the manipulators, the updated configuration of the manipulators being dependent on the set of the plurality of constraints that are violated and a penalty strength; and increasing the penalty strength. These steps are repeated until a convergence criterion is met.

公开(公告)号：WO2019166163A1

公开(公告)日：2019-09-06

申请号：PCT/EP2019/051946

申请日：2019-01-28

Applicant: ASML NETHERLANDS B.V.

Inventor： SCHAAFSMA, Martijn, Cornelis ,  AKHSSAY, Mhamed ,  DOWNES, James, Robert

IPC: G03F7/20

Abstract: A method of calibrating a projection system heating model to predict an aberration in a projection system in a lithographic apparatus, the method comprising passing exposure radiation through a projection system to expose one or more exposure fields on a substrate provided on a substrate table, making measurements of the aberration in the projection system caused by the exposure radiation, wherein the time period between measurements is less than the time period that would be taken to expose all exposure fields on the substrate.

公开(公告)号：WO2017157552A1

公开(公告)日：2017-09-21

申请号：PCT/EP2017/051586

申请日：2017-01-26

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： MOEST, Bearrach ,  BAKER, Lowell, Lane ,  DOWNES, James, Robert ,  HOITINGA, Wijnand ,  PEN, Hermen, Folken

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/705 ,  G03F7/70783

Abstract: An apparatus including an illumination system to condition a radiation beam, a support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control system configured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signal to control a component of the apparatus based on the deformation of the pattern.

Abstract translation: 一种设备，包括用于调节辐射束的照射系统，用于支撑图案形成装置的支撑件，该图案形成装置能够在辐射束的横截面上赋予图案以形成图案化的辐射 构造成保持衬底的衬底台，将图案化的辐射束投影到衬底的目标部分上的投影系统以及配置成接收表征图案分布的图案数据的控制系统，接收表征辐射束的辐射数据 ，基于图案数据和辐射数据确定图案的耗散分布，通过在图案形成装置的热力学模型中应用耗散分布来确定图案的变形，并且确定控制信号以控制 基于图案变形的装置。

公开(公告)号：WO2016087142A1

公开(公告)日：2016-06-09

申请号：PCT/EP2015/075388

申请日：2015-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： DOWNES, James, Robert ,  BASELMANS, Johannes, Jacobus, Matheus

IPC: G03F7/20

CPC classification number: G03F7/70425 ,  G03F7/20 ,  G03F7/70491 ,  G03F7/706

Abstract: A method of correcting aberrations caused by a projection system of a lithographic apparatus, the method comprising performing a measurement of aberrations caused by the projection system using a sensor located in the lithographic apparatus, determining, based on a history of operation of the lithographic apparatus since a change of machine state, whether to average the measured aberrations with aberration measurements previously obtained using the sensor, calculating a correction to be applied to the lithographic apparatus using the measured aberration if it is determined that averaging should not be performed, calculating a correction to be applied to the lithographic apparatus using an averaged aberration measurement if it is determined that averaging should be performed, and applying the calculated correction to the lithographic apparatus.

Abstract translation: 一种校正由光刻设备的投影系统引起的像差的方法，所述方法包括使用位于光刻设备中的传感器执行由投影系统引起的像差的测量，基于光刻设备的操作历史，确定 机器状态的改变，是否使用传感器先前获得的像差测量来平均测量的像差，如果确定不应该进行平均，则计算使用测量的像差应用于光刻设备的校正，计算校正 如果确定应该执行平均，并且将所计算的校正应用于光刻设备，则使用平均像差测量应用于光刻设备。

公开(公告)号：WO2021099037A1

公开(公告)日：2021-05-27

申请号：PCT/EP2020/078986

申请日：2020-10-15

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN HINSBERG, Michel, Alphons, Theodorus ,  DOWNES, James, Robert ,  VERDURMEN, Erwin, Josef, Maria ,  KLINKHAMER, Jacob Fredrik Friso ,  WERKMAN, Roy ,  WILDENBERG, Jochem, Sebastiaan ,  URBANCZYK, Adam, Jan ,  VISSER, Lucas, Jan, Joppe

IPC: G03F7/20

Abstract: A method for determining an input to a lens model to determine a setpoint for manipulation of a lens of a lithographic apparatus when addressing at least one of a plurality of fields of a substrate, the method comprising: receiving parameter data for the at least one field, the parameter data relating to one or more parameters of the substrate within the at least one field, the one or more parameters being at least partially sensitive to manipulation of the lens as part of an exposure performed by the lithographic apparatus; receiving lens model data relating to the lens; determining the input based on the parameter data and on the lens model data.

公开(公告)号：WO2019081167A1

公开(公告)日：2019-05-02

申请号：PCT/EP2018/076753

申请日：2018-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： FRISCO, Pierluigi ,  IMPONENTE, Giovanni ,  DOWNES, James, Robert

IPC: G03F7/20

Abstract: A computer implemented method for calibrating a projection system model. The projection system model is configured to determine and output a set of optical element adjustments based upon a merit function, the merit function comprising a set of parameters and corresponding weights. The method comprises performing a merit function update process at each of a plurality of instances during processing of a lot, the lot comprising a plurality of wafers. The merit function update process outputs an updated merit function different to a current merit function.

公开(公告)号：WO2019042757A1

公开(公告)日：2019-03-07

申请号：PCT/EP2018/071981

申请日：2018-08-14

Applicant: ASML NETHERLANDS B.V.

Inventor： FRISCO, Pierluigi ,  IMPONENTE, Giovanni ,  DOWNES, James, Robert

IPC: G03F7/20

Abstract: A method comprising determining aberrations caused by each lithographic apparatus of a set of lithographic apparatuses, calculating adjustments of the lithographic apparatuses which minimize differences between the aberrations caused by each of the lithographic apparatuses, and applying the adjustments to the lithographic apparatuses, providing better matching between the aberrations of patterns projected by the lithographic apparatuses.

公开(公告)号：WO2016169890A1

公开(公告)日：2016-10-27

申请号：PCT/EP2016/058544

申请日：2016-04-18

Applicant: ASML NETHERLANDS B.V.

Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  DE BUCK, Pieter, Bart, Aloïs ,  VANROOSE, Nico ,  IMPONENTE, Giovanni ,  STAS, Roland, Johannes, Wilhelmus ,  KAUR, Chanpreet ,  DOWNES, James, Robert

IPC: G03F7/20 ,  G01M11/02

CPC classification number: G03F7/706 ,  G01M11/0242 ,  G01M11/0257 ,  G03F7/70866

Abstract: A method comprising illuminating a patterning device (ΜΑ') comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by the projection system.

Abstract translation: 一种方法，包括照亮包括多个图案化区域（15a-15c）的图案形成装置（15a-15c），图案形成区域（15a-15c）中的每一个图案化测量光束（17a-17c），用投影系统（PL）将测量光束投射到 传感器装置（21），包括多个检测器区域（25a-25c），当图案形成装置和传感器装置位于第一相对构造中时，进行辐射的第一测量，移动图案形成装置和传感器中的至少一个 设备，以便将图案形成装置的相对配置改变为第二相对配置，当图案形成装置和传感器装置位于第二相对配置中时，对辐射进行第二测量，其中多个检测器区域 接收不同的测量光束到在第一相对配置中在相应检测器区域接收的测量光束并确定 由投影系统引起的像差。

公开(公告)号：EP3839630A1

公开(公告)日：2021-06-23

申请号：EP19218161.8

申请日：2019-12-19

Applicant: ASML Netherlands B.V.

Inventor： VAN HINSBERG, Michel, Alphons, Theodorus ,  DOWNES, James, Robert ,  VERDURMEN, Erwin, Josef, Maria ,  KLINKHAMER, Jacob Fredrik Friso

IPC: G03F7/20

Abstract: A method for determining an input to a lens model to determine a setpoint for manipulation of a lens of a lithographic apparatus when addressing at least one of a plurality of fields of a substrate. The method comprises receiving parameter data for the at least one field, the parameter data relating to one or more parameters of the substrate within the at least one field, the one or more parameters being at least partially sensitive to manipulation of the lens as part of an exposure performed by the lithographic apparatus. The method further comprises receiving lens model data relating to the lens, and determining the input based on the parameter data and on the lens model data.