公开(公告)号：WO2021121906A1

公开(公告)日：2021-06-24

申请号：PCT/EP2020/083682

申请日：2020-11-27

Applicant: ASML NETHERLANDS B.V.

Inventor： NIENHUYS, Han-Kwang ,  COENEN, Teis, Johan ,  ROOBOL, Sander, Bas ,  COTTAAR, Jeroen ,  MOSSAVAT, Seyed Iman ,  GEYPEN, Niels ,  SCHOLZ, Sandy, Claudia ,  PORTER, Christina, Lynn

IPC: G03F7/20 ,  G01N21/95 ,  G06N20/00 ,  G01N2021/95676 ,  G01N21/95623 ,  G03F7/70558 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  G06N3/08

Abstract: Disclosed is a method of metrology. The method comprises illuminating a radiation onto a substrate; obtaining measurement data relating to at least one measurement of each of one or more structures on the substrate; using a Fourier-related transform to transform the measurement data into a transformed measurement data; and extracting a feature of the substrate from the transformed measurement data, or eliminating an impact of a nuisance parameter.

公开(公告)号：WO2020126248A1

公开(公告)日：2020-06-25

申请号：PCT/EP2019/081565

申请日：2019-11-18

Applicant: ASML NETHERLANDS B.V.

Inventor： SMORENBURG, Petrus, Wilhelmus ,  MOSSAVAT, Seyed Iman ,  COENEN, Teis, Johan

IPC: G03F7/20 ,  G01N23/20008 ,  G01N21/956

Abstract: Methods and apparatus for directing onto a substrate a radiation beam emitted as a result of high harmonic generation (HHG). A drive radiation source provides drive radiation to an interaction region which contains a medium for HHG generation. The radiation generated by HHG may comprise a plurality of soft X-ray (SXR) wavelengths. Different HHG generated wavelengths have a different divergence angles. The apparatus further comprises an optical system which focusses the different HHG wavelengths to different focal planes, because of the different divergence angles. The apparatus further comprises a substrate support for holding the substrate. One or more of the drive radiation source, interaction region, optical system and substrate support can control the position of the substrate relative to the plurality of focal planes of the HHG radiation.

公开(公告)号：WO2020074162A1

公开(公告)日：2020-04-16

申请号：PCT/EP2019/072355

申请日：2019-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： MOSSAVAT, Seyed Iman ,  FAGGINGER AUER, Bastiaan, Onne ,  DIRKS, Remco ,  ONOSE, Alexandru ,  CRAMER, Hugo, Augustinus, Joseph

IPC: G03F7/20

Abstract: Methods for calibrating metrology apparatuses and determining a parameter of interest are disclosed. In one arrangement, training data is provided that comprises detected representations of scattered radiation detected by each of plural metrology apparatuses. An encoder encodes each detected representation to provide an encoded representation, and a decoder generates a synthetic detected representation from the respective encoded representation. A classifier estimates from which metrology apparatus originates each encoded representation or each synthetic detected representation. The training data is used to simultaneously perform, in an adversarial relationship relative to each other, a first machine learning process involving the encoder or decoder and a second machine learning process involving the classifier.

公开(公告)号：WO2020035275A1

公开(公告)日：2020-02-20

申请号：PCT/EP2019/069956

申请日：2019-07-24

Applicant: ASML NETHERLANDS B.V.

Inventor： MOSSAVAT, Seyed Iman ,  DIRKS, Remco ,  SMILDE, Hendrik, Jan, Hidde

IPC: G03F7/20

Abstract: A method of determining an estimated intensity of radiation scattered by a target illuminated by a radiation source, has the following steps: obtaining and training (402) a library REFLIB of wavelength- dependent reflectivity as a function of the wavelength, target structural parameters and angle of incidence R(λ,θ,x,y); determining (408) a wide-band library (W-BLIB) of integrals of wavelength-dependent reflectivity R of the target in a Jones framework over a range of radiation source wavelengths λ; training (TRN) (410) the wide-band library; and determining (412), using the trained wide-band library, an estimated intensity (INT) of radiation scattered by the target illuminated by the radiation source.

公开(公告)号：WO2016177548A1

公开(公告)日：2016-11-10

申请号：PCT/EP2016/058344

申请日：2016-04-15

Applicant: ASML NETHERLANDS B.V.

Inventor： MOSSAVAT, Seyed Iman ,  VAN LEEST, Adriaan, Johan

IPC: G03F7/20

CPC classification number: B29C67/0088 ,  B29C64/386 ,  B33Y50/02 ,  G03F7/705 ,  G03F7/70625 ,  G05B19/4099 ,  G05B2219/35134 ,  G05B2219/49007

Abstract: Disclosed are a method, computer program and associated apparatuses for metrology. The method includes acquiring inspection data comprising a plurality of inspection data elements, each inspection data element having been obtained by inspection of a corresponding target structure formed using a lithographic process; and performing an unsupervised cluster analysis on said inspection data, thereby partitioning said inspection data into a plurality of clusters in accordance with a metric. In an embodiment, a cluster representative can be identified for each cluster. The cluster representative may be reconstructed and the reconstruction used to approximate the other members of the cluster.

Abstract translation: 公开了一种计量方法，计算机程序和相关装置。 该方法包括获取包括多个检查数据元素的检查数据，每个检查数据元素是通过检查使用光刻处理形成的相应目标结构获得的; 以及对所述检查数据执行无监督的聚类分析，从而根据度量将所述检查数据划分成多个聚类。 在一个实施例中，可以为每个集群识别集群代表。 可以重建簇代表，并且重建用于近似群集的其他成员。

公开(公告)号：WO2019086167A1

公开(公告)日：2019-05-09

申请号：PCT/EP2018/075720

申请日：2018-09-24

Applicant: ASML NETHERLANDS B.V.

Inventor： ONOSE, Alexandru ,  MOSSAVAT, Seyed Iman ,  THEEUWES, Thomas

IPC: G03F7/20

Abstract: Methods and apparatus for estimating an unknown value of at least one of a plurality of sets of data, each set of data comprising a plurality of values indicative of radiation diffracted and/or reflected and/or scattered by one or more features fabricated in or on a substrate, wherein the plurality of sets of data comprises at least one known value, and wherein at least one of the plurality of sets of data comprises an unknown value, the apparatus comprising a processor to estimate the unknown value of the at least one set of data based on: the known values of the plurality of sets of data; a first condition between two or more values within a set of data of the plurality of sets of data; and a second condition between two or more values being part of different sets of data of the plurality of the sets of data.

公开(公告)号：WO2017093011A1

公开(公告)日：2017-06-08

申请号：PCT/EP2016/077682

申请日：2016-11-15

Applicant: ASML NETHERLANDS B.V.

Inventor： MOSSAVAT, Seyed Iman ,  DIRKS, Remco ,  CRAMER, Hugo, Augustinus, Joseph

IPC: G03F7/20

CPC classification number: G01B11/02 ,  G03F7/705 ,  G03F7/70625

Abstract: Disclosed herein is a method comprising: obtaining measurement results of a device manufacturing or a product thereof; obtaining sets of one or more values of one or more parameters of a distribution by fitting the distribution against the measurement results, respectively; obtaining, using a computer, a set of one or more values of one or more hyperparameters of a hyperdistribution by fitting the hyperdistribution against the sets of values of the parameters.

Abstract translation: 本文公开了一种方法，其包括：获得装置制造或其产品的测量结果; 通过将分布与测量结果进行拟合，获得分布的一个或多个参数的一个或多个值的集合; 使用计算机通过将超分布与参数的值集合进行拟合来获得超分布的一个或多个超参数的一个或多个值的集合。

公开(公告)号：WO2015121045A1

公开(公告)日：2015-08-20

申请号：PCT/EP2015/051262

申请日：2015-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： MOSSAVAT, Seyed Iman ,  CRAMER, Hugo, Augustinus, Joseph ,  VAN DER SCHAAR, Maurits

IPC: G03F7/20

CPC classification number: G03F7/70591 ,  G01B11/272 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683

Abstract: A method of determining edge placement error within a structure produced using a lithographic process, the method comprising the steps of: (a) receiving a substrate comprising a first structure produced using the lithographic process, the first structure comprising first and second layers, each of the layers having first areas of electrically conducting material and second areas of non-electrically conducting material; (b) receiving a target signal indicative of a first target relative position which is indicative of a target position of edges between the first areas and the second areas of the first layer relative to edges between the first areas and second areas of the second layer in the first structure during said lithographic process; (c) detecting scattered radiation while illuminating the first structure with optical radiation to obtain a first signal; and (d) ascertaining an edge placement error parameter on the basis of the first signal and the first target relative position.

Abstract translation: 一种确定在使用光刻工艺制造的结构内的边缘放置误差的方法，所述方法包括以下步骤：（a）接收包括使用所述光刻工艺制造的第一结构的衬底，所述第一结构包括第一层和第二层， 所述层具有导电材料的第一区域和非导电材料的第二区域; （b）接收指示第一目标相对位置的目标信号，该第一目标相对位置指示相对于第二层的第一区域和第二区域之间的边缘在第一区域和第一层的第二区域之间的边缘的目标位置 在所述平版印刷过程中的第一结构; （c）在用光辐射照射第一结构的同时检测散射辐射以获得第一信号; 和（d）基于第一信号和第一目标相对位置确定边缘放置误差参数。

公开(公告)号：WO2015022239A1

公开(公告)日：2015-02-19

申请号：PCT/EP2014/066840

申请日：2014-08-05

Applicant: ASML NETHERLANDS B.V.

Inventor： MOSSAVAT, Seyed Iman ,  CRAMER, Hugo ,  GROOTJANS, Willem Jan ,  VAN LEEST, Adriaan

IPC: G03F7/20 ,  G01N21/956

CPC classification number: G03F7/705 ,  G01N21/956 ,  G01N21/95607 ,  G03F7/70625 ,  G03F9/7092

Abstract: Methods and inspection apparatus and computer program products for assessing a quality of reconstruction of a value of a parameter of interest of a structure, which may be applied for example in metrology of microscopic structures. It is important the reconstruction provides a value of a parameter of interest (e.g. a CD) of the structure which is accurate as the reconstructed value is used to monitor and/or control a lithographic process. This is a way of assessing a quality of reconstruction (803) of a value of a parameter of interest of a structure which does not require the use of a scanning electron microscope, by predicting (804) values of the parameter of interest of structures using reconstructed values of parameters of structures, and by comparing (805) the predicted values of the parameter of interest and the reconstructed values of the parameter of interest.

Abstract translation: 用于评估结构的感兴趣参数的值的重建质量的方法和检查装置和计算机程序产品，其可以应用于例如微观结构的计量学。 重要的是，重建提供了结构的关注参数（例如CD）的值，该值是精确的，因为重建值用于监视和/或控制光刻过程。 这是通过预测（804）结构的感兴趣的参数的值来评估不需要使用扫描电子显微镜的结构的感兴趣参数的值的重建质量（803）的方法， 通过比较（805）感兴趣参数的预测值和感兴趣参数的重建值，重建结构参数值。

公开(公告)号：WO2022008174A1

公开(公告)日：2022-01-13

申请号：PCT/EP2021/065947

申请日：2021-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： GUO, Chaoqun ,  KHEDEKAR, Satej, Subhash ,  GANTAPARA, Anjan Prasad ,  LIN, Chenxi ,  CASTELIJNS, Henricus, Jozef ,  CHEN, Hongwei ,  BOND, Stephen Henry ,  LI, Zhaoze ,  MOSSAVAT, Seyed Iman ,  ZOU, Yi ,  YPMA, Alexander ,  ZHANG, Youping ,  DICKER, Gerald ,  STEINMEIER, Ewout, Klaas ,  VAN BERKEL, Koos ,  BOLDER, Joost, Johan ,  HUBAUX, Arnaud ,  HLOD, Andriy, Vasyliovich ,  GONZALEZ HUESCA, Juan Manuel ,  AARDEN, Frans Bernard

IPC: G03F7/20

Abstract: Generating a control output for a patterning process is described. A control input is received. The control input is for controlling the patterning process. The control input comprises one or more parameters used in the patterning process. The control output is generated with a trained machine learning model based on the control input. The machine learning model is trained with training data generated from simulation of the patterning process and/or actual process data. The training data comprises 1) a plurality of training control inputs corresponding to a plurality of operational conditions of the patterning process, where the plurality of operational conditions of the patterning process are associated with operational condition specific behavior of the patterning process over time, and 2) training control outputs generated using a physical model based on the training control inputs.