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1.发明申请
公开(公告)号：WO2021175533A1
公开(公告)日：2021-09-10
申请号：PCT/EP2021/052590
申请日：2021-02-04
Applicant: ASML NETHERLANDS B.V.
Inventor： LANCIA, Carlo , GANTAPARA, Anjan Prasad , KERNKAMP, Dirk-Jan , MOSSAVAT, Seyed Iman , YPMA, Alexander
Abstract: Disclosed is a method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method comprises obtaining a function comprising at least a first function of first prediction model parameters associated with said at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.
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公开(公告)号：WO2022028805A1
公开(公告)日：2022-02-10
申请号：PCT/EP2021/068888
申请日：2021-07-07
Applicant: ASML NETHERLANDS B.V.
Abstract: Method and apparatus for adapting a distribution model of a machine learning fabric. The distribution model is for mitigating the effect of concept drift, and is configured to provide an output as input to a functional model of the machine learning fabric. The functional model is for performing a machine learning task. The method comprises obtaining a first data point, and providing the first data point as input to one or more distribution monitoring components of the distribution model. The one or more distribution monitoring components have been trained on a plurality of further data points. A metric representing a correspondence between the first data point and the plurality of further data points is determined, by at least one of the one or more distribution monitoring components. Based on the error metric, the output of the distribution model is adapted.
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3.发明申请
公开(公告)号：WO2021197730A1
公开(公告)日：2021-10-07
申请号：PCT/EP2021/054988
申请日：2021-03-01
Applicant: ASML NETHERLANDS B.V.
Inventor： KOULIERAKIS, Eleftherios , LANCIA, Carlo , GONZALEZ HUESCA, Juan Manuel , YPMA, Alexander , GKOROU, Dimitra , SAHRAEIAN, Reza
IPC: G03F7/20 , G03F7/705 , G03F7/70525
Abstract: Described is a method for determining an inspection strategy for at least one substrate, the method comprising: quantifying, using a prediction model, a compliance metric value for a compliance metric relating to a prediction of compliance with a quality requirement based on one or both of pre- processing data associated with the substrate and any available post-processing data associated with the at least one substrate; and deciding on an inspection strategy for said at least one substrate, based on the compliance metric value, an expected cost associated with the inspection strategy and at least one objective value describing an expected value of the inspection strategy in terms of at least one objective relating to the prediction model.
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4.发明公开
公开(公告)号：EP3910417A1
公开(公告)日：2021-11-17
申请号：EP20174335.8
申请日：2020-05-13
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
Abstract: Described is a method and associated computer program and apparatuses for method for making a decision as to whether to inspect a substrate from a group of substrates within a manufacturing process. The method comprises assigning to each substrate of the group of substrates, a probability value describing a probability of complying with a quality requirement, using a model trained to predict compliance with the quality requirement based on pre-processing data associated with the substrate; and deciding whether to inspect each substrate based on the probability value and one or both of: an expected cost of the inspection step and at least one objective value describing an expected value of inspecting the substrate in terms of at least one objective relating to the model.
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Patent Agency Ranking
公开(公告)号：EP3910419A1
公开(公告)日：2021-11-17
申请号：EP20174756.5
申请日：2020-05-14
Applicant: ASML Netherlands B.V.
Inventor： LANCIA, Carlo , GANTAPARA, Anjan Prasad , KERNKAMP, Dirk-Jan , MOSSAVAT, Seyed Iman , YPMA, Alexander
Abstract: Disclosed is a method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method comprises obtaining a function comprising at least a first function of first prediction model parameters associated with said at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.
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公开(公告)号：EP4521181A1
公开(公告)日：2025-03-12
申请号：EP23196601.1
申请日：2023-09-11
Applicant: ASML Netherlands B.V.
Inventor： LANCIA, Carlo , GKOROU, Dimitra , VAN HERTUM, Pieter
IPC: G05B23/02
Abstract: Described is a method for assessing a plurality of candidate actions for obtaining evidence data and relating to an assessment action of at least one manufacturing apparatus or system, the method comprising: obtaining at least one probabilistic model which relates said evidence data to an estimated probability of one or more assessment states of the manufacturing apparatus; determining, using the at least one probabilistic model, an estimated probability of one or more assessment states based on evidence data comprising additional evidence from one or more candidate actions which have not been performed; determining a reward based on the respective estimated probability of the one or more assessment states and an associated respective cost of said one or more candidate actions; and deciding on whether to perform any of said one or more candidate actions based on said reward.
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7.发明公开
公开(公告)号：EP4127834A1
公开(公告)日：2023-02-08
申请号：EP21707304.8
申请日：2021-03-01
Applicant: ASML Netherlands B.V.
Inventor： KOULIERAKIS, Eleftherios , LANCIA, Carlo , GONZALEZ HUESCA, Juan Manuel , YPMA, Alexander , GKOROU, Dimitra , SAHRAEIAN, Reza
IPC: G03F7/20
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8.发明公开
公开(公告)号：EP4115241A1
公开(公告)日：2023-01-11
申请号：EP21702283.9
申请日：2021-02-04
Applicant: ASML Netherlands B.V.
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公开(公告)号：EP3961518A1
公开(公告)日：2022-03-02
申请号：EP20192534.4
申请日：2020-08-25
Applicant: ASML Netherlands B.V.
Abstract: Method and apparatus for adapting a distribution model of a machine learning fabric. The distribution model is for mitigating the effect of concept drift, and is configured to provide an output as input to a functional model of the machine learning fabric. The functional model is for performing a machine learning task. The method comprises obtaining a first data point, and providing the first data point as input to one or more distribution monitoring components of the distribution model. The one or more distribution monitoring components have been trained on a plurality of further data points. A metric representing a correspondence between the first data point and the plurality of further data points is determined, by at least one of the one or more distribution monitoring components. Based on the error metric, the output of the distribution model is adapted.
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