公开(公告)号：WO2014053334A1

公开(公告)日：2014-04-10

申请号：PCT/EP2013/069540

申请日：2013-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： DEN BOEF, Arie ,  KREUZER, Justin ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  NIJMEIJER, Gerrit, Johannes ,  SWINDAL, J. Christian ,  TINNEMANS, Patricius Aloysius Jacobus ,  VAN HAREN, Richard

IPC: G03F9/00

CPC classification number: G01B11/002 ,  G03F7/70775 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7088 ,  H01L22/12

Abstract: An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.

Abstract translation: 一种用于测量标记位置的装置，该装置包括使用由照明装置提供的辐射将辐射引导到标记上的物镜; 接收由标记衍射并被镜面反射的辐射的光学装置，其中所述光学装置被配置为提供第一图像和第二图像，所述第一图像通过相干地添加镜面反射辐射和正衍射级辐射而形成，并且所述第二图像 通过相干地加入镜面反射辐射和负衍射级辐射形成; 以及检测装置，用于检测第一和第二图像的辐射强度的变化，并计算标记在测量方向上的位置。

公开(公告)号：WO2014026819A2

公开(公告)日：2014-02-20

申请号：PCT/EP2013/065069

申请日：2013-07-17

Applicant: ASML NETHERLANDS B.V.

Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  BOGAART, Erik, Willem ,  TINNEMANS, Patricius Aloysius Jacobus ,  DEN BOEF, Arie, Jeffrey

IPC: G03F9/00

CPC classification number: G01B11/14 ,  G01B9/02 ,  G01B11/27 ,  G03F7/70058 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7069 ,  G03F9/7088

Abstract: A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of an alignment target comprising a periodic structure. An illumination optical system for focusing radiation into a spot on said structure. An asymmetry detection optical system receives a share of positive and negative orders of radiation diffracted by the periodic structure, and forms first and second images of said spot on first and second detectors respectively, wherein said negative order radiation is used to form the first image and said positive order radiation is used to form the second image. A processor for processing together signals from said first and second detectors representing intensities of said positive and negative orders to produce a measurement of asymmetry in the periodic structure. The asymmetry measurement can be used to improve accuracy of the position read by the alignment sensor.

Abstract translation: 光刻设备包括对准传感器，其包括用于读取包括周期性结构的对准目标位置的自参考干涉仪。 一种照明光学系统，用于将辐射聚焦到所述结构上的光斑中。 不对称检测光学系统接收通过周期性结构衍射的辐射的正数和负数的共享，并分别在第一和第二检测器上形成所述光斑的第一和第二图像，其中所述负序辐射用于形成第一图像， 所述正阶辐射用于形成第二图像。 用于处理来自所述第一和第二检测器的信号的处理器，其表示所述正序和负序的强度，以产生周期性结构中的不对称性的测量。 可以使用不对称测量来提高由对准传感器读取的位置的精度。

公开(公告)号：EP3579052A1

公开(公告)日：2019-12-11

申请号：EP18176718.7

申请日：2018-06-08

Applicant: ASML Netherlands B.V.

Inventor： TRIPODI, Lorenzo ,  HAJIAHMADI, Mohammadreza ,  FARHADZADEH, Farzad ,  TINNEMANS, Patricius Aloysius Jacobus ,  MIDDLEBROOKS, Scott Anderson ,  KOOPMAN, Adrianus Cornelis Matheus ,  STAALS, Frank ,  PETERSON, Brennan ,  VAN OOSTEN, Anton Bernhard

IPC: G03F7/20

Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.

公开(公告)号：EP3276419A1

公开(公告)日：2018-01-31

申请号：EP16181778.8

申请日：2016-07-28

Applicant: ASML Netherlands B.V.

Inventor： TINNEMANS, Patricius Aloysius Jacobus ,  LIN, Nan ,  ROOBOL, Sander Bas ,  MATHIJSSEN, Simon Gijsbert Josephus

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G01N21/47 ,  G03F7/70633

Abstract: Disclosed is an illumination source for generating measurement radiation for an inspection apparatus. The source generates at least first measurement radiation and second measurement radiation such that the first measurement radiation and the second measurement radiation interfere to form combined measurement radiation modulated with a beat component. The illumination source may be a HHG source. Also disclosed is an inspection apparatus comprising such a source and an associated inspection method.

Abstract translation: 公开了一种用于为检查设备产生测量辐射的照明源。 源产生至少第一测量辐射和第二测量辐射，使得第一测量辐射和第二测量辐射干涉以形成用差拍分量调制的组合测量辐射。 照明源可以是HHG源。 还公开了包括这样的源和相关联的检查方法的检查设备。

公开(公告)号：EP3480554A1

公开(公告)日：2019-05-08

申请号：EP17199764.6

申请日：2017-11-02

Applicant: ASML Netherlands B.V.

Inventor： TINNEMANS, Patricius Aloysius Jacobus ,  DEN BOEF, Arie Jeffrey

IPC: G01B11/24 ,  G03F7/20

Abstract: Described is a metrology apparatus for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology apparatus comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：EP3627228A1

公开(公告)日：2020-03-25

申请号：EP19206439.2

申请日：2018-09-04

Applicant: ASML Netherlands B.V.

Inventor： BIJNEN, Franciscus Godefridus Casper ,  BRINKHOF, Ralph ,  CEKLI, Hakki, Ergun ,  COX, Matthijs ,  ERDAMAR, Ahmet Koray ,  GOOSEN, Maikel Robert ,  HULSEBOS, Edo Maria ,  KOU, Weitian ,  MEGENS, Henricus Johannes Lambertus ,  RIJPSTRA, Manouk ,  ROELOFS, Willem Seine Christian ,  TINNEMANS, Patricius Aloysius Jacobus ,  VAN DE VEN, Wendy Johanna Martina ,  VAN T WESTEINDE, Maaike ,  VERHEES, Loek Johannes Petrus ,  VU, Tran Thanh Thuy ,  YAGUBIZADE, Hadi

IPC: G03F9/00 ,  G03F7/20

Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.

公开(公告)号：EP3055737A1

公开(公告)日：2016-08-17

申请号：EP14766961.8

申请日：2014-09-11

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： TINNEMANS, Patricius Aloysius Jacobus ,  DEN BOEF, Arie Jeffrey ,  KREUZER, Justin Loyd ,  MATHIJSSEN, Simon Gijsbert Josephus

IPC: G03F9/00

CPC classification number: G03F9/7069 ,  G01B9/02011 ,  G01B9/02015 ,  G01B11/272 ,  G01B2290/70 ,  G03F9/7049 ,  G03F9/7088

Abstract: Apparatus, systems, and methods are used for detecting the alignment of a feature on a substrate using a polarization independent interferometer. The apparatus, system, and methods include optical elements that receive light that has diffracted or scattered from a mark on a substrate. The optical elements may split the diffracted light into multiple subbeams of light which are detected by one or more detectors. The diffracted light may be combined optically or during processing after detection. The system may determine alignment and/or overlay based on the received diffracted light having any polarization angle or state.

公开(公告)号：EP3876037A1

公开(公告)日：2021-09-08

申请号：EP20161488.0

申请日：2020-03-06

Applicant: ASML Netherlands B.V.

Inventor： TINNEMANS, Patricius Aloysius Jacobus ,  WARNAAR, Patrick

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/956

Abstract: Disclosed is a method of measuring a periodic structure on a substrate and associated metrology tools therefor. The method comprises configuring an illumination numerical aperture profile and/or orientation of the periodic structure for a measurement based on a detection numerical aperture profile and a ratio of target pitch and said illumination wavelength such that at least a pair of complementary diffraction orders are captured within the detection numerical aperture profile; and measuring the periodic structure using the configured illumination numerical aperture profile and/or orientation of the periodic structure.

公开(公告)号：EP3731018A1

公开(公告)日：2020-10-28

申请号：EP19170674.6

申请日：2019-04-23

Applicant: ASML Netherlands B.V.

Inventor： TINNEMANS, Patricius Aloysius Jacobus

IPC: G03F7/20 ,  G01B11/06

Abstract: Disclosed is a method for re-imaging an image to correspond to a desired illumination scheme. The method comprises obtaining a first image corresponding to a first illumination scheme and convolving the first image with a Fourier transform of an incident mutual intensity function describing the desired illumination scheme to obtain a reimaged image corresponding to the desired illumination scheme.

公开(公告)号：EP3605230A1

公开(公告)日：2020-02-05

申请号：EP18186825.8

申请日：2018-08-01

Applicant: Stichting VU ,  Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  Universiteit van Amsterdam ,  ASML Netherlands B.V.

Inventor： TINNEMANS, Patricius Aloysius Jacobus ,  WARNAAR, Patrick ,  TENNER, Vasco Tomas

IPC: G03F7/20

Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.