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    MARK POSITION MEASURING APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    1.
    发明申请
    MARK POSITION MEASURING APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    标记位置测量装置和方法，光刻装置和装置制造方法

    公开(公告)号：WO2014056708A2

    公开(公告)日：2014-04-17

    申请号：PCT/EP2013/069664

    申请日：2013-09-23

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  DEN BOEF, Arie, Jeffrey ,  DRAZKIEWICZ, Stanley ,  KREUZER, Justin ,  NIJMEIJER, Gerrit, Johannes

    IPC: G03F9/00

    CPC classification number: G03F7/70141 ,  G01B11/14 ,  G03F9/7069 ,  G03F9/7088

    Abstract: An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement comprising an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective lens to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective lens; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.

    Abstract translation: 一种用于测量标记位置的装置，该装置包括用于将辐射引导穿过该装置的光瞳的照明装置，所述照明装置包括照明源，以提供基本上相等偏振的多波长辐射和波片，以改变 依赖于波长的辐射的极化，使得提供不同极化的辐射; 物镜，用于在扫描方向上扫描横过标记的辐射，使用由照明装置提供的辐射来将辐射引导到标记上; 辐射处理元件，用于处理由所述标记衍射并由所述物镜接收的辐射; 以及检测装置，用于检测在扫描期间由辐射处理元件输出的辐射强度的变化，并且根据检测到的变化来计算至少第一测量方向上的标记的位置。

    POSITION MEASURING METHOD, POSITION MEASURING APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD, OPTICAL ELEMENT
    2.
    发明申请
    POSITION MEASURING METHOD, POSITION MEASURING APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD, OPTICAL ELEMENT 审中-公开
    位置测量方法，位置测量装置，光刻装置和装置制造方法，光学元件

    公开(公告)号：WO2013152878A2

    公开(公告)日：2013-10-17

    申请号：PCT/EP2013/052384

    申请日：2013-02-07

    Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

    Inventor： KREUZER, Justin ,  DEN BOEF, Arie ,  MATHIJSSEN, Simon

    CPC classification number: G01B11/14 ,  F25D3/06 ,  F25D11/003 ,  F25D23/006 ,  G01B9/0207 ,  G03F7/70108 ,  G03F9/7069 ,  G03F9/7084 ,  G03F9/7088

    Abstract: An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). An illumination arrangement (940, 962, 964) provides off-axis radiation from at least first and second regions. The first and second source regions are diametrically opposite one another with respect to an optical axis (O) and are limited in angular extent. The regions may be small spots selected according to a direction of periodicity of a mark being measured, or larger segments. Radiation at a selected pair of source regions can be generated by supplying radiation at a single source feed position to a self-referencing interferometer. A modified half wave plate is positioned downstream of the interferometer, which can be used in the position measuring apparatus. The modified half wave plate has its fast axis in one part arranged at 45° to the fast axis in another part diametrically opposite.

    Abstract translation: 设备（AS）测量光刻基板（W）上的标记（202）的位置。 照明装置（940，962,964）提供至少第一和第二区域的离轴辐射。 第一和第二源极区域相对于光轴线（O）彼此径向相对并且在角度范围内受到限制。 这些区域可以是根据正被测量的标记的周期方向或较大的段选择的小点。 可以通过将单个源馈送位置处的辐射提供给自参考干涉仪来产生所选择的一对源区域处的辐射。 修改后的半波片位于干涉仪的下游，可用于位置测量装置。 修改后的半波片的一个部分的快轴与另一部分直径相对的快轴成45度。

    POSITION MEASURING APPARATUS, POSITION MEASURING METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    4.
    发明申请
    POSITION MEASURING APPARATUS, POSITION MEASURING METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    位置测量装置，位置测量方法，平面设备和装置制造方法

    公开(公告)号：WO2014053334A1

    公开(公告)日：2014-04-10

    申请号：PCT/EP2013/069540

    申请日：2013-09-20

    Applicant: ASML NETHERLANDS B.V.

    Inventor： DEN BOEF, Arie ,  KREUZER, Justin ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  NIJMEIJER, Gerrit, Johannes ,  SWINDAL, J. Christian ,  TINNEMANS, Patricius Aloysius Jacobus ,  VAN HAREN, Richard

    IPC: G03F9/00

    CPC classification number: G01B11/002 ,  G03F7/70775 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7088 ,  H01L22/12

    Abstract: An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.

    Abstract translation: 一种用于测量标记位置的装置，该装置包括使用由照明装置提供的辐射将辐射引导到标记上的物镜; 接收由标记衍射并被镜面反射的辐射的光学装置，其中所述光学装置被配置为提供第一图像和第二图像，所述第一图像通过相干地添加镜面反射辐射和正衍射级辐射而形成，并且所述第二图像 通过相干地加入镜面反射辐射和负衍射级辐射形成; 以及检测装置，用于检测第一和第二图像的辐射强度的变化，并计算标记在测量方向上的位置。

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