Patent search ap:("ASML NETHERLANDS B.V.") AND inv:"KERNKAMP Page Dirk-Jan"

1.

发明申请
METHODS OF MODELLING SYSTEMS FOR PERFORMING PREDICTIVE MAINTENANCE OF SYSTEMS, SUCH AS LITHOGRAPHIC SYSTEMS 审中-公开

公开(公告)号：WO2021175533A1

公开(公告)日：2021-09-10

申请号：PCT/EP2021/052590

申请日：2021-02-04

Applicant: ASML NETHERLANDS B.V.

Inventor： LANCIA, Carlo , GANTAPARA, Anjan Prasad , KERNKAMP, Dirk-Jan , MOSSAVAT, Seyed Iman , YPMA, Alexander

IPC: G03F7/20 , G05B23/02

Abstract: Disclosed is a method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method comprises obtaining a function comprising at least a first function of first prediction model parameters associated with said at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.

2.

发明公开
METHODS OF MODELLING SYSTEMS OR PERFORMING PREDICTIVE MAINTENANCE OF SYSTEMS, SUCH AS LITHOGRAPHIC SYSTEMS AND ASSOCIATED LITHOGRAPHIC SYSTEMS 审中-公开

公开(公告)号：EP3910419A1

公开(公告)日：2021-11-17

申请号：EP20174756.5

申请日：2020-05-14

Applicant: ASML Netherlands B.V.

Inventor： LANCIA, Carlo , GANTAPARA, Anjan Prasad , KERNKAMP, Dirk-Jan , MOSSAVAT, Seyed Iman , YPMA, Alexander

IPC: G03F7/20 , G05B23/02

Abstract: Disclosed is a method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method comprises obtaining a function comprising at least a first function of first prediction model parameters associated with said at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.

3.

发明公开
METHODS OF MODELLING SYSTEMS FOR PERFORMING PREDICTIVE MAINTENANCE OF SYSTEMS, SUCH AS LITHOGRAPHIC SYSTEMS 审中-公开

公开(公告)号：EP4115241A1

公开(公告)日：2023-01-11

申请号：EP21702283.9

申请日：2021-02-04

Applicant: ASML Netherlands B.V.

Inventor： LANCIA, Carlo , GANTAPARA, Anjan Prasad , KERNKAMP, Dirk-Jan , MOSSAVAT, Seyed Iman , YPMA, Alexander

IPC: G03F7/20 , G05B23/02

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